High-Throughput Nanometer-Scale Chemical Patterning for Nanomanufacturing

用于纳米制造的高通量纳米级化学图案化

• 批准号: 1636136
• 负责人: Paul Weiss
• 金额: $ 30万
• 依托单位: University of California-Los Angeles
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2016
• 资助国家: 美国
• 起止时间: 2016-10-01 至 2019-09-30
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=1636136&HistoricalAwards=false
• 关键词: Throughput; Nanometer; Scale; Chemical; Patterning

This award investigates a new large-area patterning method to create patterns with nanometer-scale resolution and feature size. This new method combines carefully designed and shaped polymer pen arrays with controlled stiffness for lithography with precise chemistry and self-assembly to reach single-nanometer resolution across large areas. This project focuses on the following research thrusts: 1) Develop new mechanisms to achieve high pattern fidelity, while minimizing the diffusion of ink molecules that leads to pattern blurring and thus resolution loss; 2) Develop an accessible and broadly applicable method to achieve large-area polymer stamps with single-nanometer-scale features; and 3) Achieve large-area feature-size-tunable patterning with nanometer-scale resolution. Education, training, research, and nanomanufacturing will be tightly coupled to teaching, outreach, and broad dissemination. Students and post-doctoral candidates will work at the California NanoSystems Institute (CNSI), the interdisciplinary hub at UCLA, which will also provide analysis tools and dissemination of the advances. The diverse fabrication needs of CNSI users will help drive development and application of this new method.The fundamental research from this award will advance nanolithography to realize high-fidelity nanometer-scale resolution over large areas, one of the greatest challenges in nanoscale pattering, via polymer-pen chemical lift-off lithography. The proposed research will provide a new method to eliminate the lateral diffusion of ink molecules in soft lithography, which limits resolution to ~100nm, or worse, in conventional microcontact printing. High-fidelity single-nanometer-scale precision with sub-100nm feature sizes can be realized. The proposed strategies will provide methods to control precisely the feature size of the pattern at nanometer-scale resolution. This research will enable the manufacture of controllable sub-5nm features at large scales, a capability not yet achievable by other means, even serial techniques, such as electron-beam lithography. This technique will develop general, accessible technological strategies to push resolution to and below 5 nm. The proposed research will directly impact the field of nanomanufacturing, which will be advanced by innovative designs, transformative, scalable, high-throughput methods, greatly improved resolution, better understanding of nanoscale phenomena and processing, and interdisciplinary studies involving surface chemistry, mechanics, materials science, electronics, and biology. This research will be applied in a wide range of applications from electronics to energy and biology, including plasmonic nanostructured devices, single-molecule biological studies, biochemical sensors, wearable electronics, energy-storage and conversion devices, optical filters, biomedical devices, with improved performance due to precise control of pattern fidelity.

该奖项研究了一种新的大面积图案化方法，以创建具有纳米级分辨率和特征尺寸的图案。这种新方法将精心设计和成形的聚合物笔阵列与精确化学和自组装的光刻控制刚度相结合，以在大面积上达到单纳米分辨率。该项目的重点是以下研究方向：1）开发新的机制，以实现高图案保真度，同时最大限度地减少油墨分子的扩散，导致图案模糊，从而降低分辨率; 2）开发一种可访问的和广泛适用的方法，以实现具有单纳米级特征的大面积聚合物印模; 3）实现具有纳米级分辨率的大面积特征尺寸可调图案化。教育、培训、研究和纳米制造将与教学、推广和广泛传播紧密结合。学生和博士后候选人将在加州大学洛杉矶分校的跨学科中心加州纳米系统研究所（CNSI）工作，该研究所还将提供分析工具和传播进展。CNSI用户的多样化制造需求将有助于推动这一新方法的开发和应用。该奖项的基础研究将推动纳米光刻技术的发展，通过聚合物笔化学剥离光刻技术实现大面积高保真纳米级分辨率，这是纳米级图案化的最大挑战之一。这项研究将提供一种新的方法来消除软光刻中油墨分子的横向扩散，这种扩散将传统微接触印刷的分辨率限制在~ 100 nm或更低。可以实现具有亚100 nm特征尺寸的高保真单纳米级精度。所提出的策略将提供方法来精确地控制在纳米级分辨率的图案的特征尺寸。这项研究将使大规模制造可控的亚5纳米特征成为可能，这是其他手段（甚至是电子束光刻等系列技术）尚未实现的能力。该技术将开发通用的、可访问的技术策略，以将分辨率推到5 nm或以下。拟议的研究将直接影响纳米制造领域，这将通过创新设计，变革，可扩展，高通量方法，大大提高分辨率，更好地理解纳米级现象和处理以及涉及表面化学，力学，材料科学，电子学和生物学的跨学科研究来推进。这项研究将应用于从电子到能源和生物学的广泛应用，包括等离子体纳米结构器件，单分子生物学研究，生物化学传感器，可穿戴电子器件，能量存储和转换器件，光学滤波器，生物医学设备，由于精确控制图案保真度而提高了性能。

项目成果

Precision-Guided Nanospears for Targeted and High-Throughput Intracellular Gene Delivery

用于靶向和高通量细胞内基因传递的精确引导纳米矛

• DOI: 10.1021/acsnano.8b00763
• 发表时间: 2018
• 期刊: ACS Nano
• 影响因子: 17.1
• 作者: Xu Xiaobin;Hou Shuang;Wattanatorn Natcha;Wang Fang;Yang Qin;Zhao Chuanzhen;Yu Xiao;Tseng Hsian-Rong;Jonas Steven J.;Weiss Paul S.
• 通讯作者: Weiss Paul S.

Polymer-Pen Chemical Lift-Off Lithography

• DOI: 10.1021/acs.nanolett.7b01236
• 发表时间: 2017-05-01
• 期刊: NANO LETTERS
• 影响因子: 10.8
• 作者: Xu, Xiaobin;Yang, Qing;Weiss, Paul S.
• 通讯作者: Weiss, Paul S.

Self-Collapse Lithography

• DOI: 10.1021/acs.nanolett.7b02269
• 发表时间: 2017-08-01
• 期刊: NANO LETTERS
• 影响因子: 10.8
• 作者: Zhao, Chuanzhen;Xu, Xiaobin;Weiss, Paul S.
• 通讯作者: Weiss, Paul S.

Advancing Biocapture Substrates via Chemical Lift-Off Lithography

• DOI: 10.1021/acs.chemmater.7b01970
• 发表时间: 2017-08-22
• 期刊: CHEMISTRY OF MATERIALS
• 影响因子: 8.6
• 作者: Cao, Huan H.;Nakatsuka, Nako;Andrews, Anne M.
• 通讯作者: Andrews, Anne M.

Multiple-Patterning Nanosphere Lithography for Fabricating Periodic Three-Dimensional Hierarchical Nanostructures

用于制造周期性三维分层纳米结构的多重图案纳米球光刻

• DOI: 10.1021/acsnano.7b05472
• 发表时间: 2017
• 期刊: ACS Nano
• 影响因子: 17.1
• 作者: Xu, Xiaobin;Yang, Qing;Wattanatorn, Natcha;Zhao, Chuanzhen;Chiang, Naihao;Jonas, Steven J.;Weiss, Paul S.
• 通讯作者: Weiss, Paul S.