A Rapid Prototyping Approach to Semiconductor Device Manufacturing Process Simulation

0082381 Adomaitis我们建议开发的计算框架，将有可能快速原型的方法来模拟微电子器件制造工艺系统的开发。本研究旨在填补基于超级计算机的高分辨率模拟和集总参数模型之间存在的差距，该范围目前由过程模拟，分析，模型简化和参数估计的专用方法-通常相互不兼容的数值工具所涵盖。所提出的方法，以过程模拟的基础上开发的计算元素，有一个一对一的对应时，实施高维投影，光谱滤波和先进的加权残差方法，如减少的基础和非线性Galerkin投影的步骤。 评估模型有效性的方法;解决方案分析（例如，稳定性），并且离散化误差将在该框架中得到解决。事实上，由于它依赖于参数估计方法，在这个模拟框架中总是会产生简化模型预测能力的绝对度量。这些相互连接的计算工具将在MATLAB环境下开发，利用MATLAB面向对象的编程特性，简化复杂系统的模拟，并为将我们的模拟工具纳入光谱元件和其他商业软件包中创造一条途径，以满足生成计算效率高经过验证的模拟，化学气相沉积和其它半导体材料制造单元操作中的晶片处理均匀性为此提供了主要动机research. 简化模型适用于实时和运行到运行的控制，有效的工艺配方优化，以及基于模型的传感和不可测量的过程，如微特征演变的估计。 该提案将通过研究生实习支持PI和英特尔的Tecbnology CAD组之间的联合研究，旨在在企业研究环境中测试仿真工具。这种方法的基本要素也将在商业化学气相沉积（CVD）集群工具位于马里兰州大学的背景下开发，其目标是产生一个有效的，减少模型用于晶圆温度预测和共形CVD研究。 ***

0082381AdomaitisWe propose to develop the computational framework that will make possible a rapid proto-typing approach to simulator development for microelectronic device fabrication process systems. This research is intended to fill the gap that exists between supercomputer-based, highly resolved simulations and lumped-parameter models, a range currently spanned by specialized methods for process simulation, analysis, model reduction, and parameter estimation - numerical tools that are generally incompatible with each other. The proposed approach to process simulation is based on developing computational elements that have a one-to-one correspondence to the steps taken when implementing high-dimensional projection, spectral filtering and advanced weighted residual methods, such as the reduced basis and nonlinear Galerkin projections. Methods for assessing model validity; solution analysis (e.g., stability), and discretization error will be addressed in this framework. Indeed, because of its reliance on parameter estimation methods, an absolute measure of reduced-model predictive power always will be produced in this simulation framework. These interconnected computational tools will be developed in the MATLAB environment, taking advantage of MATLAB's object-oriented programming features to simplify simulations of complex systems and to create a pathway to incorporating our simulation tools in spectral element and other commercial software packages.The need to generate computationally efficient, validated simulations for improving across-wafer processing uniformity in chemical vapor deposition and other semiconductor materials manufacturing unit operations provides the primary motivation for this research. Reduced models are suitable for real-time and run-to-run control, efficient process recipe optimization, and model-based sensing and estimation of unmeasurable processes, such as microfeature evolution. This proposal will support the joint research between the PI and the Tecbnology CAD group of Intel through a graduate student internship aimed at testing the simulation tools in a corporate research environment. The basic elements of this approach also will be developed in the context of a commercial chemical vapor deposition (CVD) cluster tool located at the University of Maryland, with the goal of producing a validated, reduced model to be used for wafer temperature prediction and conformal CVD studies. ***