NSF-CGP Fellowship: Nanofabrication Technology for Optoelectronic Devices

9602503 Pang该奖项支持密歇根大学电气工程和计算机科学系的Stella Pang博士和日本神奈川市NTT光子功能设备实验室的Toshiaki Tamamura博士之间的美日合作研究。彭博士将在NTT获得为期六个月的支持，以开发先进的光电设备纳米制造技术，并将其应用于半导体反射镜、波导和激光器。研究了加工工艺对器件性能和可靠性的影响。将开发诸如原位钝化和外延过度生长等技术来消除或最小化工艺引起的缺陷。对自组织技术和无损伤干法刻蚀形成的量子点进行了比较。这位美国研究人员将她在低损伤干法刻蚀、表面钝化、现场监测和工艺控制以及硅基光学调制器方面的知识带到了这次合作中。此外，这位日本研究人员还在高分辨率电子束光刻、应变层和自组织量子结构的外延生长以及器件光学表征方面的专业知识进行了补充。该项目预计将带来与光刻、蚀刻、材料生长和器件集成相关的新的或改进的加工技术。此外，新技术将增加设计灵活性，并允许改进和开发新的高性能光电子器件。预计这些实验室之间的合作将促进未来的合作。

9602503 Pang This award supports U.S.-Japan collaborative research between Dr. Stella Pang of the Department of Electrical Engineering and Computer Science at the University of Michigan and Dr. Toshiaki Tamamura of the Photonic Functional Device Laboratories at NTT in Kanagawa, Japan. Dr. Pang will be supported for six months at NTT in order to develop and apply advanced nanofabrication technology for optoelectronic devices to semiconductor mirrors, waveguides, and lasers. The effects of processing technology on the device characteristics and reliability will be studied. Techniques such as in-situ passivation and epitaxial overgrowth to remove or minimize process induced defects will be developed. Comparisons will be made between quantum dots that are formed by self-organized technique and by damage free dry etching technique. The U.S. researcher brings to this collaboration her knowledge of low damage dry etching, surface passivation, in- situ monitoring and process control, and Si-based optical modulators. This is complemented by expertise in the area of high resolution electronic beam lithography, epitaxial growth of strained layers and self-organized quantum structures, and optical characterization of devices by the Japanese researcher. The project is expected to result in new or improved processing technology related to lithography, etching, material growth, and device integration. In addition, the new technology will increase the design flexibility and allow new high performance optoelectronic devices to be improved and developed. It is expected that the cooperation between these laboratories should foster future collaborations.