Infrared Band-Specific Near Field Optical Microscopy Probing of Chemically Amplified Polymer Photoresists

该项目将探索机制，线尺寸，酸催化，化学放大深紫外（UV）光刻胶中的酸扩散速率，使用红外近场扫描光学显微镜（IR NSOM）。目标是（1）开发一种更高分辨率的可调谐激光红外近场扫描光学显微镜，（2）推动空间分辨率的极限到10 nm，（3）使用该方法来研究深紫外化学放大聚合物光致抗蚀剂中的最先进的电子照相产生的线的样品，以及（4）探测酸物质的扩散特性。IR NSOM是一种化学波段特定的光学表征技术，提供了一种适应性强的方法来研究特征和线条尺寸。它可以应用在许多情况下，并作为新的化学成分被引入到聚合物化学深紫外光刻应用较小的线尺寸。对比机制的基础是，在紫外线曝光和曝光后烘烤之前和之后的聚合物膜中的吸收特征在红外振动带中显示出戏剧性的波长特定的变化。当对比度适当考虑到吸收和折射率的变化时，该方法提供了一种在纳米尺度上检测化学转化的高灵敏度方法。特定波长的红外NSOM有望提供一个重要的新途径来表征线的尺寸和定量研究酸的扩散速率。该项目解决了材料科学领域的基础研究问题，具有高度的技术相关性。新的实验工具现在变得可用，以允许基本化学和扩散过程的高分辨率，当更好地理解时，允许基础材料科学和技术的进步。从研究中获得的基本知识和理解预计将有助于提高光刻定义更小和更高分辨率的先进器件和电路组件的能力。 该计划的一个重要特点是通过在一个基本和技术上重要的领域对学生进行培训来整合研究和教育。

This project will explore mechanisms, line dimensions, and acid diffusion rates in acid catalyzed, chemically amplified deep ultraviolet (UV) photoresists using infrared near field scanning optical microscopy(IR NSOM). The objectives are to (1)develop a higher resolution variant of tunable laser infrared near field scanning optical microscopy, (2)push the limits of spatial resolution to 10 nm, (3)use the method to study state-of-the-art samples of photolithographically generated lines in deep-UV chemically amplified polymer photoresists, and (4) to probe the diffusion properties of the acid species. IR NSOM is a chemically band-specific optical characterization technique that offers an adaptable method to study features and line dimensions. It can be applied in many situations and as new chemical components are introduced into polymer chemistries for deep-UV lithographic applications for smaller line dimensions. The basis for the contrast mechanism is that the absorption features in the polymer films before and after UV exposure and post exposure bake show dramatic wavelength-specific changes in infrared vibrational bands. When the contrast is properly accounted for with regard to both absorption and index of refraction changes, the method provides a highly sensitive way of detecting chemical transformations on a nanoscopic scale. Wavelength-specific IR NSOM is expected to provide an important new route to characterize line dimensions and to study acid diffusion rates quantitatively. %%%The project addresses basic research issues in a topical area of materials science with high technological relevance. New experimental tools are now becoming available to allow high resolution of elementary chemical and diffusion processes which when better understood allow advances in fundamental materials science and technology. The basic knowledge and understanding gained from the research is expected to contribute to improving the ability to lithographically define smaller and higher resolution components for advanced devices and circuits. An important feature of the program is the integration of research and education through the training of students in a fundamentally and technologically significant area.***