CAREER: Deposition of Metal and High K Dielectric Thin Films by Plasma Enhanced Atomic Layer Deposition for Research and Education

职业：通过等离子体增强原子层沉积沉积金属和高 K 介电薄膜，用于研究和教育

• 批准号: 0239213
• 负责人: Tonya Klein
• 金额: $ 40.56万
• 依托单位: University of Alabama Tuscaloosa
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2003
• 资助国家: 美国
• 起止时间: 2003-05-15 至 2009-04-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0239213&HistoricalAwards=false
• 关键词: CAREER; Deposition; Metal; Dielectric; Thin

The objective of this research is to develop a better fundamental understanding of the physics and chemistry of solid interfaces that are crucial in modern electronic, magnetic, and photonic devices. Within the nanoscale environments of these devices, bulk thermodynamic properties no longer apply for predicting stability, and diffusion and kinetic phenomena are not well understood. In this research project, an innovative approach to establishing a better understanding of interfaces will be developed by concentrating on an advanced thin film fabrication technique, plasma enhanced atomic layer chemical vapor deposition, to produce nanometer scale thin films. The design of dielectric gates or magnetic tunnel junctions and metallic spin valves, optical coatings, diffusion barriers, or interconnect liners can greatly be enhanced using this technology. The abrupt interfaces that will be produced will permit fundamental physical phenomena such as electron scattering to be examined in significantly more detail. Deposition of the nanoscale thin films will be monitored using in situ x-ray photoelectron spectroscopy, attenuated total reflection infrared spectroscopy, and quartz microbalance techniques. The education portion of the work will focus on development of a new undergraduate curriculum in association with a state-of-the-art MEMS microfabrication facility at the University of Alabama. A diverse research group will be obtained through the recruiting and retaining of minority and under-represented students and teachers through an NSF REU and RET program. A broad range of devices can potentially be fabricated using this technology.

这项研究的目的是发展一个更好的物理和化学的固体界面，在现代电子，磁性和光子器件至关重要的基本理解。 在这些设备的纳米级环境中，大体积热力学性质不再适用于预测稳定性，扩散和动力学现象没有得到很好的理解。 在这个研究项目中，一个创新的方法来建立一个更好地了解界面将集中在一个先进的薄膜制造技术，等离子体增强原子层化学气相沉积，生产纳米尺度的薄膜。使用这种技术可以大大增强电介质栅极或磁性隧道结和金属自旋阀、光学涂层、扩散阻挡层或互连衬垫的设计。 将产生的突变界面将允许基本的物理现象，如电子散射，以更详细地检查。 纳米薄膜的沉积将使用原位X射线光电子能谱、衰减全反射红外光谱和石英微天平技术进行监测。这项工作的教育部分将集中在与亚拉巴马大学最先进的MEMS微加工设施相关联的新的本科课程的开发上。 一个多样化的研究小组将通过NSF REU和RET计划招募和保留少数民族和代表性不足的学生和教师来获得。 使用这种技术可以潜在地制造各种各样的设备。