SBIR Phase I: Double Patterning using Optical Lithography for Fabricating 50 nm Nanostructures on Meter Scale Substrates

小企业创新研究第一阶段项目解决了周期性纳米结构光刻和低成本纳米结构产品大批量复制制造之间的技术差距。该项目将通过扩展扫描光束干涉光刻工具“纳米尺子”的现有能力，通过双图案的新技术来弥补这一技术空白。这种能力的商业潜力将在大面积线栅偏振器中实现，这是一种特定的LCD组件，将具有重大的技术和社会影响。液晶显示器（LCD）制造商已经将纳米制造作为下一代光管理设计的关键需求。目前，显示光源产生的90%以上的光在到达显示屏之前就被吸收了，并作为不希望的组件加热而浪费了。LCD研究人员已经确定了具有50nm特征尺寸的线栅偏振器（WGP），这是一种低成本的方法，可以最大限度地减少光的吸收和回收。

The Small Business Innovative Research Phase I project addresses a gap in technology between the lithography of periodic nanostructures, and the manufacturing of low cost nanostructured product with high volume replication. The project will bridge this technology void by extending the current capability of the scanning beam interference lithography tool, the "Nanoruler", through the novel technique of Double Patterning.The commercial potential of this capability will be realized in a large area wire-grid polarizer, a specific LCD component that will have significant technical and social impact. Liquid Crystal Display (LCD) manufacturers have specifically targeted Nanomanufacturing as a critical need for next generation light management designs. Currently, over 90% of light generated by the display light source is absorbed before it reaches the viewing screen and is wasted as undesirable component heating. LCD researchers have identified wire grid polarizers (WGP) with a 50nm feature size as a low cost way to minimize absorption and recycle this light.