MRI: Acquisition of an Electron Beam Lithography System for Nanofabrication at the UW-Madison and Regional Universities

该主要研究仪器(MRI)项目支持在威斯康星大学麦迪逊分校和地区性大学购买电子束光刻系统。这一工具将为几所大学的大量学生、教师、研究人员和学者提供最先进的纳米制造能力。这一能力将加强从物理到电气和计算机工程，再到材料科学和生物等领域的学习和研究。要获得的仪器的一个关键属性是能够在大范围内对非常小的特征进行图案设计--例如，对于现代光子学技术来说，这种能力特别重要。威斯康星州的学生(研究生和本科生)和其他学者将直接使用该仪器来促进尖端学习和研究，在此过程中磨练他们在关键现代制造技术方面的专业知识。在威斯康星大学麦迪逊分校物理系和电子与计算机工程系的课程中加入与电子束光刻有关的新组件，将加强本科教育。新设施还将用于招收不同群体的学生到威斯康星大学麦迪逊分校学习，以及面向高中生和普通公众的外展和教育活动。将购买的仪器将满足学生在从量子设备到水质监测、从纳米结构光学亚表面到大规模碳纳米管场效应晶体管等广泛领域学习和进行研究的关键需求。该项目寻求一种能够提供低于10纳米的光刻分辨率、高速光束偏转、在500微米范围内无拼接的高分辨率以及15纳米的拼接精度的仪器。除了这些能够实现广泛研究的高端功能外，该项目中将获得的现代电子束光刻工具将提供更大的吞吐量，同时也便于经验较少的用户使用，并降低新用户的进入门槛。这些优势将增加受益于该仪器功能的用户范围。该工具将集成在威斯康星大学麦迪逊分校的洁净室内，以最大限度地发挥仪器的影响。这个洁净室用户设施包含一系列广泛的辅助工具，这些工具将加强电子束仪器的使用。这一设施还将管理和实现对仪器的广泛访问。

This Major Research Instrumentation (MRI) project supports the acquisition of an Electron Beam Lithography system at the University of Wisconsin-Madison and regional universities. This tool will provide state-of-the-art nanofabrication capabilities to a large population of students, faculty, researchers, and scholars at several universities. This capability will enhance study and research within fields ranging from physics, to electrical and computer engineering, to materials science and biology. A key attribute of the instrument to be acquired is the ability to pattern very small features across large areas - a capability that is especially important, for example, for modern photonics technology. Students (graduate and undergraduate) and other scholars around Wisconsin will directly use the instrument to facilitate cutting-edge study and research, honing their expertise in a key modern fabrication technology in the process. Undergraduate education will be enhanced by new components relating to electron beam lithography in courses in the Department of Physics and the Department of Electrical and Computer Engineering at UW-Madison. The new facility will also be used in the recruitment of a diverse group of students to UW-Madison, as well as for outreach and education activities for high school students and the general public.The instrument to be acquired will meet critical needs for students studying and performing research in a wide range of areas varying from quantum devices to water quality monitoring and from nanostructured optical metasurfaces to aggressively scaled carbon nanotube field-effect transistors. The project seeks an instrument that can provide sub-10 nm lithographic resolution, high-speed beam deflection, high resolution over a 500 micrometer field without stitching, and a stitching accuracy of 15 nm. In addition to these high-end features that will enable a broad spectrum of research, the modern electron beam lithography tool that will be acquired in this project will provide far greater throughput while also facilitating use by less experienced users and lowering the barrier to entry for new users. These advantages will increase the range of users who will benefit from the instrument's capabilities. The tool will be integrated within the University of Wisconsin-Madison cleanroom in order to maximize the instrument's impact. This cleanroom user facility contains a broad array of auxiliary tools that will enhance the use of the electron-beam instrument. This facility will also manage and enable broad access to the instrument.