Self-Assembled Molecular Photoresist for Fabrication of MEMS and NEMS

用于 MEMS 和 NEMS 制造的自组装分子光刻胶

• 批准号: 0524648
• 负责人: Babak Parviz
• 金额: --
• 依托单位: University of Washington
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2005
• 资助国家: 美国
• 起止时间: 2005-09-01 至 2007-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0524648&HistoricalAwards=false
• 关键词: Self; Assembled; Molecular; Photoresist; Fabrication

ECS-0524648B. AmirParviz, U of WashingtonThe objective of the proposed research is to demonstrate the use of self-assembled molecular monolayers as resist for photolithography and in particular near-field photolithography. Formation of molecular monolayers on a number of substrates is studied with spectroscopy. Molecules that demonstrate bond breakage from the substrate, or undergo chemical transformation, upon exposure to UV light are studied as photoresist. The product of the lithography procedure is a molecularly patterned substrate that can be used for further microfabrication or as a template for the bottom-up self-assembly of electronic devices. Post-processing methods for the substrate will be developed including wet chemical etching, polymer self-assembly, and selective attachment. The resolution limits of the lithography, using a resist with effective thickness of 1-2 nm, will be experimentally established and light propagation through the system will be modeled. The proposed research makes a new photoresist available with a number of unique advantages: a) the resist is extremely thin and atomically uniform and hence can be used for near-field lithography, b) it self-assembles on the substrate, c) it can be engineered to attach only to specific locations on a substrate or onto non-planar substrate. Moreover it allows groups with access only to conventional lithography tools to generate nano-scale patterns.The proposal directly contributes to the training of a graduate student at the interface between chemistry and electrical engineering. It opens a venue for participation of undergraduate students in nanotechnology research and provides modules to be used in a laboratory course on nanotechnology.

ECS-0524648B。AmirParviz，华盛顿大学拟议研究的目的是证明使用自组装分子单层作为光刻胶，特别是近场光刻。本文用光谱学研究了分子单分子膜在许多基底上的形成。在暴露于UV光时表现出从基底断裂的键或经历化学转化的分子被研究为光致抗蚀剂。光刻过程的产物是分子图案化的衬底，其可用于进一步的微制造或作为电子器件的自下而上自组装的模板。将开发用于衬底的后处理方法，包括湿法化学蚀刻、聚合物自组装和选择性附着。光刻的分辨率极限，使用有效厚度为1-2纳米的抗蚀剂，将实验建立和光传播通过系统将被建模。所提出的研究使得新的光致抗蚀剂具有许多独特的优点：a）抗蚀剂非常薄并且原子均匀，因此可以用于近场光刻，B）它在衬底上自组装，c）它可以被设计为仅附着到衬底上的特定位置或非平面衬底上。此外，它允许只使用传统光刻工具的团体生成纳米级图案。该提案直接有助于培养化学和电气工程之间接口的研究生。它为本科生参与纳米技术研究开辟了一个场所，并提供了用于纳米技术实验室课程的模块。