SBIR Phase I: Double Patterning using Optical Lithography for Fabricating 50 nm Nanostructures on Meter Scale Substrates

SBIR 第一阶段：使用光学光刻在米级基板上制造 50 nm 纳米结构的双重图案化

• 批准号: 0945432
• 负责人: Douglas Smith
• 金额: $ 14.83万
• 依托单位: Plymouth Grating Laboratory, Inc.
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2010
• 资助国家: 美国
• 起止时间: 2010-01-01 至 2010-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0945432&HistoricalAwards=false
• 关键词: SBIR; Phase; Double; Patterning; using

The Small Business Innovative Research Phase I project addresses a gap in technology between the lithography of periodic nanostructures, and the manufacturing of low cost nanostructured product with high volume replication. The project will bridge this technology void by extending the current capability of the scanning beam interference lithography tool, the "Nanoruler", through the novel technique of Double Patterning.The commercial potential of this capability will be realized in a large area wire-grid polarizer, a specific LCD component that will have significant technical and social impact. Liquid Crystal Display (LCD) manufacturers have specifically targeted Nanomanufacturing as a critical need for next generation light management designs. Currently, over 90% of light generated by the display light source is absorbed before it reaches the viewing screen and is wasted as undesirable component heating. LCD researchers have identified wire grid polarizers (WGP) with a 50nm feature size as a low cost way to minimize absorption and recycle this light.

小企业创新研究第一阶段项目解决了周期性纳米结构的光刻技术与大量复制的低成本纳米结构产品制造之间的技术差距。该项目将填补这一技术空白，通过双图案化的新技术扩展扫描光束干涉光刻工具“纳米光栅”的现有能力。这一能力的商业潜力将在大面积线栅偏振器中实现，这是一种具有重大技术和社会影响的特定LCD组件。液晶显示器（LCD）制造商已将纳米制造作为下一代光管理设计的关键需求。目前，由显示光源产生的超过90%的光在其到达观看屏幕之前被吸收，并且作为不期望的部件加热而被浪费。LCD研究人员已经确定具有50纳米特征尺寸的线栅偏振器（WGP）是一种低成本的方法，可以最大限度地减少吸收并回收这种光。