Exploration of Multidirectional 3-D UV Lithography for Advanced Microfabrication
先进微加工多向 3D 紫外光刻技术的探索
基本信息
- 批准号:1128806
- 负责人:
- 金额:$ 6.98万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2010
- 资助国家:美国
- 起止时间:2010-08-01 至 2012-08-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
The objectives of this research are (1) to investigate the capability and application of computer-controlled multidirectional three-dimensional ultraviolet-lithography for advanced microfabrication, and (2) to establish a predictive model for the final products from process parameters. The principal investigator has developed an ultraviolet-lithography process incorporating a computer-controlled dynamic stage with tilting and rotational functionalities. The method will be utilized in precise three-dimensional microfabrication to generate slanted, revolving, and combinational patterns up to one or two millimeter height. Since the process employs a submicrometer wavelength light source, its spatial resolution would be as small as one micrometer or less. The fabrication process will be analyzed and a predictive structural model constructed with ray tracing simulation, taking into account refraction and diffraction effects, photochemical reaction, and the dynamic control of the movable stage. As test vehicles, a microfluidic dispensing system and an advanced air-lifted spiral antenna array will be demonstrated. Successful outcome of the project will significantly impact implementation of advanced lab-on-a-chip type systems in areas of biomedical, microfluidic, radio frequency, microelectronic, and optical research. The inherent batch processing capability of ultraviolet-lithography offers mass productivity and manufacturability. Moreover, the inexpensive system and fabrication cost affords its general laboratory usage with little budgetary constraints. On the educational front, the developed technology will be disseminated in a graduate laboratory course and an on-line course. The on-line educational approach is expected to facilitate globalization in engineering education. Additionally, an emphasis is placed on recruiting minorities and summer outreach programs for junior students from the local area.
本研究的目的是:(1)探讨电脑控制的多方向三维紫外光微影技术在先进微加工中的能力与应用;(2)建立一个由制程参数预测最终产品的模型。主要研究者开发了一种紫外光刻工艺,该工艺包括具有倾斜和旋转功能的计算机控制动态平台。该方法将用于精确的三维微加工,以产生高达1或2毫米高度的倾斜,旋转和组合图案。由于该工艺采用亚微米波长的光源,其空间分辨率将小至1微米或更小。我们将分析制作过程,并通过光线追迹模拟,考虑折射和衍射效应,光化学反应和移动平台的动态控制,建立预测结构模型。作为测试车辆,微流体分配系统和先进的空气提升螺旋天线阵列将被证明。该项目的成功结果将对生物医学、微流体、射频、微电子和光学研究领域的先进芯片实验室系统的实施产生重大影响。紫外光刻固有的批处理能力提供了大规模的生产力和可制造性。此外,廉价的系统和制造成本使其在预算限制很小的情况下可以在实验室中使用。在教育方面,将在研究生实验室课程和网上课程中传播所开发的技术。在线教育方法有望促进工程教育的全球化。此外,重点放在招募少数民族和夏季外展计划,为低年级学生从当地。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Yong-Kyu Yoon其他文献
Yong-Kyu Yoon的其他文献
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{{ truncateString('Yong-Kyu Yoon', 18)}}的其他基金
NSF Convergence Accelerator Track I: Energy-efficient MetaConductors for Convergence of Sustainable Electronics (E-MC2 of Sustainable Electronics)
NSF 融合加速器轨道 I:用于可持续电子产品融合的节能元导体(可持续电子产品的 E-MC2)
- 批准号:
2235978 - 财政年份:2022
- 资助金额:
$ 6.98万 - 项目类别:
Standard Grant
SenSE: Smart Electropalatography for Linguistic and Medical Applications (SELMA)
SenSE:用于语言和医学应用的智能电子腭位术 (SELMA)
- 批准号:
2037266 - 财政年份:2020
- 资助金额:
$ 6.98万 - 项目类别:
Standard Grant
CAREER: RF/Microwave components and devices using micro-/nano machined metamaterial
职业:使用微/纳米加工超材料的射频/微波组件和设备
- 批准号:
1132413 - 财政年份:2010
- 资助金额:
$ 6.98万 - 项目类别:
Standard Grant
CAREER: RF/Microwave components and devices using micro-/nano machined metamaterial
职业:使用微/纳米加工超材料的射频/微波组件和设备
- 批准号:
0748153 - 财政年份:2008
- 资助金额:
$ 6.98万 - 项目类别:
Standard Grant
Exploration of Multidirectional 3-D UV Lithography for Advanced Microfabrication
先进微加工多向 3D 紫外光刻技术的探索
- 批准号:
0826434 - 财政年份:2008
- 资助金额:
$ 6.98万 - 项目类别:
Standard Grant
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