EAGER: Exploring plasma mechanism of synthesis of graphene in arc discharge

本研究探讨了利用等离子体合成石墨烯的基本作用和优势。石墨烯是一种单原子厚度的碳原子平面薄片，它结合了半导体和金属的各个方面，在从高速计算机芯片、生化传感器到超级电容器和燃料电池等领域都有潜在的应用。合成石墨烯的标准CVD方法利用原子（非电离）通量进行合成。为了提高合成过程中碳的迁移率和反应性，本项目正在研究等离子体通量的利用。预计等离子体基合成可以显著改善合成的最终特性，并解决部分利用原子沉积通量的限制。本研究将重点研究石墨烯生成碳通量的电离程度对合成石墨烯性能的影响。为此，将应用一系列诊断技术来监测从高真空到接近大气压力的大范围背景气体压力下的等离子体参数。该项目的最终目标将是利用对等离子体在合成中的基本作用的理解。所提出的跨学科项目具有基础和技术意义。最根本的意义是，我们对等离子体在石墨烯合成中的基本作用的理解将大大扩展。这项技术的意义在于探索等离子体方法所能提供的最终好处，包括在聚合物等低熔体衬底上低温合成石墨烯的潜力，在与石墨烯晶格不匹配的表面（如硅片）上直接合成石墨烯，显著增强了控制层数、生产率和纯度的手段。国民经济的许多重要部门都可能受到影响。基于等离子体的石墨烯合成技术的成功开发将对石墨烯基晶体管和可拉伸/可折叠电子产品的技术准备和参与产生巨大影响，因此，包括航空航天、机械、民用、生物医学和光电工业在内的许多行业。拟议的研究计划将作为纳米技术和等离子体科学领域的本科和研究生教育的优秀载体。各学院将通过与乔治华盛顿大学相应的学生组织密切合作，共同努力使妇女和代表性不足的少数民族学生参与这一项目。

This research concerns with exploring the fundamental role and advantages in utilization of plasmas for synthesis of graphene. Graphene is a one-atom-thick planar sheet of carbon atoms, which combines aspects of semiconductors and metals and has potential applications in the areas ranging from high-speed computer chips and biochemical sensors to ultracapacitors and fuel cells. Standard CVD methods for synthesis of graphene utilize atomic (not ionized) fluxes for synthesis. The utilization of plasma flux is being studied in this project in order to enhance the mobility and reactivity of the carbon species during the synthesis. It is anticipated that ultimate characteristics of the synthesis can be significantly improved and limitations associated with partial utilization of atomic deposition flux can be resolved when plasma-based synthesis is utilized. This research will focus on the effect of ionization degree of the graphene-creating carbon flux on properties of the synthesized graphene. To this end, an array of diagnostic techniques for monitoring of plasma parameter in a wide range of background gas pressures from high vacuum to nearly atmospheric pressures will be applied. The ultimate goal of this project will be to utilize the understanding of the fundamental role of plasmas in synthesis.The proposed interdisciplinary project has both fundamental and technological significance. The fundamental significance is that our understanding of the fundamental role of plasmas in graphene synthesis will be greatly expanded. The technological significance lies in exploring the ultimate benefits that plasma-based methods can offer including potential creation of low-temperature graphene synthesis on a low-melt substrates such as polymers, direct graphene synthesis on surfaces characterized by with lattice mismatch with graphene such as Si wafer, significant enhancement of means to control number of layers, production rate and purity. Many important sectors of the national economy will be potentially affected. Successful development of the superior plasma-based technology of graphene synthesis would have an enormous impact on technological readiness and involvement of graphene-based transistors and stretchable/foldable electronics and therefore, on numerous sectors including aerospace, mechanical, civil, biomedical and opto-electronic industries. The proposed research program will serve as an excellent vehicle for undergraduate and graduate education in the field of nanotechnology and plasma science. The PIs will make a concerted effort to involve women and under-represented minority students in this project by working closely with corresponded student organizations at George Washington University.