NSF-CGP Fellowship: Nanofabrication Technology for Optoelectronic Devices

小行星9602503 该奖项支持美国-密歇根大学电子工程和计算机科学系的Stella Pang博士和日本神奈川NTT光子功能器件实验室的Toshiaki Tamamura博士之间的日本合作研究。 Pang博士将在NTT工作六个月，以开发和应用先进的纳米纤维技术，用于半导体反射镜，波导和激光器的光电器件。将研究加工工艺对器件特性和可靠性的影响。 将开发诸如原位钝化和外延过度生长等技术，以消除或最大限度地减少工艺引起的缺陷。 比较了自组织技术和无损伤干法刻蚀技术制备的量子点。 这位美国研究人员为这次合作带来了她在低损伤干法蚀刻、表面钝化、原位监测和过程控制以及硅基光调制器方面的知识。 日本研究人员在高分辨率电子束光刻、应变层和自组织量子结构的外延生长以及器件的光学特性方面的专门知识对此进行了补充。 该项目预计将导致与光刻，蚀刻，材料生长和器件集成相关的新的或改进的处理技术。 此外，新技术将增加设计灵活性，并允许改进和开发新的高性能光电器件。 预计这些实验室之间的合作将促进未来的合作。

9602503 Pang This award supports U.S.-Japan collaborative research between Dr. Stella Pang of the Department of Electrical Engineering and Computer Science at the University of Michigan and Dr. Toshiaki Tamamura of the Photonic Functional Device Laboratories at NTT in Kanagawa, Japan. Dr. Pang will be supported for six months at NTT in order to develop and apply advanced nanofabrication technology for optoelectronic devices to semiconductor mirrors, waveguides, and lasers. The effects of processing technology on the device characteristics and reliability will be studied. Techniques such as in-situ passivation and epitaxial overgrowth to remove or minimize process induced defects will be developed. Comparisons will be made between quantum dots that are formed by self-organized technique and by damage free dry etching technique. The U.S. researcher brings to this collaboration her knowledge of low damage dry etching, surface passivation, in- situ monitoring and process control, and Si-based optical modulators. This is complemented by expertise in the area of high resolution electronic beam lithography, epitaxial growth of strained layers and self-organized quantum structures, and optical characterization of devices by the Japanese researcher. The project is expected to result in new or improved processing technology related to lithography, etching, material growth, and device integration. In addition, the new technology will increase the design flexibility and allow new high performance optoelectronic devices to be improved and developed. It is expected that the cooperation between these laboratories should foster future collaborations.