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CAREER: Deposition of Metal and High K Dielectric Thin Films by Plasma Enhanced Atomic Layer Deposition for Research and Education

CAREER: Deposition of Metal and High K Dielectric Thin Films by Plasma Enhanced Atomic Layer Deposition for Research and Education
职业:通过等离子体增强原子层沉积沉积金属和高 K 介电薄膜,用于研究和教育
批准号:
0239213
负责人:
Tonya Klein
金额:
$40.56万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2003
资助国家:
美国
项目状态:
已结题
起止时间:
2003-05-15 至 2009-04-30

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中文摘要
翻译
本研究的目的是对现代电子、磁性和光子器件中至关重要的固体界面的物理和化学有一个更好的基本理解。在这些器件的纳米级环境中,体热力学性质不再适用于预测稳定性,扩散和动力学现象也没有得到很好的理解。在本研究项目中,将通过集中研究一种先进的薄膜制造技术,等离子体增强原子层化学气相沉积,来开发一种创新的方法来更好地理解界面,以生产纳米级薄膜。电介质门或磁性隧道结和金属自旋阀、光学涂层、扩散屏障或互连衬垫的设计可以使用该技术大大提高。将产生的突然界面将允许更详细地检查诸如电子散射之类的基本物理现象。纳米级薄膜的沉积将使用原位x射线光电子能谱、衰减全反射红外能谱和石英微天平技术进行监测。这项工作的教育部分将侧重于开发新的本科课程,并与阿拉巴马大学最先进的MEMS微加工设施相结合。通过NSF REU和RET计划,通过招募和留住少数民族和代表性不足的学生和教师,将获得一个多元化的研究小组。使用这种技术可以制造各种各样的设备。
英文摘要
The objective of this research is to develop a better fundamental understanding of the physics and chemistry of solid interfaces that are crucial in modern electronic, magnetic, and photonic devices. Within the nanoscale environments of these devices, bulk thermodynamic properties no longer apply for predicting stability, and diffusion and kinetic phenomena are not well understood. In this research project, an innovative approach to establishing a better understanding of interfaces will be developed by concentrating on an advanced thin film fabrication technique, plasma enhanced atomic layer chemical vapor deposition, to produce nanometer scale thin films. The design of dielectric gates or magnetic tunnel junctions and metallic spin valves, optical coatings, diffusion barriers, or interconnect liners can greatly be enhanced using this technology. The abrupt interfaces that will be produced will permit fundamental physical phenomena such as electron scattering to be examined in significantly more detail. Deposition of the nanoscale thin films will be monitored using in situ x-ray photoelectron spectroscopy, attenuated total reflection infrared spectroscopy, and quartz microbalance techniques. The education portion of the work will focus on development of a new undergraduate curriculum in association with a state-of-the-art MEMS microfabrication facility at the University of Alabama. A diverse research group will be obtained through the recruiting and retaining of minority and under-represented students and teachers through an NSF REU and RET program. A broad range of devices can potentially be fabricated using this technology.
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会议论文
Remote Plasma Enhanced Organometallic Chemical Vapor Deposition of High Permittivity Dielectrics
  • 批准号:
    0084703
  • 项目类别:
    Standard Grant
  • 资助金额:
    $17.99万
  • 财政年份:
    2000
  • 负责人:
    Tonya Klein
  • 依托单位:
Acquisition of Surface Characterization Research Equipment for the Interdisciplinary Study of Materials Growth and Gas-Solid Reactions at Surfaces
  • 批准号:
    0079690
  • 项目类别:
    Standard Grant
  • 资助金额:
    $19.66万
  • 财政年份:
    2000
  • 负责人:
    Tonya Klein
  • 依托单位:
海外基金