MRI: Acquisition of a Chlorine Reactive Ion Etching System

MRI：购买氯反应离子蚀刻系统

• 批准号: 1428960
• 负责人: Ioannis Kymissis
• 金额: $ 41.94万
• 依托单位: Columbia University
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2014
• 资助国家: 美国
• 起止时间: 2014-09-01 至 2016-08-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1428960&HistoricalAwards=false
• 关键词: MRI; Acquisition; Chlorine; Reactive; Ion

Directional dry etching constitutes a fundamental fabrication technique in the research and manufacturing of micro- and nanoscale devices. The proposal seeks funding to allow Columbia University to acquire an advanced etching system that allows for a diverse set of uses and will expand the range of a variety of current projects at Columbia, including projects related to nano-electronics, nanobiology and nano-neuro-biology, optoelectronics, photovoltaics and medical research. The equipment will also enable a range of future projects that are currently not possible, including lasers at the nanoscale level and a class of semiconductors known as III/V semiconductors. As a major upgrade to the shared Columbia Cleanroom -- currently the only shared cleanroom facility in the New York City metropolitan area --the etching system to be acquired will directly impact the educational and research activities of over 250 researchers (faculty, staff, and students) at Columbia and neighboring institutions. The group of co-Principal Investigators includes all the researchers who serve on the Cleanroom Board of Directors, representing an accumulation of experience in the successful installation and support of such equipment for a varied and evolving set of users. The facility also hosts graduate and undergraduate lecture and laboratory courses taught by the co-PIs, REUs and RETs, and independent study projects advised by faculty from many departments. Since nanopatterning is a central component of these courses, the requested etcher will directly impact the educational program of several departments, providing students with important skills for future careers in science and engineering.The ICP RIE (inductively-coupled plasma, reactive ion etching) system described in this proposal will employ chlorine-based etch chemistries for vertical etching of compound semiconductors, metals, and organic materials. The new patterning capability and system will enable a range of future projects including nanoscale lasers and sensors based on III/V semiconductors. During operation of the etcher, recipes will be systematically developed to provide optimal results to all researchers. The Columbia University clean room is currently the only shared-access micro- and nano-fabrication facility in the metropolitan New York City area and serves a diverse population of academic users and small businesses. The facility has permanent technical and administrative support, and the proposed ICP RIE system will constitute a crucial facility of the available infrastructure for research training in nanoscale science and engineering. The tool will be used directly by students and post-doctoral researchers as part of their research activities, providing training in advanced nanopatterning techniques.

定向干法刻蚀是微纳米器件研究和制造的基本制造技术。该提案寻求资金，使哥伦比亚大学能够获得先进的蚀刻系统，该系统具有多种用途，并将扩大哥伦比亚当前各种项目的范围，包括与纳米电子学、纳米生物学和纳米神经生物学、光电子学、光伏和医学研究相关的项目。该设备还将实现一系列目前无法实现的未来项目，包括纳米级激光器和一类被称为 III/V 半导体的半导体。作为共享哥伦比亚洁净室（目前是纽约市大都市区唯一的共享洁净室设施）的重大升级，即将收购的蚀刻系统将直接影响哥伦比亚大学及邻近机构 250 多名研究人员（教职员工和学生）的教育和研究活动。联合首席研究员小组包括在洁净室董事会任职的所有研究人员，代表着在为各种不断变化的用户群成功安装和支持此类设备方面积累的经验。该设施还举办由联合 PI、REU 和 RET 教授的研究生和本科生讲座和实验室课程，以及由许多院系的教师建议的独立研究项目。由于纳米图案化是这些课程的核心组成部分，所需的蚀刻机将直接影响多个系的教育计划，为学生提供未来科学和工程职业的重要技能。本提案中描述的 ICP RIE（感应耦合等离子体，反应离子蚀刻）系统将采用氯基蚀刻化学物质对化合物半导体、金属和有机材料进行垂直蚀刻。新的图案化能力和系统将使一系列未来项目成为可能，包括基于 III/V 半导体的纳米级激光器和传感器。在蚀刻机运行期间，将系统地开发配方，以便为所有研究人员提供最佳结果。哥伦比亚大学洁净室是目前纽约大都会地区唯一共享的微米和纳米制造设施，为各类学术用户和小型企业提供服务。该设施拥有永久的技术和行政支持，拟议的 ICP RIE 系统将构成纳米科学和工程研究培训可用基础设施的重要设施。该工具将由学生和博士后研究人员直接使用，作为其研究活动的一部分，提供先进纳米图案技术的培训。