SBIR PHASE I: Closed-Field Magnetron Sputtering with RF Plasma Enhancement for Large Flat Panel Displays
SBIR 第一阶段:用于大型平板显示器的闭场磁控溅射和射频等离子体增强
基本信息
- 批准号:0740261
- 负责人:
- 金额:$ 10万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2008
- 资助国家:美国
- 起止时间:2008-01-01 至 2008-06-30
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
This Small Business Innovation Research (SBIR) proposes to build and diagnose a new type of Magnetron cathode system which will be particular application in the manufacture of flat panel displays. Transparent conductive oxides (TCOs) including the Indium Tin Oxide (ITO) provide a fundamentally enhanced capability for a number of display technologies. Newer technologies, including Organic Light Emitting Diodes (OLEDs) are highly promising replacements for existing products (based on the incandescent light bulb technology) if the manufacturing yield can be improved. A key goal of OLED manufacture is to create devices on flexible substrates like plastic films. Large area deposition systems suffer from difficulties in co-locating the required deposition processes, leading to difficulties in controlling and taking advantage of the interactions between processes. The proposed unique arrangement of magnetron targets with the auxiliary ion source will allow tunable control of processes that till now have operated independently. The proposed technology will allow significant reduction in the process temperatures in the fabrication process, thereby improving process yield as well as defects in the devices over the currently used TCO deposition techniques, and also permit use of temperature-sensitive substrates such as plastic films.The broader impacts of the proposed technology, if successful, will be to significantly improve the current manufacturing processes for flat panel displays. The new equipment design will enable development of other thin film deposition technologies for large-area substrates, and even allow manufacture of application-specific turnkey systems. The various industrial technologies used in microelectronics, such as flexible and thin panel television, cell phones and other portable electronic devices, films for large-area windows designed for thermal insulation without impairing visibility, etc. are some of the advanced applications which be enabled by this technology. The company's established marketing channels will ensure rapid implementation of the new technology into the industrial production systems, and will provide the U.S. with a significant leadership position in the global marketplace. The involvement of a university expert and his team will ensure that the the young scientists and engineers of tomorrow will be able to participate in the cutting-edge research that ties their classroom studies with practical applications of the findamental principles.
本小企业创新研究(SBIR)提出建立和诊断一种新型的磁控管阴极系统,这将是在平板显示器的制造中的特定应用。包括氧化铟锡(ITO)的透明导电氧化物(TCO)为许多显示技术提供了根本上增强的能力。如果能够提高生产良率,包括有机发光二极管(OLED)在内的新技术是现有产品(基于白炽灯泡技术)的非常有前途的替代品。OLED制造的一个关键目标是在塑料薄膜等柔性基板上制造器件。大面积沉积系统在共同定位所需的沉积工艺方面存在困难,导致难以控制和利用工艺之间的相互作用。所提出的具有辅助离子源的磁控管靶的独特布置将允许对迄今为止独立操作的工艺进行可调控制。所提出的技术将允许在制造过程中的工艺温度的显着降低,从而提高工艺产量以及在目前使用的TCO沉积技术的设备中的缺陷,并且还允许使用温度敏感的基板,如塑料film.The更广泛的影响,所提出的技术,如果成功的话,将显着改善目前的平板显示器的制造工艺。新的设备设计将使其他大面积基板薄膜沉积技术的开发成为可能,甚至允许制造特定应用的交钥匙系统。在微电子中使用的各种工业技术,例如柔性和薄面板电视,手机和其他便携式电子设备,用于大面积窗户的薄膜,设计用于隔热而不影响可见性等,是该技术实现的一些先进应用。该公司建立的营销渠道将确保新技术迅速应用于工业生产系统,并将使美国在全球市场上占据重要的领导地位。大学专家及其团队的参与将确保未来的年轻科学家和工程师能够参与前沿研究,将他们的课堂学习与基本原理的实际应用联系起来。
项目成果
期刊论文数量(0)
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科研奖励数量(0)
会议论文数量(0)
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Thomas Dockstader其他文献
Thomas Dockstader的其他文献
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{{ truncateString('Thomas Dockstader', 18)}}的其他基金
SBIR Phase II: Closed-Field Magnetron Sputtering with RF Plasma Enhancement for Deposition of Thin Films on Large-Area Flexible Substrates for Photovoltaics Applications
SBIR 第二阶段:采用射频等离子体增强的闭场磁控溅射技术,用于在光伏应用的大面积柔性基板上沉积薄膜
- 批准号:
0923843 - 财政年份:2009
- 资助金额:
$ 10万 - 项目类别:
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