Fabrication of Sub-Micron-Scale Electronic and Photonic Structures Using Direct Photo-Patterning Techniques

使用直接光图案化技术制造亚微米级电子和光子结构

• 批准号: 0601602
• 负责人: Jayant Kumar
• 金额: $ 24万
• 依托单位: University of Massachusetts Lowell
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2006
• 资助国家: 美国
• 起止时间: 2006-05-01 至 2010-04-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0601602&HistoricalAwards=false
• 关键词: Fabrication; Sub; Micron; Scale; Electronic

Fabrication of Submicron-Scale Electronic and Photonic Structures Using Direct Photo-Patterning TechniquesThe objective of this research is the direct fabrication of sub-micron scale electronic and photonic device structures based on direct photo patterning. The approach involves the use of direct optically induced fabrication of surface relief structures on azobenzene substituted polymers. This approach can be effectively combined with unique post-processing techniques to reliably obtain patterned micro/nanostructures of both inorganic oxides, and flexible polymer films for fabricating optical and opto-electronic devices. Intellectual merit: This initiative will help in significantly extending the state-of-the-art to the facile fabrication of large-area micro/nano-patterned arrays of both inorganic materials and patterning of large area polymeric substrates. The knowledge base developed in this work is also applicable to other emerging nanoscale technologies including light emitting diodes, solar cells, ultraviolet laser, liquid crystal displays and distributed feedback grating for integrated optics and sensor arrays. Broader Impact: An additional very important impact of the proposed work involves the training of the involved graduate students in this novel patterning technique. Innovative technically trained personnel shall help foster new technologies that can spawn new businesses and provide U.S. companies the competitive edge in an era of global competition. This activity will also provide considerable stimulus to undergraduate and high school students, through the outreach programs in place at the university to pursue studies and ultimately embark on careers in science and engineering.

该研究的直接拍摄技术目标是使用直接拍摄技术的目标制造亚微米尺度的电子和光子结构，这是基于直接照相图案的直接制造亚微米尺度电子和光子设备结构。该方法涉及在偶氮苯取代的聚合物上使用直接诱导的表面浮雕结构的形成。该方法可以有效地与独特的后处理技术相结合，以可靠地获得两种无机氧化物的图案化微/纳米结构，以及用于制造光学和光电设备的柔性聚合物膜。 知识分子的优点：该计划将有助于将最新的无机材料的大面积微/纳米图案阵列和大面积聚合物基质的图案构成。这项工作中开发的知识库也适用于其他新兴纳米级技术，包括发光二极管，太阳能电池，紫外线激光，液晶显示器和分布式反馈光栅，用于集成的光学和传感器阵列。更广泛的影响：拟议工作的另一个非常重要的影响涉及对这种新颖的图案技术的培训。创新的技术培训人员应帮助培养可以在全球竞争时代催生新业务并为美国公司带来竞争优势的新技术。这项活动还将通过大学的外展计划为本科和高中生提供相当大的刺激，以探讨学习，并最终从事科学和工程学的职业。