SBIR Phase II: Monolithic CMOS-Integration of Electroplated Copper MEMS Inertial Sensors
SBIR 第二阶段:电镀铜 MEMS 惯性传感器的单片 CMOS 集成
基本信息
- 批准号:1632268
- 负责人:
- 金额:$ 74.99万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2016
- 资助国家:美国
- 起止时间:2016-08-15 至 2020-01-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
The broader impact/commercial potential of this project can lead to a revolution in the consumer electronics market(mobile handsets, tablets, game consoles and wearables), wherein high performance, low power, small footprintmultisensing (not limited to inertial sensing) platforms with timing devices, are all directly microfabricated on a commonASIC substrate. Sensor fusion can produce unprecedented user experiences by using data collected from all sensors andprocessed using machine learning algorithms. This can further boost the sensor and timing markets that are expected toexceed $6 billion dollars by 2017. Moreover, the emergent Internet of Things (IoTs) and wearable markets are expected toreach $20 billion dollars by 2025, which can induce a rapid growth of such intelligent sensor fusion market. This can havea tremendous societal impact as wearable devices and IoT systems, interfaced with mobile platforms, can be used tomonitor people?s health, safety and energy consumption. Making these solutions affordable will make it amenable to lowincome households not only in the US but also around the world. It will also enable researchers to attain new frontiers ofknowledge such as in digital sensory systems. The long-term goals are to provide such intelligent sensor fusion solutions.This Small Business Innovative Research (SBIR) Phase 2 project seeks to demonstrate wafer-scale microfabrication ofMicro-Electro-Mechanical Systems (MEMS) inertial sensors directly on the application specific integrated circuit (ASIC)substrates, by using electroplated copper (e-Cu) as a structural material. MEMS inertial sensors, such as gyroscopes andaccelerometers, are pervasively used in consumer electronics and automotive industries. Current trends are, however,requiring higher device performance with smaller footprints, wherein multi-degree-of-freedom sensors are integrated onthe same package, to enable new capabilities and user experiences. These requirements can be met by monolithicallyfabricating inertial sensors on ASIC substrates, which is complex to achieve with silicon as a structural material. Using e-Cu, which is currently used for ASIC metal interconnects, as the structural material, can enable easier routing toimplement optimized mechanical structures, smaller dimensions given the high density of copper, extremely low cost asno wafer bonding is required, smaller form factors, multiple sensors on a single die, and much smaller parasitics providinglow noise and higher performance. Phase II tasks will be to wafer-scale fabricate an inertial measurement unit that ismonolithically integrated with its ASIC with optimal performance parameters.
该项目的广泛影响/商业潜力可能会导致消费电子市场(手机,平板电脑,游戏机和可穿戴设备)的革命,其中高性能,低功耗,小占地多传感(不限于惯性传感)平台与定时装置,都是直接在通用asic基板上微制造的。通过使用从所有传感器收集的数据并使用机器学习算法进行处理,传感器融合可以产生前所未有的用户体验。这将进一步推动传感器和定时市场,预计到2017年将超过60亿美元。此外,到2025年,新兴的物联网(iot)和可穿戴市场预计将达到200亿美元,这将导致此类智能传感器融合市场的快速增长。这可能会产生巨大的社会影响,因为可穿戴设备和物联网系统,与移动平台相连,可以用来监控人们。健康、安全、节能。使这些解决方案负担得起,将使其不仅适用于美国的低收入家庭,也适用于全球的低收入家庭。它还将使研究人员能够获得新的知识前沿,如数字感官系统。长期目标是提供这种智能传感器融合解决方案。这个小型企业创新研究(SBIR)第二阶段项目旨在通过使用电镀铜(e-Cu)作为结构材料,直接在特定应用集成电路(ASIC)基板上演示微机电系统(MEMS)惯性传感器的晶圆级微制造。MEMS惯性传感器,如陀螺仪和加速度计,广泛应用于消费电子和汽车行业。然而,目前的趋势是要求更高的设备性能和更小的占地面积,其中多自由度传感器集成在同一个封装上,以实现新的功能和用户体验。这些要求可以通过在ASIC衬底上单片制造惯性传感器来满足,而用硅作为结构材料来实现是很复杂的。使用目前用于ASIC金属互连的e-Cu作为结构材料,可以更容易地实现优化的机械结构,更小的尺寸(由于铜的高密度),极低的成本(因为不需要晶圆键合),更小的外形尺寸,单个芯片上的多个传感器,以及更小的寄生体,提供低噪音和更高的性能。第二阶段的任务将是圆片级制造惯性测量单元,该单元与ASIC集成在一起,具有最佳性能参数。
项目成果
期刊论文数量(0)
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Noureddine Tayebi其他文献
Novel Nanoscale Patch-Clamp Arrays for Probing Neuronal Electrical Activities
- DOI:
10.1016/j.bpj.2011.11.1654 - 发表时间:
2012-01-31 - 期刊:
- 影响因子:
- 作者:
Noureddine Tayebi;Katie G. Chang;Nicholas Melosh - 通讯作者:
Nicholas Melosh
Reconciliation of nanoscratch hardness with nanoindentation hardness including the effects of interface shear stress
- DOI:
10.1557/jmr.2004.0425 - 发表时间:
2004-11-01 - 期刊:
- 影响因子:2.900
- 作者:
Noureddine Tayebi;Thomas F. Conry;Andreas A. Polycarpou - 通讯作者:
Andreas A. Polycarpou
Noureddine Tayebi的其他文献
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{{ truncateString('Noureddine Tayebi', 18)}}的其他基金
SBIR Phase I: Monolithic CMOS-Integration of Electroplated Copper MEMS Inertial Sensors
SBIR 第一阶段:电镀铜 MEMS 惯性传感器的单片 CMOS 集成
- 批准号:
1447397 - 财政年份:2015
- 资助金额:
$ 74.99万 - 项目类别:
Standard Grant
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