SGER: Simulation-Based Design and Prototype Testing of a Programmable Chemical Vapor Deposition Reactor

SGER：可编程化学气相沉积反应器的基于仿真的设计和原型测试

• 批准号: 0085633
• 负责人: Raymond Adomaitis
• 金额: $ 8.46万
• 依托单位: University of Maryland, College Park
• 依托单位国家: 美国
• 项目类别: Standard Grant
• 财政年份: 2000
• 资助国家: 美国
• 起止时间: 2000-08-01 至 2002-07-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=0085633&HistoricalAwards=false
• 关键词: SGER; Simulation; Based; Design; Prototype

Abstract - Adomaitis - 0085633 An exploratory research program is planned to design a chemical vapor deposition (CVD) reactor that will enable across-wafer spatial control of deposition characteristics. An existing CVD reactor will be modified and used to generate data for developing a detailed simulator for reactor design and operation. The goals are to evaluate the actuation capabilities of this programmable reactor and establish its process simulation, optimization, sensing, and control requirements. The research is expected to demonstrate proof of concept for an entirely new mode of CVD processing.Specific tasks will include:(1) Proving a new concept for CVD reactor design that will demonstrate spatially controllable reactant delivery to the wafer: This will enable across-wafer uniformity to be achieved at virtually any process design point desired for material performance or manufacturing throughput. It will also allow intentional, programmed non-uniformity to reduce cost and time in process development.(2) Developing object-oriented simulation-based design, analysis, optimization, and process control tools for the programmable CVD reactor system.(3) Establishing a prototype for the next generation of CVD reactors for use in a materials development environment for conducting combinatorial CVD studies to rapidly evaluate new processes and materials.(4) Demonstrating a concept in semiconductor processing equipment design that can be extended to other important manufacturing processes, including plasma-enhanced CVD, reactive ion etching, and possibly liquid-phase processes such as wafer cleaning and plating.

摘要 - Adomaitis - 0085633 一项探索性研究计划计划设计一种化学气相沉积 (CVD) 反应器，以实现沉积特性的跨晶圆空间控制。 现有的 CVD 反应器将被修改并用于生成数据，以开发用于反应器设计和操作的详细模拟器。 目标是评估该可编程反应器的驱动能力并确定其过程模拟、优化、传感和控制要求。 该研究预计将证明一种全新的 CVD 加工模式的概念验证。具体任务将包括：(1) 证明 CVD 反应器设计的新概念，该概念将展示空间可控的反应物输送到晶圆：这将使在材料性能或制造吞吐量所需的几乎任何工艺设计点实现跨晶圆均匀性。 它还将允许有意的、编程的非均匀性，以减少工艺开发的成本和时间。(2) 为可编程 CVD 反应器系统开发基于面向对象的模拟设计、分析、优化和工艺控制工具。(3) 建立下一代 CVD 反应器的原型，用于材料开发环境，以进行组合 CVD 研究，以快速评估新工艺和材料。(4) 展示一个概念 半导体加工设备设计可扩展到其他重要的制造工艺，包括等离子体增强 CVD、反应离子蚀刻，以及可能的液相工艺，例如晶圆清洗和电镀。