MRI: Acquisition of a Nanotopography Capability at the University of Washington Microfabrication Facility

MRI：华盛顿大学微加工设施获得纳米形貌能力

• 批准号: 1337840
• 负责人: Karl Bohringer
• 金额: $ 103万
• 依托单位: University of Washington
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2013
• 资助国家: 美国
• 起止时间: 2013-09-01 至 2016-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1337840&HistoricalAwards=false
• 关键词: MRI; Acquisition; Nanotopography; Capability; University

The main objective of this proposal is to acquire an I-line stepper tool for high-throughput lithography with 350 nm feature resolution bridging the gap between electron-beam lithography and contact lithography. Nano-imprint and photolithography are usually done in separate machines and this proposal is to acquire an integrated machine that can do both simultaneously resulting in superior alignment. Numerous exciting projects will benefit from the acquisition of this equipment. Contact guidance studies using nanotopography, creating nanorachets for microfluidics, nanoelectrodes for energy, plasmonics are all high quality projects that will benefit from this acquisition. Overall, the projects are interesting and potentially transformative. The projects are cohesive and will rely on the stepper tool, it is well written and well organized proposal in all aspects. The PIs have the required expertise for use of this instrument in current and future research projects. The proposed tool will have a broad impact in research and education. The combination of projects including junior faculty with senior faculty is unique and well thought of. The acquisition of this tool will benefit the academic researchers and overall users for the UW NNIN node. The outreach efforts are broad and well described including involvement of students from community colleges, high schools and underrepresented minorities. The cleanroom facilities are already funded by NNIN, hence having this tool in the facility not only will serve a larger group of researchers, but also will be maintained well. More than100 academic users and about 40 industrial users are expected to use the tool.

这一提议的主要目标是获得一种用于高通量光刻的I线步进工具，特征分辨率为350 nm，弥合电子束光刻和接触光刻之间的差距。纳米压印和光刻通常在不同的机器中完成，这项提议是获得一台可以同时完成这两项工作的集成机器，从而实现更好的对准。许多令人兴奋的项目将从购买这种设备中受益。使用纳米拓扑学的接触指导研究、创造用于微流体的纳米孔洞、用于能源的纳米电极、等离子体都是将从此次收购中受益的高质量项目。总体而言，这些项目很有趣，并具有潜在的变革性。这些项目是有凝聚力的，将依靠Steper工具，它在各个方面都写得很好，组织得很好。私人投资机构拥有在当前和未来的研究项目中使用这一仪器所需的专业知识。拟议的工具将在研究和教育方面产生广泛影响。包括初级教员和高级教员在内的项目组合是独特的，也是经过深思熟虑的。该工具的收购将使学术研究人员和UW NNIN节点的整体用户受益。外联工作范围广泛，描述良好，包括社区大学、高中和代表性不足的少数族裔的学生的参与。洁净室设施已经由NNIN资助，因此，在设施中使用该工具不仅可以服务于更多的研究人员，而且还可以得到很好的维护。预计将有100多名学术用户和约40名工业用户使用该工具。