Collaborative Research: Development of a Robust, High-Speed, High-Quality Laser-Assisted Nanomanufacturing System

这一合作研究项目的重点是了解激光辅助针尖纳米制造(LA-TBN)过程中的基本光学和等离子体机制，利用了解的知识确定样品表面近场辐射增强和等离子体诱导烧蚀的最佳条件，从而使用先进的控制技术实现坚固、高速、高质量的LA-TBN。在LA-TBN过程中，近场辐射增强的等离子体介导的烧蚀效应和可能的相关热副作用将通过使用先进控制技术的模拟和实验来阐明和区分。所获得的知识将被用于分析和优化纳米制造条件，以实现制造的稳健性和质量。通过开发和实施先进的控制技术，将获得最佳的制造条件，从而实现高速、高质量的纳米加工。这项技术将通过在单晶硅中制造迷宫般的复杂图案来实现和评估。该项目的成功不仅将显著增强LA-TBN工艺相对于其他纳米制造方法的优势，包括低成本、超高分辨率和可加工材料的多功能性，而且还将增加对这一有趣工艺所涉及的基本机制的了解。作为第一批克服LA-TBN工艺中关键障碍的系统尝试之一，该项目使这项技术在具有重要战略意义的领域(如半导体)的生产性实施具有这些优势。教育活动包括制定课程、招聘和留住任职人数不足的学生，以及向K-12提供服务。

This collaborative research project is focused on understanding the fundamental optical and plasma mechanisms in the laser-assisted tip-based nanomanufacturing (LA-TBN) process, utilizing the understanding to identify the optimal conditions for near-field radiation enhancement and plasma-mediated ablation at the sample surface that allow the use of advanced control techniques to achieve robust, high-speed, high-quality LA-TBN. The near-field radiation enhanced plasma-mediated ablation effect and possibly associated thermal side effects during the LA-TBN process will be clarified and distinguished through simulation and experiments enabled by the use of advanced control techniques. The gained knowledge will then be used to analyze and optimize the nanofabrication conditions towards fabrication robustness and quality. The optimal fabrication conditions will be achieved through the development and implementation of advanced control techniques, which in turn, leads to high-speed and high quality nanofabrication. The technique will be implemented and evaluated through the fabrication of a maze-like complicated pattern in single crystal silicon. The success of this project will not only significantly enhance the advantages of the LA-TBN process over other nanofabrication methodologies, including low-cost, ultra-high-resolution and versatility in materials that can be processed, but willalso increase understanding of the fundamental mechanisms involved in this intriguing process. As one of the first systematic attempts to overcome critical barriers in the LA-TBN process, this project enables these advantages for the productive implementations of this technique in strategically important areas, such as semiconductors. The educational activities comprise curriculum development, recruitment and retaining of under-represented students, and outreach to K-12.