MRI: Acquisition of a Multi-beam (Ga, Ne, He,) Microscope for Nanomaterials Modification and Investigation

1338139霍斯曼技术摘要：收购Orion Nanofab，一种用于纳米材料修改和研究的多束(Ga，Ne，He，)离子显微镜，将显著提升加州大学伯克利分校校园和对离子显微镜感兴趣的外部用户的能力。该仪器将作为多用户设备安装在校园内的一个多用户设施中。三束离子束Ga、Ne和He不仅可以进行高分辨率的离子成像，还可以进行几乎无损伤的纳米制造和离子图案化，同时还可以进行直接的He或Ne注入研究。该仪器结合了使用Ga束的快速离子研磨和使用Ne或He射束的精密精密研磨，同时可用作氦离子显微镜(HIM)进行高分辨率成像。该仪器将用于聚合物的图案化、生物材料的成像、光学天线的制造、成像细胞结构、修改石墨素结构、实现纳米尺度的热传递研究、近场能量传递的定量表征、原位氦注入，或用于制造无损伤和特定部位的透射电子显微镜(TEM)、原子探针层析成像(APT)和纳米尺度的样品以供进一步研究。该设备标志着新一代纳米制造工具具有广泛的适用性和前所未有的分辨率和精度。该设备的新颖性也将对加州大学伯克利分校的教学以及学生和外部感兴趣的人的尖端演示产生重大影响。非技术摘要：这项重大研究仪器(MRI)计划拨款支持加州大学伯克利分校购买用于纳米材料修改和调查的多光束(Ga，Ne，He，)显微镜。这一工具将允许对生物、化学、地球科学、材料科学、物理和机械、电气、采矿和核工程等领域的纳米结构进行高级表征。此外，该仪器将允许以前所未有的精度在纳米级对材料进行修改，并且对材料的损害很小。该仪器使用三种不同的离子束，允许用户为正确的应用和材料选择正确的离子束。该仪器具有非常广泛的适用性，将作为一个多用户工具安装到加州大学伯克利分校的用户中心，全国的科学家、工程师和感兴趣的人员都可以访问。该仪器标志着新一代离子束显微镜和纳米加工工具的问世，使人们能够在最小的尺度上对物质进行调查和修改。该工具还将被用来向普通公众展示纳米科学和技术的尖端应用，使用的方法是眼见为实。这一工具还将用于向上述领域的学生进行教学，结合实际生活中的例子和示范。

1338139HosemannTechnical Abstract:The acquisition of the ORION Nanofab, a Multi-beam (Ga, Ne, He,) Ion Microscope for Nanomaterials Modification and Investigation, will significantly upgrade the capabilities at the University of Californian Berkeley campus and to outside users interested in ion microscopy. The instrument will be housed at a multiuser facility on campus as a multi-user device. The three ion beams Ga, Ne and He will allow for not just high resolution ion imaging but also virtually damage-free nanofabrication and ion patterning while also enabling direct He or Ne implantation studies. This instrument combines fast ion milling using the Ga beam with a precise fine milling utilizing either Ne or the He beam while being usable as helium ion microscope (HIM) for high resolution imaging. The instrument will be used for patterning in polymers, imaging of biomaterials, fabrication of optical antennas, imaging cell structures, modifying grapheme structures, enabling nano-scale heat transfer studies, quantitative characterization of near-field energy transfer, in-situ He implantation, or for the manufacturing of damage-free and site-specific TEM (transmission electron microscopy), APT (atom probe tomography) and nanoscale specimens for further investigation. The device marks a new generation of nanofabrication tools with wide applicability and unprecedented resolution and accuracy. The novelty of this device will also have a substantial impact on teaching at U.C. Berkeley as well as cutting-edge demonstrations for students and outside interested personnel.Non-Technical Abstract:This Major Research Instrumentation (MRI) Program grant supports the acquisition of a Multi-beam (Ga, Ne, He,) Microscope for Nanomaterials Modification and Investigation at the University of California at Berkeley. This tool will allow for advanced characterization of nanoscale structures ranging from Biology, Chemistry, Geoscience, Materials Science, Physics and Mechanical, Electrical, Mining and Nuclear Engineering. In addition, the instrument will allow for materials modification at the nanoscale with unprecedented precision and little damage to the material. The instrument utilizes three different beams of ions allowing the user to select the right beam for the right application and material. The instrument has extremely wide applicability and will be installed as a multi-user tool incorporated into a UC Berkeley user center accessible to scientists, engineers and interested personnel nationwide. This instrument marks a new generation of ion beam microscopes and nanofabrication tools allowing for the investigation and modification of matter at the smallest scales. The tool will also be used to demonstrate to the general public cutting-edge applications of nanoscale science and technology using a "seeing is believing" approach. This instrument will also have be used in teaching to students in the areas mentioned above by incorporation of real life examples and demonstrations.