SBIR Phase II: Vacuum Ultraviolet Spectroscopic Ellipsometer for Semiconductor Lithography

这个小型企业创新研究(SBIR)二期项目将提供一种新型的、获得专利的光偏振特性传感器，可在~120至200 nm的真空紫外光谱范围内工作。该仪器是一台完整的偏振仪，可以测量偏振光的所有四个斯托克斯参数。它使新的半导体计量应用和测量具有高精度和精确度，这是旋转分析器椭圆偏振测量术无法实现的。价值300亿美元的半导体设备市场不断面临挑战，以满足不断变化的要求，芯片上结构的尺寸和厚度不断减少。G-DOAP仪器满足了行业对真空紫外线计量工具的关键要求。它还通过我们将为这个市场提供的产品，为许多领域的表面科学调查带来了新的能力。这项技术可以加快国际半导体路线图的进展，该路线图将VUV工具列为关键需求。

This Small Business Innovation Research (SBIR) Phase II project will provide a novel, patented sensor of the polarization properties of light for operation in the vacuum ultraviolet spectral range, from ~ 120 to 200 nm. The instrument is a complete polarimeter that measures all four of the Stokes parameters of polarized light. It enables new semiconductor metrology applications and measurements with high precision and accuracy that are not achievable by rotating analyzer ellipsometry. The $30B semiconductor equipment market is continuously challenged to meet changing requirements with decreasing dimensions and thickness of structures on chips. The G-DOAP instrument meets key requirements of the industry for vacuum ultraviolet metrology tools. It also brings new capabilities to surface science investigations in many fields through the product for this market that we will offer. This technology can accelerate progress along the International Roadmap for Semiconductors, which cites VUV tools as a key need.