Defect Reduction in Megasonic Cleaning, through In-Situ Characterization of Cavitation Processes using a Novel Electrochemistry based Device with Improved Time and Space Resolution

使用具有改进的时间和空间分辨率的新型电化学装置，通过对空化过程进行原位表征，减少兆声波清洗中的缺陷

• 批准号: 0925340
• 负责人: Pierre Deymier
• 金额: $ 29.91万
• 依托单位: University of Arizona
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2009
• 资助国家: 美国
• 起止时间: 2009-09-01 至 2013-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0925340&HistoricalAwards=false
• 关键词: Defect; Reduction; Megasonic; Cleaning; through

" This award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5)." The objective of this research is to develop an electrochemistry-based device for monitoring cavitation phenomena, such as microbubble dynamics, at solid/solution interfaces in a megahertz frequency sound field. These phenomena play a key role during megasonic cleaning of semiconductor wafers but are very poorly understood. Uncontrolled cavitation can damage critical features on a wafer and this research is a significant step toward the development of a defect-free megasonic cleaning process. The approach is based on ultrafast probing of amperometric and impedance signals on a microelectrode array surface that are sensitive to cavitation phenomena. The interpretation of measured signals will be conducted using a combination of multiphysics theoretical and computational simulations of cavitation dynamics based on chemically-reactive flow models. This research?s intellectual merit resides in the exploration of cavitation phenomena at spatial and temporal scales not accessible with existing probes. Temporal and spatial information of the electrical signals from the electrochemical device will provide direct feedback to controlling conditions for optimum cleaning with minimal structural damage during fabrication of integrated circuits. This research will greatly assist integrated circuit industry in its effort to develop damage-free cleaning technologies. It will provide a valuable opportunity in interdisciplinary research for students, who will be recruited from underrepresented and ethnically diverse population of the Tucson community through the University of Arizona?s multicultural programs. Broad dissemination of findings will be done through the Center for Environmentally Benign Semiconductor Manufacturing, a multi-university, industry sponsored center based at the University of Arizona.

该奖项是根据2009年《美国复苏和再投资法案》(公法111-5)资助的。这项研究的目的是开发一种基于电化学的装置，用于监测兆赫频率声场中固体/溶液界面上的空化现象，如微气泡动力学。这些现象在半导体晶圆的兆声清洗过程中起着关键作用，但人们对此知之甚少。不受控制的空化会损坏晶片上的关键特征，这项研究是朝着开发无缺陷的兆声清洗工艺迈出的重要一步。该方法基于对微电极阵列表面的安培和阻抗信号的超快探测，这些信号对空化现象很敏感。将结合基于化学反应流动模型的空化动力学的多物理理论和计算模拟，对测量信号进行解释。S的这项研究的学术价值在于在空间和时间尺度上探索空化现象，这是现有探测器无法达到的。来自电化学装置的电信号的时间和空间信息将向控制条件提供直接反馈，以便在集成电路制造期间以最小的结构损伤实现最佳清洁。这项研究将极大地帮助集成电路行业努力开发无损清洗技术。这将为学生提供一个宝贵的跨学科研究机会，这些学生将通过亚利桑那大学S的多文化项目从图森社区中代表性不足和种族多元化的人群中招募学生。研究结果的广泛传播将通过环境友好型半导体制造中心进行，这是一个设在亚利桑那大学的多所大学、行业赞助的中心。