MRI: Acquisition of a Multi-beam (Ga, Ne, He,) Microscope for Nanomaterials Modification and Investigation
MRI:获取用于纳米材料改性和研究的多光束(Ga、Ne、He)显微镜
基本信息
- 批准号:1338139
- 负责人:
- 金额:$ 152.55万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2013
- 资助国家:美国
- 起止时间:2013-09-01 至 2016-08-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
1338139HosemannTechnical Abstract:The acquisition of the ORION Nanofab, a Multi-beam (Ga, Ne, He,) Ion Microscope for Nanomaterials Modification and Investigation, will significantly upgrade the capabilities at the University of Californian Berkeley campus and to outside users interested in ion microscopy. The instrument will be housed at a multiuser facility on campus as a multi-user device. The three ion beams Ga, Ne and He will allow for not just high resolution ion imaging but also virtually damage-free nanofabrication and ion patterning while also enabling direct He or Ne implantation studies. This instrument combines fast ion milling using the Ga beam with a precise fine milling utilizing either Ne or the He beam while being usable as helium ion microscope (HIM) for high resolution imaging. The instrument will be used for patterning in polymers, imaging of biomaterials, fabrication of optical antennas, imaging cell structures, modifying grapheme structures, enabling nano-scale heat transfer studies, quantitative characterization of near-field energy transfer, in-situ He implantation, or for the manufacturing of damage-free and site-specific TEM (transmission electron microscopy), APT (atom probe tomography) and nanoscale specimens for further investigation. The device marks a new generation of nanofabrication tools with wide applicability and unprecedented resolution and accuracy. The novelty of this device will also have a substantial impact on teaching at U.C. Berkeley as well as cutting-edge demonstrations for students and outside interested personnel.Non-Technical Abstract:This Major Research Instrumentation (MRI) Program grant supports the acquisition of a Multi-beam (Ga, Ne, He,) Microscope for Nanomaterials Modification and Investigation at the University of California at Berkeley. This tool will allow for advanced characterization of nanoscale structures ranging from Biology, Chemistry, Geoscience, Materials Science, Physics and Mechanical, Electrical, Mining and Nuclear Engineering. In addition, the instrument will allow for materials modification at the nanoscale with unprecedented precision and little damage to the material. The instrument utilizes three different beams of ions allowing the user to select the right beam for the right application and material. The instrument has extremely wide applicability and will be installed as a multi-user tool incorporated into a UC Berkeley user center accessible to scientists, engineers and interested personnel nationwide. This instrument marks a new generation of ion beam microscopes and nanofabrication tools allowing for the investigation and modification of matter at the smallest scales. The tool will also be used to demonstrate to the general public cutting-edge applications of nanoscale science and technology using a "seeing is believing" approach. This instrument will also have be used in teaching to students in the areas mentioned above by incorporation of real life examples and demonstrations.
