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EFRI 2-DARE: Scalable Growth and Fabrication of Anti-Ambipolar Heterojunction Devices

EFRI 2-DARE: Scalable Growth and Fabrication of Anti-Ambipolar Heterojunction Devices
EFRI 2-DARE:抗双极异质结器件的可扩展生长和制造
批准号:
1433510
负责人:
Lincoln Lauhon
金额:
$199.98万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2014
资助国家:
美国
项目状态:
已结题
起止时间:
2014-09-01 至 2019-12-31

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中文摘要
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英文摘要
Communications systems such as WiFi, GPS, wireless sensor networks, and radio frequency electronics are critical to the nation?s infrastructure and have had a transformative impact on daily life. However, existing applications of wireless technologies are often limited by the power consumption and speed of the underlying electronic switches, or transistors, that send and receive signals. Furthermore, current classes of transistors must be integrated into complex circuits to perform simple functions. This award supports the fundamental research necessary to make new classes of transistors that can improve the performance of existing communications technologies and open up new applications by enabling simplified circuit designs on flexible substrates. The development of inexpensive and scalable approaches to new transistor materials will facilitate the incorporation of these devices into new technologies. Computer models of novel transistors and communications circuits will be shared with industry partners to facilitate the transfer of knowledge and capabilities to industry, growing the high-tech economy. Outreach programs including cooperation with the Chicago Museum of Science and Industry will recruit a broad group of young people to careers in science and technology crucial to the nation?s economy and defense.The objective of the proposed work is to create, characterize, understand, and exploit new classes of electronic and optoelectronic devices by integrating promising two-dimensional monolayer transition metal dichalcogenides with other low dimensional semiconductors including p-type organic semiconductors, sorted semiconducting single walled carbon nanotubes, and other two-dimensional materials. The project will fabricate novel ultrathin p-n heterojunctions of mixed dimensionality that exhibit unique and quantitatively advantageous properties arising from gate transparency and flexibility, and characterize the devices with advanced scanned probe techniques in addition to conventional current and capacitance versus voltage measurements. Custom chemical precursors will be designed and synthesized with the goal of achieving scalable growth and fabrication of ultrathin dichalcogenides by atomic layer deposition over large areas at reduced temperatures. To understand how the device physics leads to new properties and circuit performance, phenomenological models will be integrated into industry accepted nanodevice simulators, and a compact model will be developed. The fundamental knowledge and predictive models of ultrathin heterojunctions will expand engineering frontiers through quantitative understanding of charge transport, the demonstration of novel device characteristics, such as the recently discovered anti-ambipolar behavior, and the exploitation of these behaviors to create novel electronic circuits on flexible substrates with simpler designs and fewer elements than conventional unipolar field effect transistor-based circuits.
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Total Tomography of Nonplanar Heterostructures for Quantum Information Processing
  • 批准号:
    1905768
  • 项目类别:
    Standard Grant
  • 资助金额:
    $43.7万
  • 财政年份:
    2019
  • 负责人:
    Lincoln Lauhon
  • 依托单位:
Total Tomography of III-V Non-Planar Heterostructures
  • 批准号:
    1611341
  • 项目类别:
    Standard Grant
  • 资助金额:
    $40.88万
  • 财政年份:
    2016
  • 负责人:
    Lincoln Lauhon
  • 依托单位:
Doping in Non-Planar Heterostructures
  • 批准号:
    1308654
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $38.08万
  • 财政年份:
    2013
  • 负责人:
    Lincoln Lauhon
  • 依托单位:
Doping Profiles in Semiconductor Nanowires
  • 批准号:
    1006069
  • 项目类别:
    Standard Grant
  • 资助金额:
    $36.0万
  • 财政年份:
    2010
  • 负责人:
    Lincoln Lauhon
  • 依托单位:
海外基金