EAGER: Exploring plasma mechanism of synthesis of graphene in arc discharge

EAGER：探索电弧放电合成石墨烯的等离子体机制

• 批准号: 1249213
• 负责人: Michael Keidar
• 金额: $ 15万
• 依托单位: George Washington University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2012
• 资助国家: 美国
• 起止时间: 2012-08-15 至 2014-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1249213&HistoricalAwards=false
• 关键词: EAGER; Exploring; plasma; mechanism; synthesis

This research concerns with exploring the fundamental role and advantages in utilization of plasmas for synthesis of graphene. Graphene is a one-atom-thick planar sheet of carbon atoms, which combines aspects of semiconductors and metals and has potential applications in the areas ranging from high-speed computer chips and biochemical sensors to ultracapacitors and fuel cells. Standard CVD methods for synthesis of graphene utilize atomic (not ionized) fluxes for synthesis. The utilization of plasma flux is being studied in this project in order to enhance the mobility and reactivity of the carbon species during the synthesis. It is anticipated that ultimate characteristics of the synthesis can be significantly improved and limitations associated with partial utilization of atomic deposition flux can be resolved when plasma-based synthesis is utilized. This research will focus on the effect of ionization degree of the graphene-creating carbon flux on properties of the synthesized graphene. To this end, an array of diagnostic techniques for monitoring of plasma parameter in a wide range of background gas pressures from high vacuum to nearly atmospheric pressures will be applied. The ultimate goal of this project will be to utilize the understanding of the fundamental role of plasmas in synthesis.The proposed interdisciplinary project has both fundamental and technological significance. The fundamental significance is that our understanding of the fundamental role of plasmas in graphene synthesis will be greatly expanded. The technological significance lies in exploring the ultimate benefits that plasma-based methods can offer including potential creation of low-temperature graphene synthesis on a low-melt substrates such as polymers, direct graphene synthesis on surfaces characterized by with lattice mismatch with graphene such as Si wafer, significant enhancement of means to control number of layers, production rate and purity. Many important sectors of the national economy will be potentially affected. Successful development of the superior plasma-based technology of graphene synthesis would have an enormous impact on technological readiness and involvement of graphene-based transistors and stretchable/foldable electronics and therefore, on numerous sectors including aerospace, mechanical, civil, biomedical and opto-electronic industries. The proposed research program will serve as an excellent vehicle for undergraduate and graduate education in the field of nanotechnology and plasma science. The PIs will make a concerted effort to involve women and under-represented minority students in this project by working closely with corresponded student organizations at George Washington University.

本研究致力于探索等离子体在石墨烯合成中的基本作用和优势。石墨烯是一种单原子厚的碳原子平面片，它结合了半导体和金属的各个方面，在从高速计算机芯片和生化传感器到超级电容器和燃料电池等领域具有潜在应用。合成石墨烯的标准CVD方法使用原子(非电离)助熔剂进行合成。本项目正在研究等离子体助熔剂的利用，以提高合成过程中碳物种的流动性和反应活性。可以预期，当使用基于等离子体的合成时，合成的最终特性可以得到显著改善，并且可以解决与部分利用原子沉积通量相关的限制。本研究将重点研究产生石墨烯的碳助熔剂的电离度对合成的石墨烯性能的影响。为此，将应用一系列诊断技术，在从高真空到接近大气压的广泛背景气体压力范围内监测等离子体参数。这个项目的最终目标将是利用对等离子体在合成中的基础作用的理解。拟议的跨学科项目具有基础和技术意义。其根本意义在于，我们对等离子体在石墨烯合成中的基础作用的理解将大大扩展。其技术意义在于探索基于等离子体的方法可以提供的最终好处，包括在聚合物等低熔点衬底上创造低温石墨烯合成的潜力，在具有晶格不匹配的表面(如硅片)上直接合成石墨烯，显著改进控制层数、生产速度和纯度的手段。国民经济的许多重要部门都将受到潜在的影响。基于等离子体合成石墨烯的先进技术的成功开发将对基于石墨烯的晶体管和可拉伸/可折叠电子设备的技术准备和参与产生巨大影响，从而对包括航空航天、机械、民用、生物医学和光电子行业在内的许多部门产生巨大影响。拟议的研究计划将成为纳米技术和等离子科学领域本科生和研究生教育的极好工具。国际学生联合会将通过与乔治·华盛顿大学的学生组织密切合作，共同努力让妇女和代表不足的少数族裔学生参与这一项目。