Collaborative Research: Programmable Metal-Assisted Chemical Etching for Three-Dimensional Functional Metamaterials

合作研究：三维功能超材料的可编程金属辅助化学蚀刻

• 批准号: 1462631
• 负责人: Weidong Zhou
• 金额: $ 12万
• 依托单位: University of Texas at Arlington
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2015
• 资助国家: 美国
• 起止时间: 2015-05-01 至 2018-04-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1462631&HistoricalAwards=false
• 关键词: Collaborative; Research; Programmable; Metal; Assisted

Metamaterials are artificially structured materials that exhibit unusual, but advantageous, electromagnetic properties not readily found in nature. The special properties arise from regions of complex structural features organized in a periodic arrangement. Currently, the fabrication of the optical metamaterials is largely based on intrinsic two-dimensional patterning processes, with limited demonstrations of three-dimensional optical metamaterials mostly based on polymer structures. There are no manufacturing techniques for direct fabrication of three-dimensional crystalline semiconductor-based metamaterials. This award explores a unique programmable metal-assisted chemical etching process for the scalable nano-manufacturing of three-dimensional functional metamaterials. Such an approach will overcome the current roadblocks towards integrated photonics based on functional metamaterials to enable complete control of light. The versatile fabrication methodology and materials functionalities will inevitably impact the production of three-dimensional electronics and photonics, tissue engineering, and energy conversion/storage. By engaging students including women and minorities in this emerging field of research, the award activities will help ensure their competence and leadership in today's global environment. Outreach activities targeting high school teachers, students, and the general public will raise awareness and prepare our future workforce to embrace the emerging US nano-manufacturing industry.Metal-assisted chemical etching is an anisotropic solution-based etching method that defies the textbook definition of wet etching. By this technique, three-dimensional high aspect-ratio semiconductor nanostructures are formed by engraving patterned metal template into the body of the semiconductor. Under controlled conditions, etching occurs only at the interface between the metal and the semiconductor. As a result, the metal layer descends or digs into the semiconductor as the underlying semiconductor is eroded. In this study, as etching proceeds, a magnetic field is programmed to guide the movement of ferromagnetic-metal catalyst and arbitrary three-dimensional curvilinear nanostructures are formed by programming the trajectory of the metal catalyst as it engraves into the body of Si or higher index III-V semiconductors. Because of its compatibility with integrated circuit manufacturing, this method is scalable for high-volume manufacturing of highly desired functional optical metamaterials. The collaborative effort with complementary expertise in nanofabrication and photonics, respectively, is positioned to provide a leap-ahead advance in capabilities for manufacturing three-dimensional micro- and nano-scale semiconductor and metallo-dielectric structures with unprecedented control of shape and dimensions, and for development of novel functional optical and other materials and devices.

超材料是人为结构化的材料，在自然界中表现出异常但有利的电磁特性。特殊特性来自定期布置中组织的复杂结构特征区域。当前，光学超材料的制造主要基于固有的二维图案过程，其三维光学超材料的示范限制主要基于聚合物结构。没有用于直接制造三维晶体半导体的超材料的制造技术。该奖项探讨了一个独特的可编程化学辅助化学蚀刻工艺，用于对三维功能超材料的可扩展纳米制造。这种方法将基于功能超材料的功能上的障碍来克服当前朝向集成光子学的障碍，以完全控制光。多功能制造方法和材料功能不可避免地会影响三维电子和光子学，组织工程以及能量转换/存储的生产。通过使包括妇女和少数民族在这一新兴研究领域的学生参与，该奖项活动将有助于确保她们在当今全球环境中的能力和领导能力。针对高中教师，学生和公众的外展活动将提高认识，并准备我们的未来劳动力，以拥抱新兴的纳米制造业。METAL-ADAL辅助化学蚀刻是一种基于各向异性解决方案的基于各向异性解决方案的蚀刻方法，它违反了对湿蚀刻的教科书定义。通过这项技术，三维高方面比例半导体纳米结构是通过将图案化的金属模板雕刻到半导体主体中形成的。在受控条件下，蚀刻仅发生在金属和半导体之间的界面上。结果，金属层会随着基础半导体的侵蚀而下降或挖入半导体。在这项研究中，随着蚀刻的进行，对磁场进行了编程，以指导铁磁 - 金属催化剂的运动和任意三维曲线纳米结构，通过编程金属催化剂的轨迹形成，因为它插入了SI或更高的INDEX IIII-V半导体。由于它与集成电路制造的兼容性，因此该方法可扩展，用于高量的高量制造功能化学材料。分别在纳米构造和光子学方面的互补专业知识的合作努力，可以在制造三维微型和纳米级半导体和金属二极管结构的能力方面提供飞跃，并通过形状和精选材料和其他新型材料和其他功能和其他材料和其他材料和其他材料和其他材料和其他材料和其他材料和其他材料和其他材料和其他材料和其他材料和其他材料和其他材料和其他材料进行。