课题基金 / 基金详情

Acquisition of Surface Characterization Research Equipment for the Interdisciplinary Study of Materials Growth and Gas-Solid Reactions at Surfaces

Acquisition of Surface Characterization Research Equipment for the Interdisciplinary Study of Materials Growth and Gas-Solid Reactions at Surfaces
购置表面表征研究设备,用于表面材料生长和气固反应的跨学科研究
批准号:
0079690
负责人:
Tonya Klein
金额:
$19.66万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2000
资助国家:
美国
项目状态:
已结题
起止时间:
2000-08-15 至 2002-12-31

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中文摘要
翻译
0079690 klein该基金支持购买设备,以增强一个多学科小组在化学工程、化学和材料科学与工程基础领域的研究实力。这项提案的跨学科科学家和工程师小组对研究固体表面发生的化学反应有共同的兴趣。高压反应池和化学气相沉积(CVD)室连接到一个共同的分析室将使研究小组设想。这一提议是为了获得共同的分析室,其中将包括x射线光电子能谱(XPS)和离子散射能谱(ISS)。该腔室将连接到现有的CVD腔室,用于材料原位生长的表征。还将安装一个配备质谱仪的高压反应池,以便样品可以在反应条件下暴露于气体中,随后在不暴露于空气的情况下进行分析。有了原位表面表征,生长或反应背后的科学变得可以获得,研究更加自信和完整。提议的设备也将被用作一些教授实验室分析技术的本科和研究生班的学习工具。除了用这种设备对研究生进行教育外,这个研究小组还致力于让本科生参与研究,以便为有前途的学生进入研究生院或从事研发工作做好准备。这些本科生将有机会获得材料表征和反应工程方面的实践经验。随着我们制造设备的能力扩展到纳米尺度,理解在设备制造和使用过程中发生的表面现象变得越来越重要。该合同将用于购买由x射线光电子能谱、离子散射能谱和质谱仪组成的表面分析系统,以研究表面的化学性质。这套强大的技术将使我们能够在三个非常重要的领域取得进展;超薄(10纳米)涂层用于高速数据存储介质,具有耐腐蚀磨损和抗氧化性能,超薄高介电常数薄膜用于芯片工业中使用的先进场效应晶体管,以及用于汽车燃料电池中车载氢生成的催化剂开发。分析系统将被添加到薄膜化学气相沉积系统和高压反应器电池中,这样材料就可以在不受实验室空气和湿度污染的情况下进行制备、处理和研究。这代表了所提议系统的独特性。研究生和本科生将接受跨学科研究团队提出的系统使用培训。所提出的系统在其能力上是独一无二的,但各种技术在工业中普遍使用,因此学生研究人员将得到良好的培训,以实现从学术到工业职位的过渡。
英文摘要
0079690KleinThis grant supports the acquisition of equipment that will enhance the strength of a multidisciplinary group in performing research in fundamental areas of chemical engineering, chemistry, and materials science and engineering. The interdisciplinary group of scientists and engineers on this proposal has a common interest in studying the chemistry occurring at solid surfaces. A high-pressure reaction cell and a chemical-vapor deposition (CVD) chamber attached to a common analysis chamber will enable the studies envisioned by the group. This proposal is for the acquisition of the common analysis chamber, which would include X-ray photoelectron spectroscopy (XPS) and ion-scattering spectroscopy (ISS). This chamber will be attached to an existing CVD chamber for characterization of materials growth in situ. A high-pressure reaction cell equipped with a mass spectrometer will also be attached so that sample can be exposed to gases at reaction conditions and subsequently analyzed without exposure to air. With in situ surface characterization, the science behind the growth or reaction becomes obtainable and the studies more confident and complete. The proposed equipment will also be used as a learning tool in several undergraduate and graduate classes that teach laboratory analytical techniques. In addition to the education of graduate students on this equipment, this team of investigators is committed to the participation of undergraduates in research in order to prepare promising students for graduate school or a career in research and development. These undergraduates will have the opportunity to obtain hands-on experience in materials characterization and reaction engineering.As our ability to build devices extends into the nanometer dimension, understanding the surface phenomena occurring during the device building and use is becoming increasingly important. This award will be used to purchase a surface analysis system comprising of X-ray photoelectron spectroscopy, ion scattering spectroscopy and a mass spectrometer in order to study the chemical nature of surfaces. The powerful set of techniques will enable us to make advances in three very important areas; ultrathin (10 nanometer) coatings for high speed data storage media that exhibit resistance to corrosion wear and oxidation, ultrathin high-dielectric-constant films for advanced field effect transistors used in the chip industry and catalyst development for on board generation of hydrogen in automobile fuel cells. The analysis system will be added to a thin film chemical vapor deposition system and a high-pressure reactor cell so that materials may be prepared, treated and studied in-situ without the contamination of laboratory air and humidity. This represents the unique nature of the proposed system. Graduate and undergraduate research students will be trained to use the proposed system by the interdisciplinary team of researchers involved. The proposed system is unique in its abilities but the various techniques are commonly used in industry and therefore the student researchers will be well trained to make the transition from academic to industrial positions.
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CAREER: Deposition of Metal and High K Dielectric Thin Films by Plasma Enhanced Atomic Layer Deposition for Research and Education
  • 批准号:
    0239213
  • 项目类别:
    Standard Grant
  • 资助金额:
    $40.56万
  • 财政年份:
    2003
  • 负责人:
    Tonya Klein
  • 依托单位:
Remote Plasma Enhanced Organometallic Chemical Vapor Deposition of High Permittivity Dielectrics
  • 批准号:
    0084703
  • 项目类别:
    Standard Grant
  • 资助金额:
    $17.99万
  • 财政年份:
    2000
  • 负责人:
    Tonya Klein
  • 依托单位:
国内基金
海外基金
“surface-17”量子纠错码在超导量子电路中的实现
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    2021
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Space-surface Multi-GNSS机会信号感知植生参数建模与融合方法研究
  • 批准号:
    41974039
  • 项目类别:
    面上项目
  • 资助金额:
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  • 批准年份:
    2019
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基于surface hopping方法探索有机半导体中激子解体机制
  • 批准号:
    LY19A040007
  • 项目类别:
    省市级项目
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    --
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    2018
  • 负责人:
    孙震
  • 依托单位:
基于强自旋轨道耦合纳米线自旋量子比特的Surface code量子计算实验研究
  • 批准号:
    11574379
  • 项目类别:
    面上项目
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  • 批准年份:
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  • 负责人:
    姬忠庆
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