49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication; Orlando, Florida

该奖项为研究生参加将于2005年5月31日至6月3日在佛罗里达州奥兰多举行的第49届国际电子、离子束和光子束技术与纳米加工会议提供支持。在纳米制造、微制造、电子和离子光刻、X射线和压印光刻、粒子束光学和纳米制造的前沿应用等领域，这次会议都是杰出的。所要求的旅行援助将使学生能够向国际高水平的科学界展示他们的研究。他们将观察科学家和工程师如何在会议上交流想法和信息，他们将听取有关纳米技术最新研究成果的第一手陈述。他们将进行个人接触，了解就业机会。在一次特别的学生早餐中，会议组织者将向学生描述会议计划是如何组织起来的。

This award provides support to graduate students to attend the 49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, 2005, to be held in Orlando, Florida, May 31 to June 3, 2005. In the fields of nanofabrication, microfabrication, electron and ion lithographies, x-ray and imprint lithographies, particle-beam optics, and forefront applications of nanofabrication, this conference is preeminent.The requested travel aid will enable students to present their research to a high-level international scientific community. They will observe how scientists and engineers exchange ideas and information at conferences, and they'll hear first-hand presentations of up-to-date research results in nanotechnology. They will make personal contacts and learn of employment opportunities. In a special student breakfast, conference organizers will describe to the students how the conference program is put together.