MRI: Acquisition of an Inductively Coupled Plasma Etch System

MRI:获得感应耦合等离子体蚀刻系统

基本信息

  • 批准号:
    0722619
  • 负责人:
  • 金额:
    --
  • 依托单位:
  • 依托单位国家:
    美国
  • 项目类别:
    Standard Grant
  • 财政年份:
    2007
  • 资助国家:
    美国
  • 起止时间:
    2007-08-01 至 2008-07-31
  • 项目状态:
    已结题

项目摘要

Abstract - MRI: Acquisition of an Inductively Coupled Plasma Etch SystemThe objective of this research is the acquisition of a modern Inductively Coupled Plasma etchingtool with submicron dimension control. Multiple research projects at the University of Cincinnatirequire a submicron etch capability, in areas ranging from photonic device and biosensorfabrication to etching for basic physics research. The approach is to combine the etch capabilityof the ICP etcher with the recently acquired and fully functioning Raith 150 e-beam lithographytool, to enable expanded research efforts in micro- and nanofluidics, sensors and devices.Intellectual Merit. This equipment acquisition will contribute to meeting the University ofCincinnati's research and educational goals. Central goals of the University strategic plan are togrow our research excellence by developing research and discovery, and to place Students at theCenter ?and thus enhance the university's ability to attract the highest-quality students. Therequested etch system will expand the research capabilities for a wide range of faculty andliterally scores of graduate students in their thesis and dissertation research, and would exposeundergraduates and summer program students to state-of-the-art fabrication techniques.Broader Impact. Acquisition of the Inductively Coupled Plasma etcher will enhanceeducational opportunities for both graduate and undergraduate students. It will have a direct andstrong impact on the development and training of our nation's future scientists and engineers innanoscale science and engineering, a critical segment of the nation's workforce. Undergraduatestudents are exposed to the nanoscale science through a series of structured laboratoryexperiments integrated with an existing NSF Nanotechnology Undergraduate Educationprogram. Significant collaborative efforts currently exist between the University of Cincinnati,Xavier University (an undergraduate institution), Miami University, and the University ofDayton.
摘要-磁共振成像:获得感应耦合等离子体刻蚀系统本研究的目标是获得一种具有亚微米尺寸控制的现代感应耦合等离子体刻蚀工具。辛辛那提大学的多个研究项目需要亚微米刻蚀能力,从光子器件和生物传感器制造到基础物理研究的刻蚀。其方法是将电感耦合等离子体刻蚀机的刻蚀能力与最近获得的功能齐全的RAITH 150电子束光刻工具相结合,以扩大在微米和纳米流体、传感器和设备方面的研究努力。这项设备采购将有助于实现辛辛那提大学的研究和教育目标。大学战略计划的中心目标是通过发展研究和发现来提高我们的研究能力,并将学生安置在中心,从而增强大学吸引最高质量学生的能力。所要求的蚀刻系统将扩大广泛的教职员工和数十名研究生的论文研究能力,并将使本科生和暑期项目的学生接触到最先进的制造技术。收购电感耦合等离子蚀刻机将增加研究生和本科生的教育机会。它将对我国未来纳米科学和工程领域的科学家和工程师的发展和培训产生直接而强烈的影响,纳米科学和工程是我国劳动力的关键部分。本科生通过与现有NSF纳米技术本科教育计划相结合的一系列结构化实验,接触到纳米科学。目前,辛辛那提大学、泽维尔大学(本科院校)、迈阿密大学和代顿大学之间存在着重大的合作努力。

项目成果

期刊论文数量(0)
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Thomas Mantei其他文献

Metastasierung kutaner Plattenepithelkarzinome im HNO-Bereich
HNO-Bereich 的转移
  • DOI:
  • 发表时间:
    2017
  • 期刊:
  • 影响因子:
    1
  • 作者:
    Alexander Dellweg;Thomas Mantei
  • 通讯作者:
    Thomas Mantei

Thomas Mantei的其他文献

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{{ truncateString('Thomas Mantei', 18)}}的其他基金

MRI: Acquisition of a Nanoscale Imprint Lithography System
MRI:获得纳米级压印光刻系统
  • 批准号:
    0922682
  • 财政年份:
    2009
  • 资助金额:
    --
  • 项目类别:
    Standard Grant
NUE: Integration of Nanoscale Science and Engineering into Undergraduate Curricula
NUE:纳米科学与工程融入本科课程
  • 批准号:
    0532495
  • 财政年份:
    2005
  • 资助金额:
    --
  • 项目类别:
    Standard Grant

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