Acquisition of Surface Characterization Research Equipment for the Interdisciplinary Study of Materials Growth and Gas-Solid Reactions at Surfaces
购置表面表征研究设备,用于表面材料生长和气固反应的跨学科研究
基本信息
- 批准号:0079690
- 负责人:
- 金额:$ 19.66万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2000
- 资助国家:美国
- 起止时间:2000-08-15 至 2002-12-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
0079690KleinThis grant supports the acquisition of equipment that will enhance the strength of a multidisciplinary group in performing research in fundamental areas of chemical engineering, chemistry, and materials science and engineering. The interdisciplinary group of scientists and engineers on this proposal has a common interest in studying the chemistry occurring at solid surfaces. A high-pressure reaction cell and a chemical-vapor deposition (CVD) chamber attached to a common analysis chamber will enable the studies envisioned by the group. This proposal is for the acquisition of the common analysis chamber, which would include X-ray photoelectron spectroscopy (XPS) and ion-scattering spectroscopy (ISS). This chamber will be attached to an existing CVD chamber for characterization of materials growth in situ. A high-pressure reaction cell equipped with a mass spectrometer will also be attached so that sample can be exposed to gases at reaction conditions and subsequently analyzed without exposure to air. With in situ surface characterization, the science behind the growth or reaction becomes obtainable and the studies more confident and complete. The proposed equipment will also be used as a learning tool in several undergraduate and graduate classes that teach laboratory analytical techniques. In addition to the education of graduate students on this equipment, this team of investigators is committed to the participation of undergraduates in research in order to prepare promising students for graduate school or a career in research and development. These undergraduates will have the opportunity to obtain hands-on experience in materials characterization and reaction engineering.As our ability to build devices extends into the nanometer dimension, understanding the surface phenomena occurring during the device building and use is becoming increasingly important. This award will be used to purchase a surface analysis system comprising of X-ray photoelectron spectroscopy, ion scattering spectroscopy and a mass spectrometer in order to study the chemical nature of surfaces. The powerful set of techniques will enable us to make advances in three very important areas; ultrathin (10 nanometer) coatings for high speed data storage media that exhibit resistance to corrosion wear and oxidation, ultrathin high-dielectric-constant films for advanced field effect transistors used in the chip industry and catalyst development for on board generation of hydrogen in automobile fuel cells. The analysis system will be added to a thin film chemical vapor deposition system and a high-pressure reactor cell so that materials may be prepared, treated and studied in-situ without the contamination of laboratory air and humidity. This represents the unique nature of the proposed system. Graduate and undergraduate research students will be trained to use the proposed system by the interdisciplinary team of researchers involved. The proposed system is unique in its abilities but the various techniques are commonly used in industry and therefore the student researchers will be well trained to make the transition from academic to industrial positions.
0079690Klein这笔赠款支持购买设备,以增强一个多学科小组在化学工程、化学、材料科学和工程等基础领域进行研究的实力。这一提议的跨学科科学家和工程师小组对研究固体表面发生的化学有共同的兴趣。一个高压反应室和一个连接到公共分析室的化学气相沉积(CVD)室将使该小组设想的研究成为可能。这项提议是为了购置共同分析室,其中将包括X射线光电子能谱(XPS)和离子散射谱(ISS)。这个小室将与现有的化学气相沉积小室相连,用于表征材料的原位生长。还将安装配备质谱仪的高压反应池,以便在反应条件下将样品暴露在气体中,然后在不暴露于空气的情况下进行分析。有了原位表面表征,生长或反应背后的科学就变得可以获得,研究变得更加自信和完整。拟议的设备还将在教授实验室分析技术的几个本科生和研究生班级中用作学习工具。除了对研究生进行这种设备的教育外,这支调查团队还致力于让本科生参与研究,以便为有前途的学生进入研究生院或从事研发工作做好准备。这些本科生将有机会获得材料表征和反应工程方面的实践经验。随着我们制造设备的能力扩展到纳米维度,了解设备制造和使用过程中发生的表面现象变得越来越重要。该合同将用于购买一套表面分析系统,包括X射线光电子能谱、离子散射谱和质谱仪,以研究表面的化学性质。这套强大的技术将使我们能够在三个非常重要的领域取得进展:用于高速数据存储介质的超薄(10纳米)涂层,用于耐腐蚀、耐磨和耐氧化的超薄高介电常数薄膜,用于芯片工业的先进场效应管的超薄高介电常数薄膜,以及用于汽车燃料电池车载产生氢的催化剂开发。该分析系统将被添加到薄膜化学气相沉积系统和高压反应池中,以便可以在不污染实验室空气和湿度的情况下就地制备、处理和研究材料。这代表了拟议制度的独特性质。参与研究的跨学科研究团队将对研究生和本科生进行使用拟议系统的培训。拟议的系统在能力上是独一无二的,但各种技术在工业中普遍使用,因此学生研究人员将受到良好的培训,以实现从学术职位到工业职位的过渡。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Tonya Klein其他文献
Tonya Klein的其他文献
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{{ truncateString('Tonya Klein', 18)}}的其他基金
CAREER: Deposition of Metal and High K Dielectric Thin Films by Plasma Enhanced Atomic Layer Deposition for Research and Education
职业:通过等离子体增强原子层沉积沉积金属和高 K 介电薄膜,用于研究和教育
- 批准号:
0239213 - 财政年份:2003
- 资助金额:
$ 19.66万 - 项目类别:
Standard Grant
Remote Plasma Enhanced Organometallic Chemical Vapor Deposition of High Permittivity Dielectrics
高介电常数电介质的远程等离子体增强有机金属化学气相沉积
- 批准号:
0084703 - 财政年份:2000
- 资助金额:
$ 19.66万 - 项目类别:
Standard Grant
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