Characterization of Grain Structure in Block Copolymer Thin Films by Guided-wave Depolarized Light Scattering

通过导波去偏振光散射表征嵌段共聚物薄膜中的晶粒结构

• 批准号: 0213508
• 负责人: Bruce Garetz
• 金额: $ 36万
• 依托单位: Polytechnic University of New York
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 2002
• 资助国家: 美国
• 起止时间: 2002-09-01 至 2006-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0213508&HistoricalAwards=false
• 关键词: Characterization; Grain; Structure; Block; Copolymer

The proposal describes the development of guided-wave depolarized light scattering, a novel technique for characterizing the structure of ordered block copolymer thin films. This technique will enable cost-effective, nondestructive, real-time quantification of order formation and defect density in these two-dimensional systems. A planar optical waveguide will be fabricated by depositing the polymer film on a low refractive index substrate (fused silica). Standard optical waveguide elements such as prism couplers will be used to couple the laser beam into the film and the scattered light out of the film. The depolarized scattered beam will be guided through the film and detected using a CCD camera. Considerable effort will be devoted to the development of tractable models for relating the detected optical signal to the grain structure within the film. The models that have been established for the optical properties of bulk block copolymer samples will serve as a starting point for this development. Preliminary predictions indicate that the guided-wave geometry will lead to fundamental differences in the nature of the detected signal. The grain structure determined in reciprocal space by the guided-wave depolarized light scattering studies will compared with position space data obtained by scanning electron microscopy (SEM) and atomic force microscopy (AFM) experiments on the same samples.The proposed work builds on earlier work by the co-PIs on optical characterization of grain structure in three-dimensional block copolymer samples. This information is crucial for a number of recently proposed applications for block copolymer thin films such as information storage and photonics. The proposed research will also answer fundamental questions regarding the influence of substrates and interfaces on order formation and defect annihilation in thin block copolymer films.

该提案描述了导波去偏振光散射的发展，一种新的技术，用于表征有序嵌段共聚物薄膜的结构。这种技术将使成本效益，非破坏性的，实时量化的顺序形成和缺陷密度在这些二维系统。将通过在低折射率衬底（熔融石英）上沉积聚合物膜来制造平面光波导。标准的光波导元件，如棱镜耦合器，将用于耦合激光束进入膜和散射光出膜。去偏振散射光束将被引导通过胶片并使用CCD相机检测。相当大的努力将致力于开发有关的检测到的光信号的薄膜内的晶粒结构的易处理的模型。已建立的散装嵌段共聚物样品的光学性能的模型将作为这一发展的起点。初步预测表明，导波的几何形状将导致检测到的信号的性质的根本差异。 由导波解偏振光散射研究确定的倒易空间中的颗粒结构将与通过扫描电子显微镜（SEM）和原子力显微镜（AFM）实验获得的位置空间数据进行比较，在相同的samples.The拟议的工作建立在早期的工作由共同PI在三维嵌段共聚物样品中的颗粒结构的光学表征。这一信息是至关重要的一些最近提出的应用程序，如信息存储和光子嵌段共聚物薄膜。拟议的研究还将回答有关基板和界面的顺序形成和缺陷湮灭薄嵌段共聚物膜的影响的基本问题。