MRI: Acquisition of an Electron Beam Lithography System for Nanofabrication at the UW-Madison and Regional Universities

该主要研究仪器（MRI）项目支持在威斯康星大学麦迪逊分校和地区大学获得电子束光刻系统。这个工具将提供最先进的纳米制造能力，以大量的学生，教师，研究人员和学者在几所大学。这种能力将加强在物理学、电气和计算机工程、材料科学和生物学等领域的学习和研究。要获得的仪器的一个关键属性是能够在大范围内绘制非常小的特征-例如，对于现代光子学技术来说，这一能力尤为重要。威斯康星州的学生（研究生和本科生）和其他学者将直接使用该仪器来促进尖端的学习和研究，在此过程中磨练他们在关键现代制造技术方面的专业知识。在威斯康星大学麦迪逊分校物理系和电气与计算机工程系的课程中，与电子束光刻相关的新组件将加强本科教育。新设施还将用于招收不同群体的学生到威斯康星大学麦迪逊分校，以及为高中生和公众提供外展和教育活动。该仪器将满足学生在广泛领域学习和开展研究的关键需求，从量子器件到水质监测，从纳米结构光学超表面到大规模的碳纳米管场效应晶体管。该项目寻求一种仪器，可以提供低于10纳米的光刻分辨率，高速光束偏转，500微米范围内的高分辨率，无需拼接，拼接精度为15纳米。除了这些高端功能，将使广泛的研究，现代电子束光刻工具，将在这个项目中获得将提供更大的吞吐量，同时也方便了经验不足的用户使用，并降低了新用户的进入门槛。这些优点将增加从仪器功能中受益的用户范围。该工具将集成在威斯康星大学麦迪逊分校的洁净室中，以最大限度地发挥仪器的影响。这个洁净室用户设施包含广泛的辅助工具阵列，将提高电子束仪器的使用。该设施还将管理并使人们能够广泛使用该工具。

This Major Research Instrumentation (MRI) project supports the acquisition of an Electron Beam Lithography system at the University of Wisconsin-Madison and regional universities. This tool will provide state-of-the-art nanofabrication capabilities to a large population of students, faculty, researchers, and scholars at several universities. This capability will enhance study and research within fields ranging from physics, to electrical and computer engineering, to materials science and biology. A key attribute of the instrument to be acquired is the ability to pattern very small features across large areas - a capability that is especially important, for example, for modern photonics technology. Students (graduate and undergraduate) and other scholars around Wisconsin will directly use the instrument to facilitate cutting-edge study and research, honing their expertise in a key modern fabrication technology in the process. Undergraduate education will be enhanced by new components relating to electron beam lithography in courses in the Department of Physics and the Department of Electrical and Computer Engineering at UW-Madison. The new facility will also be used in the recruitment of a diverse group of students to UW-Madison, as well as for outreach and education activities for high school students and the general public.The instrument to be acquired will meet critical needs for students studying and performing research in a wide range of areas varying from quantum devices to water quality monitoring and from nanostructured optical metasurfaces to aggressively scaled carbon nanotube field-effect transistors. The project seeks an instrument that can provide sub-10 nm lithographic resolution, high-speed beam deflection, high resolution over a 500 micrometer field without stitching, and a stitching accuracy of 15 nm. In addition to these high-end features that will enable a broad spectrum of research, the modern electron beam lithography tool that will be acquired in this project will provide far greater throughput while also facilitating use by less experienced users and lowering the barrier to entry for new users. These advantages will increase the range of users who will benefit from the instrument's capabilities. The tool will be integrated within the University of Wisconsin-Madison cleanroom in order to maximize the instrument's impact. This cleanroom user facility contains a broad array of auxiliary tools that will enhance the use of the electron-beam instrument. This facility will also manage and enable broad access to the instrument.