Fabrication of Sub-Micron-Scale Electronic and Photonic Structures Using Direct Photo-Patterning Techniques

使用直接光图案化技术制造亚微米级电子和光子结构

• 批准号: 0601602
• 负责人: Jayant Kumar
• 金额: $ 24万
• 依托单位: University of Massachusetts Lowell
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2006
• 资助国家: 美国
• 起止时间: 2006-05-01 至 2010-04-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0601602&HistoricalAwards=false
• 关键词: Fabrication; Sub; Micron; Scale; Electronic

Fabrication of Submicron-Scale Electronic and Photonic Structures Using Direct Photo-Patterning TechniquesThe objective of this research is the direct fabrication of sub-micron scale electronic and photonic device structures based on direct photo patterning. The approach involves the use of direct optically induced fabrication of surface relief structures on azobenzene substituted polymers. This approach can be effectively combined with unique post-processing techniques to reliably obtain patterned micro/nanostructures of both inorganic oxides, and flexible polymer films for fabricating optical and opto-electronic devices. Intellectual merit: This initiative will help in significantly extending the state-of-the-art to the facile fabrication of large-area micro/nano-patterned arrays of both inorganic materials and patterning of large area polymeric substrates. The knowledge base developed in this work is also applicable to other emerging nanoscale technologies including light emitting diodes, solar cells, ultraviolet laser, liquid crystal displays and distributed feedback grating for integrated optics and sensor arrays. Broader Impact: An additional very important impact of the proposed work involves the training of the involved graduate students in this novel patterning technique. Innovative technically trained personnel shall help foster new technologies that can spawn new businesses and provide U.S. companies the competitive edge in an era of global competition. This activity will also provide considerable stimulus to undergraduate and high school students, through the outreach programs in place at the university to pursue studies and ultimately embark on careers in science and engineering.

采用直接光刻技术制作亚微米级电子和光子器件本研究的目的是基于直接光刻技术直接制作亚微米级电子和光子器件结构。该方法涉及使用直接光诱导制造的表面浮雕结构的偶氮苯取代的聚合物。这种方法可以有效地与独特的后处理技术相结合，以可靠地获得无机氧化物和柔性聚合物膜的图案化微米/纳米结构，用于制造光学和光电器件。 智力优点：这一举措将有助于显着扩展的国家的最先进的无机材料和图案化的大面积聚合物基板的大面积微/纳米图案化阵列的简易制造。在这项工作中开发的知识库也适用于其他新兴的纳米技术，包括发光二极管，太阳能电池，紫外激光，液晶显示器和集成光学和传感器阵列的分布反馈光栅。更广泛的影响：另外一个非常重要的影响，拟议的工作涉及培训的研究生在这种新的模式化技术。受过创新技术训练的人员应帮助培养新技术，这些新技术可以产生新的业务，并为美国公司在全球竞争时代提供竞争优势。这项活动也将提供相当大的刺激本科生和高中生，通过在大学的推广计划，以追求研究，并最终走上科学和工程的职业生涯。