Travel support for conference on Meso-Scale Sculpting and Fabrication in Soft Materials: Self-organization, Self-assembly and Novel Functionalities, IIT Kanpur, India.

为软材料中观尺度雕刻和制造会议提供差旅支持：自组织、自组装和新颖功能，印度理工学院坎普尔分校。

• 批准号: 0964873
• 负责人: Arijit Bose
• 金额: $ 1.75万
• 依托单位: University of Rhode Island
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2010
• 资助国家: 美国
• 起止时间: 2010-01-01 至 2011-12-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0964873&HistoricalAwards=false
• 关键词: Travel; support; conference; Meso; Scale

CBET - 0964873 Bose, Arijit University of Rhode IslandTravel support is provided for conference on Meso-Scale Sculpting and Fabrication in Soft Materials: Self-organization, Self-assembly and Novel Functionalities, IIT Kanpur, India.This project provides funding for seven US based participants to attend the conference on Meso-Scale Sculpting and Fabrication in Soft Materials: Self-organization, Self-assembly and Novel Functionalities, December 9-12, 2009 at the Indian Institute of Technology (IIT), Kanpur, India. This conference is a part of the year long Golden Jubilee celebrations at IIT Kanpur, as the Institute steps into its 50th year. It is also a meeting ground for the members of the Indo-US Center for Research on Fabrionics supported by the Indo-US Science and Technology Forum, New Delhi, with participation from University of Illinois at Urbana-Champaign, Northwestern University, UC Irvine, IIT Kharagpur, IIT Kanpur and a few other universities and institutes. There will be approximately 20 speakers from the US, and about the same number from India. Intellectual merit India is making a strong investment in science and technology. This meeting represents an important avenue for interactions between US universities and Indian counterparts. The conference will focus on micro, nano and meso-scale fabrication and its relation to structure and properties and functionalities with emphasis on soft materials, self-assembly, self-organization and novel functionalities and applications in energy and environment. It will help explore cutting-edge of micro/nano fabrication, which is a highly interdisciplinary area with equal interest across many departments including chemical, mechanical, electrical and materials engineering, materials science, biosciences, chemistry and physics. Broader impact This conference will allow US participants to learn about advanced research in leading institutions in India. This will directly enhance possibilities of international collaborations. It will provide exposure of participants to students at one of the best institutes in India, and help attract some of those to research laboratories in the US. Through both these avenues, one expects this interaction to directly impact the quality and quantity of research output in the US.

为“软材料的中尺度雕刻和制造：自组织、自组装和新功能”会议提供旅行支持，印度坎普尔理工学院。该项目为7名美国参与者提供资金，参加2009年12月9日至12日在印度坎普尔印度理工学院（IIT）举行的“软材料中尺度雕刻和制造：自组织、自组装和新功能”会议。这次会议是印度理工学院坎普尔分校长达一年的金禧庆祝活动的一部分，因为该学院即将进入50周年。它也是新德里印美科技论坛支持的印美纺织研究中心成员的聚会场所，参加会议的有伊利诺伊大学厄巴纳-香槟分校、西北大学、加州大学欧文分校、印度理工学院卡拉普尔分校、印度理工学院坎普尔分校以及其他一些大学和研究所。大约有20位演讲者来自美国，同样数量的演讲者来自印度。印度在科学技术方面进行了大量投资。这次会议为美国大学和印度大学之间的互动提供了重要途径。会议将重点讨论微、纳米和中观尺度制造及其与结构、性能和功能的关系，重点是软材料、自组装、自组织和新功能以及在能源和环境中的应用。它将有助于探索微/纳米制造的前沿，这是一个高度跨学科的领域，涉及许多部门，包括化学，机械，电气和材料工程，材料科学，生物科学，化学和物理。本次会议将使美国与会者了解印度领先机构的先进研究。这将直接增加国际合作的可能性。它将让参与者接触到印度最好的学院之一的学生，并帮助吸引其中一些人到美国的研究实验室工作。通过这两种途径，人们预计这种互动将直接影响美国研究产出的质量和数量。