MRI: Acquisition of an Inductively Coupled Plasma Etch System
MRI: Acquisition of an Inductively Coupled Plasma Etch System
批准号:
0722619
负责人:
Thomas Mantei
金额:
$0.0万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2007
资助国家:
美国
项目状态:
已结题
起止时间:
2007-08-01 至 2008-07-31
中文摘要
摘要:磁共振成像:电感耦合等离子体蚀刻系统的获取本研究的目的是获取具有亚微米尺寸控制的现代电感耦合等离子体蚀刻工具。辛辛那提大学的多个研究项目需要亚微米蚀刻能力,从光子器件和生物传感器制造到基础物理研究的蚀刻。该方法是将ICP蚀刻机的蚀刻能力与最近获得的功能齐全的Raith 150电子束光刻工具相结合,以扩大微纳米流体,传感器和设备的研究工作。知识价值。此次设备收购将有助于满足辛辛那提大学的研究和教育目标。大学战略计划的中心目标是通过发展研究和发现来发展我们的卓越研究,并将学生放在中心?从而提高大学吸引最优秀学生的能力。所要求的蚀刻系统将扩大广泛的教师和研究生在他们的论文和论文研究中的研究能力,并将使本科生和暑期项目的学生接触到最先进的制造技术。更广泛的影响。获得电感耦合等离子体蚀刻机将增加研究生和本科生的教育机会。它将对我国未来纳米科学和工程领域的科学家和工程师的发展和培训产生直接而强烈的影响,这是我国劳动力的关键部分。本科学生通过一系列结构化的实验室实验与现有的NSF纳米技术本科教育计划相结合,接触到纳米科学。目前,辛辛那提大学、泽维尔大学(本科院校)、迈阿密大学和代顿大学之间存在着重要的合作努力。
英文摘要
Abstract - MRI: Acquisition of an Inductively Coupled Plasma Etch SystemThe objective of this research is the acquisition of a modern Inductively Coupled Plasma etchingtool with submicron dimension control. Multiple research projects at the University of Cincinnatirequire a submicron etch capability, in areas ranging from photonic device and biosensorfabrication to etching for basic physics research. The approach is to combine the etch capabilityof the ICP etcher with the recently acquired and fully functioning Raith 150 e-beam lithographytool, to enable expanded research efforts in micro- and nanofluidics, sensors and devices.Intellectual Merit. This equipment acquisition will contribute to meeting the University ofCincinnati's research and educational goals. Central goals of the University strategic plan are togrow our research excellence by developing research and discovery, and to place Students at theCenter ?and thus enhance the university's ability to attract the highest-quality students. Therequested etch system will expand the research capabilities for a wide range of faculty andliterally scores of graduate students in their thesis and dissertation research, and would exposeundergraduates and summer program students to state-of-the-art fabrication techniques.Broader Impact. Acquisition of the Inductively Coupled Plasma etcher will enhanceeducational opportunities for both graduate and undergraduate students. It will have a direct andstrong impact on the development and training of our nation's future scientists and engineers innanoscale science and engineering, a critical segment of the nation's workforce. Undergraduatestudents are exposed to the nanoscale science through a series of structured laboratoryexperiments integrated with an existing NSF Nanotechnology Undergraduate Educationprogram. Significant collaborative efforts currently exist between the University of Cincinnati,Xavier University (an undergraduate institution), Miami University, and the University ofDayton.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
MRI: Acquisition of a Nanoscale Imprint Lithography System
-
批准号:0922682
-
项目类别:Standard Grant
-
资助金额:$36.05万
-
财政年份:2009
-
负责人:Thomas Mantei
-
依托单位:
NUE: Integration of Nanoscale Science and Engineering into Undergraduate Curricula
-
批准号:0532495
-
项目类别:Standard Grant
-
资助金额:$0.0万
-
财政年份:2005
-
负责人:Thomas Mantei
-
依托单位:
海外基金