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MRI: Acquisition of an Inductively Coupled Plasma Etch System

MRI: Acquisition of an Inductively Coupled Plasma Etch System
MRI:获得感应耦合等离子体蚀刻系统
批准号:
0722619
负责人:
Thomas Mantei
金额:
$0.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2007
资助国家:
美国
项目状态:
已结题
起止时间:
2007-08-01 至 2008-07-31

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中文摘要
翻译
摘要- MRI:电感耦合等离子体蚀刻系统的获得本研究的目的是获得一种具有亚微米尺寸控制的现代电感耦合等离子体蚀刻工具。美国麻省大学的多个研究项目需要亚微米蚀刻能力,从光子器件和生物传感器制造到基础物理研究的蚀刻。该方法是将ICP蚀刻机的蚀刻能力与最近获得的功能齐全的Raith 150电子束光刻工具联合收割机相结合,以扩大在微纳米流体、传感器和设备方面的研究工作。此次设备采购将有助于满足辛辛那提大学的研究和教育目标。大学战略计划的中心目标是通过发展研究和发现来提高我们的研究水平,并将学生置于中心位置。从而提高大学吸引最优秀学生的能力。所要求的蚀刻系统将扩大研究能力,为广大教师和研究生的论文和学位论文研究的字面分数,并将暴露本科生和暑期项目的学生,以国家的最先进的制造技术。购买电感耦合等离子蚀刻机将提高研究生和本科生的教育机会。它将对我们国家未来纳米科学和工程领域的科学家和工程师的发展和培训产生直接和强烈的影响,纳米科学和工程是国家劳动力的关键部分。本科生通过一系列结构化的实验室实验与现有的NSF纳米技术本科教育计划相结合,接触到纳米科学。目前,辛辛那提大学、泽维尔大学(本科院校)、迈阿密大学和代顿大学之间存在着重大的合作努力。
英文摘要
Abstract - MRI: Acquisition of an Inductively Coupled Plasma Etch SystemThe objective of this research is the acquisition of a modern Inductively Coupled Plasma etchingtool with submicron dimension control. Multiple research projects at the University of Cincinnatirequire a submicron etch capability, in areas ranging from photonic device and biosensorfabrication to etching for basic physics research. The approach is to combine the etch capabilityof the ICP etcher with the recently acquired and fully functioning Raith 150 e-beam lithographytool, to enable expanded research efforts in micro- and nanofluidics, sensors and devices.Intellectual Merit. This equipment acquisition will contribute to meeting the University ofCincinnati's research and educational goals. Central goals of the University strategic plan are togrow our research excellence by developing research and discovery, and to place Students at theCenter ?and thus enhance the university's ability to attract the highest-quality students. Therequested etch system will expand the research capabilities for a wide range of faculty andliterally scores of graduate students in their thesis and dissertation research, and would exposeundergraduates and summer program students to state-of-the-art fabrication techniques.Broader Impact. Acquisition of the Inductively Coupled Plasma etcher will enhanceeducational opportunities for both graduate and undergraduate students. It will have a direct andstrong impact on the development and training of our nation's future scientists and engineers innanoscale science and engineering, a critical segment of the nation's workforce. Undergraduatestudents are exposed to the nanoscale science through a series of structured laboratoryexperiments integrated with an existing NSF Nanotechnology Undergraduate Educationprogram. Significant collaborative efforts currently exist between the University of Cincinnati,Xavier University (an undergraduate institution), Miami University, and the University ofDayton.
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MRI: Acquisition of a Nanoscale Imprint Lithography System
  • 批准号:
    0922682
  • 项目类别:
    Standard Grant
  • 资助金额:
    $36.05万
  • 财政年份:
    2009
  • 负责人:
    Thomas Mantei
  • 依托单位:
NUE: Integration of Nanoscale Science and Engineering into Undergraduate Curricula
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