SBIR Phase II: Enabling Large-Scale Manufacturing of Organic Electronic Devices Using Photolithography

这个小型企业创新研究（SBIR）二期项目旨在开发一种光刻胶系统，该系统与比传统光刻胶更广泛的材料兼容，允许在现有光刻设备上制作先进的半导体聚合物和小分子图案。通过一期项目，正交公司改进了其氟化光刻胶体系，生产了两种制造成本更低、性能更高的新材料。在该二期项目中，将研究广泛使用的导电聚合物聚（3,4-乙烯二氧噻吩）：聚（苯乙烯磺酸）（PEDOT:PSS）和类似的酸性材料的图案。将采取多种方法不断提高新型光刻胶材料的性能。一种或两种光刻胶材料的大规模可扩展性将通过解决可能对规模扩大具有挑战性的主要问题进行研究，包括处理热量产生和寻找合适的引发剂。该项目的更广泛/商业影响将是利用目前行业中使用的现有光刻基础设施，实现有机电子设备的大规模制造。新光刻胶材料的大量和稳定的质量将有助于满足有机电子工业的性能和产量需求，一旦可扩展和高产量的制造技术可用，预计有机电子工业将迅速增长。

This Small Business Innovation Research (SBIR) Phase II project aims to develop a photoresist system that is compatible with a much wider range of materials than traditional photoresists, allowing for the patterning of advanced semiconducting polymers and small molecules on existing photolithographic equipment. Through Phase I project, Orthogonal has improved its fluorinated photoresist system by making two new materials with lower manufacturing cost and enhanced performance. In this Phase II project, the patterning of the widely used conductive polymer poly(3,4-ethylene dioxythiophene):poly(styrene sulfonic acid) (PEDOT:PSS) and similar acidic materials will be studied. Multiple approaches will be taken to continuously improve the performance of the new photoresist materials. The scalability of one or both photoresist materials to large quantities will be investigated by addressing the major issues that may be challenging to the scale-up, including dealing with heat generation and finding a suitable initiator.The broader/commercial impacts of this project will be the potential to enable the large-scale manufacturing of organic electronic devices by leveraging the existing photolithographic infrastructure currently used in the industry. The availability of the new photoresist materials in large quantities and consistent quality will help meet the performance and volume demands of organic electronic industry, which is expected to grow rapidly once a scalable and high-yield manufacturing technique is available.