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Horizontal Ribbon Growth of Single-Crystal Silicon

Horizontal Ribbon Growth of Single-Crystal Silicon
单晶硅的水平带生长
批准号:
1762802
负责人:
Brian Helenbrook
金额:
$51.35万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2018
资助国家:
美国
项目状态:
已结题
起止时间:
2018-09-01 至 2022-08-31

项目摘要

项目成果

Brian Helenbrook的其他基金

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中文摘要
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英文摘要
The manufacture of high efficiency solar cells to convert solar energy to electrical energy currently makes use of a process known as the Czochralski growth process to fabricate high quality silicon wafers. A lower-cost, more efficient manufacturing approach for manufacturing these high quality single-crystal silicon wafers, called horizontal ribbon growth, has been developed. Compared to Czochralski growth, horizontal ribbon growth has the potential to produce thinner and larger wafers at a faster rate and a lower cost, with up to 75% potential cost savings. Commercialization of the horizontal ribbon growth process has been difficult, however, due to a lack of fundamental understanding of the physics that control this process. This award supports research that will contribute new knowledge related to a novel process for manufacturing single-crystal silicon wafers called horizontal ribbon growth. There are currently no models of the process that predict all of the phenomena observed in horizontal ribbon growth experiments. Most importantly, the maximum growth rates attainable have yet to be predicted. The goal of this work is to develop a model of the process that can predict the experimentally observed phenomena including the maximum growth rates. This model will then be used optimize the process so that it can be successfully commercialized. This has the potential to promote the development of new U.S. industries and to bring down the cost of solar energy to the point that solar energy would be cheaper than any other energy source. In addition, this research will contribute to work force training in the areas of fluid mechanics, thermal engineering, and materials science as well as broaden the participation of underrepresented groups in engineering research.There are currently no models that can accurately predict the horizontal ribbon growth process, and there are many experimental phenomena that occur that are unexplained. Developing a predictive model will give a greater understanding of the process, which will reduce the time and costs needed for commercialization. Because horizontal ribbon growth is not well-understood or studied, there is also an opportunity to make significant fundamental advances in our understanding of solidification kinetics. Studies at molecular to continuum scales will be used to understand and develop predictive models of the processes occurring. This understanding will then be applied to optimize the process and could also lead improvements in other crystal manufacturing processes.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
期刊论文(5)
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会议论文
DOI: 10.1016/j.jcrysgro.2020.125958
发表时间: 2020-11
期刊: Journal of Crystal Growth
影响因子: 1.8
作者: [A. Pirnia;B. Helenbrook]
通讯作者: A. Pirnia;B. Helenbrook
Buoyancy and Marangoni effects on horizontal ribbon growth
浮力和马兰戈尼对水平带生长的影响
DOI: 10.1016/j.jcrysgro.2022.126822
发表时间: 2022
期刊: Journal of Crystal Growth
影响因子: 1.8
作者: [Bagheri-Sadeghi, Nojan, Helenbrook, Brian T.]
通讯作者: Helenbrook, Brian T.
Sensitivity of horizontal ribbon growth to solidification kinetics
水平带生长对凝固动力学的敏感性
DOI: 10.1016/j.jcrysgro.2022.127038
发表时间: 2023
期刊: Journal of Crystal Growth
影响因子: 1.8
作者: [Bagheri-Sadeghi, Nojan, Fabiyi, Victor A., Helenbrook, Brian T., Paek, Eunsu]
通讯作者: Paek, Eunsu
Physics of double faceted crystal growth in solidification processes
凝固过程中双面晶体生长的物理学
DOI: 10.1016/j.jcrysgro.2022.126517
发表时间: 2022
期刊: Journal of Crystal Growth
影响因子: 1.8
作者: [Pirnia, Alireza, Helenbrook, Brian T.]
通讯作者: Helenbrook, Brian T.
Fundamentals of Heterogeneous Nucleation with Application to the Optimization of Horizontal Ribbon Growth
  • 批准号:
    2317674
  • 项目类别:
    Continuing Grant
  • 资助金额:
    $55.41万
  • 财政年份:
    2023
  • 负责人:
    Brian Helenbrook
  • 依托单位:
Reduced Basis Element Methods for Thermal Modeling of Integrated Circuits
  • 批准号:
    1217136
  • 项目类别:
    Standard Grant
  • 资助金额:
    $15.02万
  • 财政年份:
    2012
  • 负责人:
    Brian Helenbrook
  • 依托单位:
Collaborative Research: An adaptive hp-Finite Element Method for Two Fluid Flows with Topological Change
  • 批准号:
    0513380
  • 项目类别:
    Standard Grant
  • 资助金额:
    $3.88万
  • 财政年份:
    2005
  • 负责人:
    Brian Helenbrook
  • 依托单位:
国内基金
海外基金
Piccolino调控CaV1.3分布影响Ribbon突触的时间信息处理能力
  • 批准号:
    82071040
  • 项目类别:
    面上项目
  • 资助金额:
    54.0万元
  • 批准年份:
    2020
  • 负责人:
    陈正侬
  • 依托单位:
FGF22耳蜗局部转染防治噪声所致的Ribbon突触损伤
  • 批准号:
    81400466
  • 项目类别:
    青年科学基金项目
  • 资助金额:
    23.0万元
  • 批准年份:
    2014
  • 负责人:
    周慧群
  • 依托单位:
NT-3耳蜗局部转染对抗噪声所介导的Ribbon突触损伤
  • 批准号:
    81300823
  • 项目类别:
    青年科学基金项目
  • 资助金额:
    23.0万元
  • 批准年份:
    2013
  • 负责人:
    夏力
  • 依托单位: