Collaborative Research: Defect Modeling and Process Optimization for Nanowire Growth towards Improved Nanodevice Reliability

该奖项的目标是通过模拟半导体纳米线（NWs）生长过程变量、结构缺陷和机械性能之间的相互关系来优化其生长过程，从而生产出缺陷更少的可靠的基于nw的器件。本研究将研究双环框架，首次将NW缺陷与基于NW的器件的可靠性联系起来。需要解决的基本问题是：(1)如何系统地建立工艺变量、不同NW缺陷的产生率与NW器件可靠性之间的关系？(2)如何加快基于西北方向器件的可靠性预测，并通过对西北方向生长过程的操纵，利用获得的可靠性信息来实现以应用为中心的缺陷减少？具体来说，我们将(1)建立NW缺陷的随机生成过程模型，将不同类型缺陷的生成与NW生长过程变量联系起来；(2)建立了机械载荷作用下各种缺陷的NWs的统计断裂模型；(3)探索先进的加速试验方法，通过优化试验设计方法优化NW生长过程；(4)通过开发基准的基于nw的纳米器件，基于所提出的方法进行验证研究，并证明其期望的可靠性性能。如果成功，这项研究将促进当今快节奏的技术进步，这些技术进步不断面临着对具有成本效益的产品开发技术日益增长的需求。这将导致一种有吸引力的实践，有助于解决广泛的纳米材料/器件开发过程中的常见制造问题。预计将实现一种系统的工艺优化方法，用于开发高可靠性的基于nw的器件，而不是目前在纳米制造领域使用的试错方法。此外，教育举措将加强两所合作机构的相关项目，这将影响大量在校和全国范围内的远程学生。研究结果还将通过技术出版物、讲习班、短期课程和K-12外展计划广泛传播。

The objective of this award is to optimize the growth process of semiconductor nanowires (NWs) by modeling the interrelationship between their growth process variables, structural defects, and mechanical properties, so that reliable NW-based devices with fewer defects can be produced. A double-loop framework will be investigated in this research, which links NW defects and the reliability of NW-based devices for the first time. The fundamental questions to be answered are: (1) How to systematically establish the relationship between the process variables, the generation rates of different NW defects, and the reliability of NW-based devices? (2) How to expedite the reliability prediction for NW-based devices and use the achieved reliability information to perform the application-centric defect reduction through the manipulation of the NW growth process? Specifically, we will (1) model the stochastic generation process of NW defects that link the generation of different types of defects to the NW growth-process variables; (2) develop a statistical fracture model for NWs with various defects under mechanical loading; (3) explore an advanced accelerated testing methodology and optimize the NW growth process by the optimal experimental design methods; and (4) conduct validation studies based on the proposed methodology by developing benchmark NW-based nanodevices, and demonstrate their desired reliability performance.If successful, this research will facilitate today's fast-paced technological advancements that are continually faced with increasing needs for cost-effective product-development technologies. It will result in an appealing practice that helps resolve common fabrication problems in a wide spectrum of nanomaterials/device development processes. It is expected that a systematic process optimization approach for the development of highly reliable NW-based devices, instead of trial-and-error approaches that are currently used in the field of nanomanufacturing, will be achieved. Moreover, the educational initiatives will strengthen the related programs at the two collaborative institutions, which will impact a large number of on-campus and nationwide distance students. The research result will also be broadly disseminated through technical publications, workshops, short courses, and K-12 outreach program.