1338139Hosemann技术摘要:ORION Nanofab是一种用于纳米材料改性和研究的多束(Ga,Ne,He)离子显微镜,收购该仪器将显著提升加州大学伯克利分校以及对离子显微镜感兴趣的外部用户的能力。该仪器将作为多用户设备安装在校园的多用户设施中。三种离子束Ga、Ne和He将不仅允许高分辨率离子成像,而且允许几乎无损伤的纳米纤维和离子图案化,同时还允许直接He或Ne注入研究。该仪器结合了使用Ga束的快速离子铣削与利用Ne或He束的精确精细铣削,同时可用作氦离子显微镜(HIM)用于高分辨率成像。该仪器将用于聚合物的图案化,生物材料的成像,光学天线的制造,细胞结构的成像,修饰石墨烯结构,使纳米级传热研究,近场能量传递的定量表征,原位He植入,或用于制造无损伤和特定位点的TEM(透射电子显微镜)、APT(原子探针断层扫描)和纳米级样品用于进一步研究。该设备标志着新一代纳米制造工具具有广泛的适用性和前所未有的分辨率和精度。这种设备的新奇也将对加州大学的教学产生重大影响。非技术摘要:这项主要研究仪器(MRI)计划拨款支持在加州大学伯克利分校获得用于纳米材料改性和研究的多光束(Ga,Ne,He)显微镜。该工具将允许从生物学,化学,地球科学,材料科学,物理和机械,电气,采矿和核工程等纳米结构的高级表征。此外,该仪器将允许在纳米级进行材料改性,具有前所未有的精度,对材料的损伤很小。该仪器利用三种不同的离子束,允许用户选择正确的应用和材料的正确束。该仪器具有非常广泛的适用性,并将作为一个多用户工具安装到加州大学伯克利分校用户中心访问全国的科学家,工程师和感兴趣的人员。该仪器标志着新一代的离子束显微镜和纳米纤维工具,允许在最小尺度上对物质进行调查和修改。该工具还将用于向公众展示纳米级科学和技术的尖端应用,采用“眼见为实”的方法。这一工具还将通过结合真实的生活实例和示范,用于对学生进行上述领域的教学。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Peter Hosemann其他文献
Effect of thermal oxidation on helium implanted pure iron
- DOI:
10.1016/j.jnucmat.2024.155377 - 发表时间:
2025-01-01 - 期刊:
- 影响因子:
- 作者:
Minsung Hong;Matthew deJong;Mehdi Balooch;Djamel Kaoumi;Peter Hosemann - 通讯作者:
Peter Hosemann
Effect of cold forging on the microstructure and corrosion behavior of type 316L stainless steel in molten FLiNaK salt
冷锻对 316L 型不锈钢在熔融 FLiNaK 盐中微观结构和腐蚀行为的影响
- DOI:
10.1016/j.jnucmat.2025.155624 - 发表时间:
2025-02-01 - 期刊:
- 影响因子:3.200
- 作者:
Jie Qiu;Ryan D. Hayes;Ho Lun Chan;Haley Williams;Digby D. Macdonald;Raluca O. Scarlat;Djamel Kaoumi;John R. Scully;Peter Hosemann - 通讯作者:
Peter Hosemann
An emIn Situ/em, multi-electrode electrochemical method to assess the open circuit potential corrosion of Cr in unpurified molten FLiNaK
一种用于评估未纯化熔融氟锂钠钾中铬开路电位腐蚀的原位/原位、多电极电化学方法
- DOI:
10.1016/j.corsci.2023.111389 - 发表时间:
2023-09-01 - 期刊:
- 影响因子:8.500
- 作者:
Elena Romanovskaia;Ho Lun Chan;Valentin Romanovski;Francisco Garfias;Minsung Hong;Sara Mastromarino;Peter Hosemann;Raluca Scarlat;John R. Scully - 通讯作者:
John R. Scully
Direct determination of diffusion flux in alloys via spatial separation of flux
- DOI:
10.1016/j.actamat.2024.120615 - 发表时间:
2025-01-01 - 期刊:
- 影响因子:
- 作者:
Arindam Raj;Yujun Xie;Sungwoo Sohn;Michael Aderibigbe;Naijia Liu;Guannan Liu;Peter Hosemann;Jan Schroers - 通讯作者:
Jan Schroers
Enhanced stress relaxation behavior <em>via</em> basal 〈<em>a</em>〉 dislocation activity in Zircaloy-4 cladding
- DOI:
10.1016/j.jnucmat.2024.155337 - 发表时间:
2024-12-01 - 期刊:
- 影响因子:
- 作者:
Malachi Nelson;Shmuel Samuha;Boopathy Kombaiah;David Kamerman;Peter Hosemann - 通讯作者:
Peter Hosemann
Peter Hosemann的其他文献
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{{ truncateString('Peter Hosemann', 18)}}的其他基金
Understanding self-assembled He-bubble superlattices under deformation in materials utilizing novel experimental methods
利用新颖的实验方法了解材料变形下的自组装氦气泡超晶格
- 批准号:
1807822 - 财政年份:2018
- 资助金额:
$ 152.55万 - 项目类别:
Standard Grant
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