Atomistic mechanisms of the mechanical behaviour of nanostructured silicon carbide films

纳米结构碳化硅薄膜机械行为的原子机制

• 批准号: DP0985450
• 负责人: Prof Xiaozhou Liao
• 金额: $ 20.8万
• 依托单位: The University of Sydney
• 依托单位国家: 澳大利亚
• 项目类别: Discovery Projects
• 财政年份: 2009
• 资助国家: 澳大利亚
• 起止时间: 2009-01-01 至 2015-12-31
• 项目状态: 已结题
• 来源: https://dataportal.arc.gov.au/RGS/Web/Grants/DP0985450
• 关键词: Atomistic; mechanisms; mechanical; behaviour; nanostructured

Advanced silicon carbide (SiC) ceramics are leading candidates for applications in high-power, high-speed machining and high-temperature structural components. Superhardness and high ductility (or high fracture toughness), which have been realized in some nanostructured (ns) SiC films and nanowires, respectively, are desirable properties for many applications. This project aims to understand the mechanisms behind the exceptional properties in ns SiC and to explore the possibility of realizing the two properties in the same ns SiC. The results obtained from this research will be very important for guiding the structural design of SiC with exceptional mechanical properties which will have a wide range of structural applications.

先进碳化硅（SiC）陶瓷是高功率、高速加工和高温结构部件应用的主要候选材料。超硬度和高延展性（或高断裂韧性），这已经实现了一些纳米结构（ns）的SiC薄膜和纳米线，分别是许多应用所需的性能。该项目旨在了解ns SiC特殊性能背后的机制，并探索在同一ns SiC中实现这两种性能的可能性。 研究结果对指导具有优异力学性能的SiC材料的结构设计具有重要意义，具有广泛的结构应用前景。