SBIR Phase I: Plasma Enhanched Hot Filament Chemical Vapor Deposition of Ultrananocrystalline Diamond Thin Films

SBIR 第一阶段：超纳米晶金刚石薄膜的等离子体增强热丝化学气相沉积

• 批准号: 0610914
• 负责人: John Carlisle
• 金额: --
• 依托单位: ADVANCED DIAMOND TECHNOLOGIES
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2006
• 资助国家: 美国
• 起止时间: 2006-07-01 至 2007-03-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0610914&HistoricalAwards=false
• 关键词: SBIR; Phase; Plasma; Enhanched; Hot

This Small Business Innovation Research (SBIR) Phase I project will determine the feasibility and suitability of using a plasma enhanced hot filament chemical vapor deposition (PEHFCVD) technology as a manufacturing platform for the large scale deposition of ultra nanocrystalline diamond (UNCD) thin films. UNCD is synthesized today using a unique argon-rich plasma chemistry via microwave plasma chemical vapor deposition (MPCVD). As of today, MPCVD is the only known way to deposit UNCD, since C2 and C2H radicals are produced via Penning ionization collisions between Ar+ and C2H2. HFCVD is an attractive candidate to create a more scalable and economical manufacturing platform because recent advances have made it suitable for the large area uniform deposition of microcrystalline and nanocrystalline diamond thin films, but normally only produces radicals via thermal decomposition. The focus of the proposed work is to investigate the transferability of the unique (and patented) UNCD growth process to the HFCVD platform by utilizing a DC plasma discharge to generate C2 via nonequilibrium processes in addition to thermal decomposition, and to assay the films grown in this way using a variety of material characterization techniques to ensure that the films possess the desired materials properties inherent to UNCD thin films.The commercial value of this endeavor is to increase manufacturing throughput and lower costs through the development of a more robust large-area platform for UNCD deposition as compared to MPCVD. A large area, economical platform for manufacturing UNCD would make diamond a compelling material that would become affordable for applications ranging from tribological coatings (saving energy by lowering friction); electronics (extraordinary thermal management); and biomedical devices (implantable devices such as retinal prostheses).

该小型企业创新研究（SBIR）第一阶段项目将确定使用等离子体增强热丝化学气相沉积（PEHFCVD）技术作为大规模沉积超纳米金刚石（UNCD）薄膜的制造平台的可行性和适用性。UNCD目前是通过微波等离子体化学气相沉积（MPCVD）使用独特的富氩等离子体化学合成的。到目前为止，MPCVD是唯一已知的存款UNCD的方法，因为C2和C2H自由基是通过Ar+和C2H2之间的潘宁电离碰撞产生的。HFCVD是一个有吸引力的候选人，以创造一个更可扩展和经济的制造平台，因为最近的进展已经使其适合于大面积均匀沉积微晶和纳米晶金刚石薄膜，但通常只产生自由基通过热分解。拟议工作的重点是调查独特的可转让性（和专利）UNCD生长工艺到HFCVD平台，通过利用直流等离子体放电，除了热分解外，还通过非平衡过程产生C2，并使用各种材料表征技术来分析以这种方式生长的膜，以确保膜具有UNCD薄膜固有的所需材料性质。这种奋进的商业价值是通过开发与MPCVD相比更坚固的用于UNCD沉积的大面积平台来增加生产量和降低成本。一个大面积、经济的制造UNCD的平台将使金刚石成为一种引人注目的材料，在摩擦涂层（通过降低摩擦节省能源）、电子产品（非凡的热管理）和生物医学设备（植入式设备，如视网膜假体）等应用中变得负担得起。