Collaborative Research: New Directions for Advanced VLSI Manufacturability

合作研究：先进 VLSI 可制造性的新方向

• 批准号: 0429737
• 负责人: Gabriel Robins
• 金额: $ 9.3万
• 依托单位: University of Virginia Main Campus
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 2004
• 资助国家: 美国
• 起止时间: 2004-08-15 至 2007-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0429737&HistoricalAwards=false
• 关键词: Collaborative; Research; New; Directions; Advanced

Proposal ID: 0429737PI/coPI: Gabriel Robins (UVA), Andrew Kahng (UCSD), Aleksandr Zelikovskiy (GA state)Title: Collaborative Research: New Directions for Advanced VLSI Manufacturability Abstract:As VLSI technology advances into ever shrinking design regimes and growing complexity, it is increasingly difficult to maintain adequate verification, process windows, and manufacturing yields. This project will investigate several newly critical issues at the interface between layout design and manufacturability, including automaticlayout flows for phase-shifting masks, area fill synthesis for yield improvement, gate-length biasing for leakage variability control, and principled methodologies for exploring restricted design rules. The Intellectual merit of our proposed research stems from its broad conceptualization of a future integrated design-to-manufacturing flow, coupled with its selective focus on several key design technology goals. This work will help alleviate some of the challenges that now threaten Moore's Law and the Semiconductor Technology Roadmap.

提案ID：0429737 PI/coPI：加布里埃尔罗宾斯（UVA），安德鲁Kahng（加州大学圣地亚哥分校），亚历山大Zelikovskiy（GA状态）标题：合作研究：先进的VLSI可制造性的新方向摘要：随着VLSI技术的进步，不断缩小设计制度和日益增长的复杂性，它越来越难以保持足够的验证，工艺窗口和制造产量。 这个项目将调查几个新的关键问题之间的接口布局设计和可制造性，包括自动布局流程的相移掩模，区域填充合成的良率提高，栅极长度偏置的泄漏可变性控制，和原则性的方法，探索有限的设计规则。 我们提出的研究的智力价值源于其广泛的概念化的未来集成设计到制造流程，再加上其选择性地专注于几个关键的设计技术目标。 这项工作将有助于缓解目前威胁摩尔定律和半导体技术路线图的一些挑战。