GOALI: Nanoscale Printing and Machining using Electron Beams in Liquids

几乎所有的高通量纳米制造过程都需要复制主模板。因此，可制造性的三个障碍需要新的解决方案：(1)在提交生产模板之前快速原型，(2)在生产之前和生产期间修复模板错误和缺陷，以及(3)在提交修改模板之前进行产品调试。如果可用的材料、纯度和吞吐量不受相关气相反应物的限制，使用聚焦电子束局部添加（“打印”）和减去（“加工”）材料可以满足这些需求。这项学术联络与工业（GOALI）奖的资助机会研究了从气体到液体反应物的变化，以扩大可用工艺和材料的范围，并显着提高纯度和产量。这些进步将提高纳米制造系统产品周期中多个环节的效率，从而使美国工业和社会受益。该奖项涉及一个行业合作伙伴，以加速从实验室研究到工业实施的过渡。这项工作的多学科性质（电气，化学，材料科学和工程）为本科生和研究生参与者提供了一个非凡的培训机会，而涉及K-12学生的教育和推广工作进一步扩大了它的影响。该奖项通过阐明涉及液体工艺的物理和化学机制以及加深对控制分辨率、材料纯度和吞吐量的因素的理解，推进了电子束诱导加工主要领域的知识。这项工作将促进对纳米尺度的辐射化学和电化学的理解，以及对液-固界面和减压环境下流体动力学的理解。这些知识与现场电子显微镜、电子束光刻、辐射诱导的化学和生化过程等领域相关。技术目标是：(1)通过将沉积和蚀刻实验与蒙特卡罗和有限元模拟相比较，将工艺参数与优值联系起来；(2)了解如何使用原位液体注入、微流体结构和表面活性剂添加剂来控制部分真空中的液体薄膜；(3)评估两种直接纳米制造应用的工艺：纳米电子电路编辑和等离子体器件原型。

Nearly all high-throughput nanomanufacturing processes require the replication of master templates. As a result, three barriers to manufacturability demand new solutions: (1) rapid prototyping before committing to a production template, (2) repair of template errors and defects both before and during production, and (3) product debugging before committing to revised templates. Locally adding ("printing") and subtracting ("machining") materials using a focused electron-beam could meet these needs if the available materials, purity, and throughput were not limited by the associated gas-phase reactants. This Grant Opportunity for Academic Liaison with Industry (GOALI) award investigates a change from gas to liquid reactants in order to expand the range of processes and materials available and dramatically improve purity and throughput. These advances would enhance efficiency at multiple points in the product cycle for nanomanufactured systems, and thus benefit U.S. industry and society. The award involves an industry partner to accelerate the transition from laboratory research to industrial implementation. The multidisciplinary nature (electrical, chemical, and materials science and engineering) of the work provides a remarkable training opportunity for undergraduate and graduate participants, while educational and outreach efforts involving K-12 students further broaden its impact.The award advances knowledge in the primary field of electron-beam induced processing by elucidating the physical and chemical mechanisms involved in liquid-based processes and deepening understanding of the factors controlling resolution, material purity, and throughput. The effort will advance understanding of radiation- and electro-chemistry in nanoscale volumes near liquid-solid interfaces and fluid dynamics in reduced pressure environments. This knowledge is relevant to fields as diverse as in-situ electron microscopy, electron-beam lithography, and radiation induced chemical and biochemical processes. The technical objectives are to (1) relate process parameters to figures of merit by comparing deposition and etching experiments to Monte Carlo and finite element simulations; (2) understand how to control thin liquid films in partial vacuums using in-situ liquid injection, microfluidic structures, and surfactant additives; and (3) evaluate processes for two immediate nanomanufacturing applications: nanoelectronic circuit edit and plasmonic device prototyping.