Lithographic Patterning of Co-Dispersed Nanomaterials for Device Applications
Lithographic Patterning of Co-Dispersed Nanomaterials for Device Applications
批准号:
1661564
负责人:
Kathy Lu
金额:
$30.22万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2017
资助国家:
美国
项目状态:
已结题
起止时间:
2017-06-01 至 2021-05-31
中文摘要
在柔性或刚性基底上制成纳米级图案阵列的杂化无机纳米颗粒-聚合物基质复合材料提供了广泛的新颖的光学和电子性质。新的器件可以从中间尺度特征创建,其中可以访问和控制分子和本体行为之间的过渡性质。为了实现这种杂化材料的纳米制造,需要开发低成本、灵活、简单和可扩展的方法,以有效地将无机和有机物质组织成大量具有不同功能的特征。自组装容易形成缺陷,并且基于探针和电子束的光刻技术对于大规模生产来说通常太慢。该奖项研究了一种广泛适用的纳米压印光刻工艺,用于图案化纳米颗粒-聚合物混合复合材料,并将其用于制造纳米级光学和电子器件。这是通过使用分散在有机溶剂中的纳米颗粒来实现的,所述有机溶剂可以快速填充纳米压印聚合物模具,然后固结以形成具有高纳米颗粒负载的图案化特征。该项目为研究生和本科生提供培训。计划在弗吉尼亚理工大学校园和西弗吉尼亚科学博物馆举办几次外展活动,以增加女性和少数民族在工程领域的入学人数。纳米压印光刻可以在大尺度上以高保真度和可重复性转移纳米级图案。然而,大多数研究都集中在纯聚合物材料系统上。该项目通过解决纳米颗粒和聚合物(单体)在有机溶剂中共分散的关键科学挑战,并利用分散溶剂的蒸发性质和聚合物链从分散和可溶状态到固态的转变将纳米颗粒和聚合物共悬浮液图案化为纳米尺度特征,探索纳米颗粒-聚合物混合图案化的纳米压印光刻。研究工作充分探索了在聚合物链存在下纳米颗粒在有机溶剂中分散的不同方法。对纳米颗粒-聚合物共分散和光刻成型过程中有机溶剂蒸发的理解有望推动新型混合图案形成的边界。与传统的纳米压印光刻相比,它只使用聚合物材料,一类新的混合材料具有复杂的结构和新颖的功能。混合图案可提供广泛的特征布置以供直接装置使用。这一研究方法结合了粒子-溶剂-聚合物和液-固边界领域的知识,具有巨大的科学和应用潜力。
英文摘要
Hybrid inorganic nanoparticle-polymer matrix composite materials that are fabricated into nanoscale pattern arrays on a flexible or rigid substrate offer a wide range of novel optical and electronic properties. New devices can be created from intermediate scale features where transitional properties between molecular and bulk behaviors can be accessed and controlled. To realize nanomanufacturing of such hybrid materials, low-cost, flexible, simple, and scalable methods need to be developed to efficiently organize inorganic and organic species into a large number of features with distinct functions. Self-assembly is prone to defect formation and probe- and e-beam-based lithography techniques are often too slow for mass production. This award investigates a broadly applicable nanoimprint lithography process for patterning nanoparticle-polymer hybrid composite materials and to use them to manufacture nano-scale optical and electronic devices. This is accomplished by using nanoparticles dispersed in organic solvents that can fill nanoimprinted polymer molds quickly and then be consolidated to form patterned features with high nanoparticle loadings. The project provides training to both graduate and undergraduate students. Several outreach activities on the Virginia Tech campus and summer camps at Science Museum of Western Virginia are planned to increase the enrollment of females and minorities in engineering.Nanoimprint lithography can transfer nanoscale patterns with high fidelity and repeatability in large scales. However, most of the research has been focused on pure polymeric material systems. This project explores nanoimprint lithography for nanoparticle-polymer hybrid patterning by addressing the key scientific challenges of nanoparticle and polymer (monomer) co-dispersion in organic solvents and patterning the nanoparticle and polymer co-suspensions into nano-scale features using the evaporative nature of dispersing solvents and the polymer chain transition from dispersed and soluble state to solid state. The research work fully explores different methods of nanoparticle dispersion in organic solvents in the presence of polymeric chains. The understanding of nanoparticle-polymer co-dispersion and organic solvent evaporation during lithographic molding promises to push the boundaries of novel hybrid pattern formation. In contrast to traditional nanoimprint lithography, which uses polymer materials only, a new class of hybrid materials with intricate architectures and novel functionalities is expected. The hybrid patterns can offer a wide range of feature arrangements for direct device uses. This holds great scientific and application potentials by combining the knowledge at the boundaries of the particle-solvent-polymer and liquid-solid domains.
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会议论文
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