Short-Term Visit to Universidade Federal do Rio Grande do Sul to Plan Research on Materials with Electronic and Photonic Applications

短期访问南里奥格兰德联邦大学，规划电子和光子应用材料研究

• 批准号: 0335457
• 负责人: Robert Opila
• 金额: $ 0.2万
• 依托单位: University of Delaware
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2003
• 资助国家: 美国
• 起止时间: 2003-08-15 至 2004-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0335457&HistoricalAwards=false
• 关键词: Short; Term; Visit; Universidade; Federal

This Americas Program award will support Dr. Robert Opila of the University of Delaware for a planning visit to the Instituto de Fisica, Universidade Federal do Rio Grande do Sul in Porto Alegre, Brazil to discuss a proposed joint research project with Professor Jonder Morais. The proposed project would focus on interfaces of importance to electronic and photonic devices. Among the topics the research would focus on are injection of electrons and holes into organic conductors for light emitting diode and photovoltaic applications, charge transfer at dielectric/semiconductor and dielectric/metal interfaces for electronic and magnetic applications, and methods to limit the susceptibility of semiconductor lasers to metallic contamination.This area of research has direct technological interest and relevance to the global semiconductor industry. The visit will enable the researchers to discuss not only the proposed research, but also the teaching and training of the students associated with each group in terms of expected student exchanges. Such exchanges would not only transfer research knowledge and expertise directly, but they also contribute to the students' cultural education.

该美洲项目奖将支持特拉华大学的 Robert Opila 博士计划访问巴西阿雷格里港南里奥格兰德联邦大学 Fisica 研究所，与 Jonder Morais 教授讨论拟议的联合研究项目。 拟议的项目将重点关注对电子和光子设备重要的接口。 研究重点包括将电子和空穴注入有机导体以用于发光二极管和光伏应用、用于电子和磁性应用的电介质/半导体和电介质/金属界面的电荷转移以及限制半导体激光器对金属污染的敏感性的方法。该研究领域具有直接的技术兴趣和与全球半导体的相关性 行业。 这次访问将使研究人员不仅能够讨论拟议的研究，还能够讨论与每个小组相关的学生在预期学生交流方面的教学和培训。 这种交流不仅可以直接转移研究知识和专业知识，而且还有助于学生的文化教育。