MRI: Acquisition of an Ultrahigh Resolution Electron-Beam Lithography System for the University of Michigan Lurie Nanofabrication Facility

MRI:为密歇根大学卢里纳米加工设施购置超高分辨率电子束光刻系统

基本信息

项目摘要

This award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5).The objective of this project is to acquire an electron-beam lithography system for the University of Michigan. This system will be used to facilitate research on a broad array of new technology, materials, structures, and devices, including nanolithography, negative-index materials, polymer-based photovoltaics, nanotube applications, quantum devices, nanomechanical terahertz antennas, fluidic systems for disease diagnostics, and chemical gas analyzers. The electron-beam lithography system will enable research in the emerging areas of science and engineering. Research on new materials will include tunable light sources, spintronics, and high efficiency photovoltaics. Research in nanobiotechnology will include DNA analysis, protein patterning, and biophotonic flow cytometry. Research on nanodevices will include 250Gb/cm2 crossbar memories, nanoscale gas analyzers, and terahertz antennas. These discoveries will push our understanding of materials and devices well beyond current levels into the new frontier of atomic-scale nanotechnology. This system allows generation of new sources for secure broadband communications, high-efficiency lighting, renewable energy, wristwatch-size sensors for global environmental monitoring and security, and breakthroughs in prostheses for deafness, blindness, paralysis and Parkinson's disease. The research enabled by this tool thus tackles some of the most critical challenges in energy, security, environmental quality, and health care facing us in the 21st century. In addition, it will also be utilized in undergraduate and graduate classes, in technical workshops for engineers, in outreach activities to convey the excitement of science and engineering careers to students at the pre-college level, and as a resource to researchers from academia and industry through the NSF National Nanofabrication Infrastructure Network.
该奖项是根据2009年美国复苏和再投资法案(公法111-5)资助的。该项目的目标是为密歇根大学获得电子束光刻系统。该系统将用于促进广泛的新技术、材料、结构和器件的研究,包括纳米光刻、负折射率材料、聚合物光伏、纳米管应用、量子器件、纳米力学太赫兹天线、疾病诊断流体系统和化学气体分析仪。电子束光刻系统将使科学和工程新兴领域的研究成为可能。新材料的研究将包括可调谐光源、自旋电子学和高效光伏。纳米生物技术的研究将包括DNA分析、蛋白质图谱和生物光子流式细胞术。纳米器件的研究将包括250Gb/cm2的交叉条形存储器、纳米级气体分析仪和太赫兹天线。这些发现将推动我们对材料和器件的理解远远超出目前的水平,进入原子尺度纳米技术的新前沿。该系统可用于安全宽带通信、高效照明、可再生能源、用于全球环境监测和安全的腕表大小的传感器,以及在治疗耳聋、失明、瘫痪和帕金森病的假肢方面取得突破。这一工具使研究能够解决我们在21世纪面临的能源、安全、环境质量和医疗保健方面的一些最关键的挑战。此外,它还将用于本科和研究生课程,工程师技术研讨会,在向大学预科学生传达科学和工程职业兴奋的外展活动中,并通过美国国家科学基金会国家纳米制造基础设施网络作为学术界和工业界研究人员的资源。

项目成果

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Stella Pang其他文献

Stella Pang的其他文献

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{{ truncateString('Stella Pang', 18)}}的其他基金

NSF-CGP Fellowship: Nanofabrication Technology for Optoelectronic Devices
NSF-CGP 奖学金:光电器件纳米制造技术
  • 批准号:
    9602503
  • 财政年份:
    1997
  • 资助金额:
    $ 170万
  • 项目类别:
    Standard Grant
Fabrication of Field Emitter Arrays for Vacuum Devices
真空器件场发射体阵列的制造
  • 批准号:
    9209740
  • 财政年份:
    1993
  • 资助金额:
    $ 170万
  • 项目类别:
    Standard Grant
Low Temperature Depositions and Growth of Dielectric Films Using Electron Cyclotron Resonance Source
使用电子回旋共振源的介电薄膜的低温沉积和生长
  • 批准号:
    9111968
  • 财政年份:
    1991
  • 资助金额:
    $ 170万
  • 项目类别:
    Standard Grant

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