Intergovernmental Personnel Award
Intergovernmental Personnel Award
批准号:
2016297
负责人:
Raymond Adomaitis
金额:
$23.45万
依托单位国家:
美国
项目类别:
Intergovernmental Personnel Award
财政年份:
2020
资助国家:
美国
项目状态:
已结题
起止时间:
2020-01-06 至 2023-01-05
中文摘要
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英文摘要
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
Travel Grant for 9th World Congress of Chemical Engineering, August 18-23, 2013 in Seoul, Korea
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批准号:1321610
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项目类别:Standard Grant
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资助金额:$2.97万
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财政年份:2013
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负责人:Raymond Adomaitis
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依托单位:
GOALI: Physically Based Models of Atomic Layer Deposition for High-Throughput Reactor Design
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批准号:1160132
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项目类别:Standard Grant
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资助金额:$29.65万
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财政年份:2012
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负责人:Raymond Adomaitis
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依托单位:
Photoelectrochemical Films for Solar H2 Production: A Combinatorial CVD Approach
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批准号:0828410
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项目类别:Standard Grant
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资助金额:$32.5万
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财政年份:2008
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负责人:Raymond Adomaitis
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依托单位:
The Nearest Uniformity Producing Profile (NUPP): A Generalized Optimization Criterion for Thin-Film Processing Applications
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批准号:0554045
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项目类别:Continuing Grant
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资助金额:$30.73万
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财政年份:2006
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负责人:Raymond Adomaitis
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依托单位:
ITR: Spatially Programmable Equipment: A New Design Paradigm for Semiconductor Manufacturing Enabled by Information Technology
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批准号:0219200
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项目类别:Standard Grant
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资助金额:$49.92万
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财政年份:2002
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负责人:Raymond Adomaitis
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依托单位:
SGER: Simulation-Based Design and Prototype Testing of a Programmable Chemical Vapor Deposition Reactor
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批准号:0085633
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项目类别:Standard Grant
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资助金额:$8.46万
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财政年份:2000
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负责人:Raymond Adomaitis
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依托单位:
A Rapid Prototyping Approach to Semiconductor Device Manufacturing Process Simulation
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批准号:0082381
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项目类别:Standard Grant
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资助金额:$17.05万
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财政年份:2000
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负责人:Raymond Adomaitis
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依托单位:
海外基金