MRI: Acquisition of a Powder ALD/CVD Reactor for Next Generation Nanomanufacturing
MRI:采购用于下一代纳米制造的粉末 ALD/CVD 反应器
基本信息
- 批准号:2117205
- 负责人:
- 金额:$ 51.97万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:2021
- 资助国家:美国
- 起止时间:2021-08-15 至 2024-07-31
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
This Major Research Instrumentation (MRI) award supports the acquisition of a fluidized bed vapor deposition reactor capable of applying precise nanoscale coatings to a range of materials. Such coatings can improve the processing and performance of materials in technology sectors as diverse as electronics (enabling smart dust for environmental monitoring), renewable energy and chemical processing (greatly reducing carbon emissions), additive manufacturing (improving medical implants or aerospace components), and pharmaceuticals (increasing the effectiveness of drug delivery). The instrument will allow researchers to study the details of fluidized bed processing and understand how it can be applied to new applications. The reactor will be installed within the shared-user facility at Georgia Tech’s Institute for Electronic and Nanotechnology, a node of the NSF-funded National Nanotechnology Coordinated Infrastructure, ensuring accessibility to users at Georgia Tech, the southeast region, and the country. Multiple educational activities, including the integration of course content on powder processing into the existing curriculum as well as the creation self-guided primer videos, will increase awareness of and access to the tool. While vapor deposition methods are ubiquitous in microelectronics, they are rarely used in other high-volume manufacturing situations. However, the development of fluidized bed vapor deposition reactor technology is changing the status quo, now making it technically feasible and economically viable to apply such nanomaterial coatings to previous off-limits materials (e.g., powders, fibers). The unique capabilities of this reactor will permit fundamental investigations of the (i) heat and mass transfer during the bottom-up manufacturing of electronic devices in microcapsule powders, (ii) impact of length scale and order/disorder in the optical phenomena of dispersions of complex colloidal particles, (iii) rheology of advanced feedstock for additive manufacturing and how reactants and inoculants can be used to create new materials with superior properties, (iv) interplay between weight, strength, and interfacial functionalization in on-demand recyclable carbon fiber composites, and (v) mechanisms governing mechanocatalyst operation to enable new all-electric paradigms in industrial processing. For these and related use-cases, powder agitation – via fluidization – is essential to ensure uniform deposition. Small volumes enable work with scarce samples or prototype materials. Large volumes provide the quantity of material needed to fabricate and study macroscopic objects/devices/parts and to explore manufacturing scale-up.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.
该重大研究仪器(MRI)奖支持收购能够将精确的纳米级涂层应用于一系列材料的流化床气相沉积反应器。这些涂层可以改善技术领域材料的加工和性能,如电子(实现环境监测的智能灰尘),可再生能源和化学加工(大大减少碳排放),增材制造(改善医疗植入物或航空航天部件)和制药(提高药物输送的有效性)。该仪器将使研究人员能够研究流化床处理的细节,并了解如何将其应用于新的应用。该反应堆将安装在格鲁吉亚理工学院电子和纳米技术研究所的共享用户设施内,该研究所是NSF资助的国家纳米技术协调基础设施的一个节点,确保格鲁吉亚理工学院,东南地区和国家的用户可以访问。多种教育活动,包括将粉末加工课程内容纳入现有课程以及制作自我指导入门视频,将增加对该工具的认识和使用。虽然气相沉积方法在微电子领域无处不在,但它们很少用于其他大批量制造情况。然而,流化床气相沉积反应器技术的发展正在改变现状,现在使得将这种纳米材料涂层应用于以前的禁区材料(例如,粉末、纤维)。该反应器的独特能力将允许对(i)在微胶囊粉末中自下而上制造电子器件期间的热和质量传递,(ii)复杂胶体颗粒分散体的光学现象中的长度尺度和有序/无序的影响,(iii)增材制造先进原料的流变学以及如何使用反应物和孕育剂来创造具有上级性能的新材料,(iv)在按需可回收碳纤维复合材料中重量、强度和界面功能化之间的相互作用,以及(v)控制机械催化剂操作以在工业加工中实现新的全电范例的机制。对于这些和相关的使用情况,粉末搅拌-通过流化-是必不可少的,以确保均匀的沉积。小体积使工作与稀缺的样品或原型材料。大批量提供所需材料的数量来制造和研究宏观物体/设备/部件,并探索制造规模扩大。该奖项反映了NSF的法定使命,并已被认为是值得通过使用基金会的智力价值和更广泛的影响审查标准进行评估的支持。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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{{ truncateString('Michael Filler', 18)}}的其他基金
Collaborative Research: Controlling Process Variability in Bottom-up Nanoelectronic Devices
合作研究:控制自下而上纳米电子器件的工艺变异性
- 批准号:
2109040 - 财政年份:2021
- 资助金额:
$ 51.97万 - 项目类别:
Standard Grant
Modular Electronic Devices by Selective Co-axial Lithography of Nanowire Semiconductors
采用纳米线半导体选择性同轴光刻技术的模块化电子器件
- 批准号:
1916953 - 财政年份:2019
- 资助金额:
$ 51.97万 - 项目类别:
Standard Grant
Reaction/Transport Behavior in the Synthesis of Functionally-Encoded Nanowires via the Geode Process
通过 Geode 过程合成功能编码纳米线的反应/传输行为
- 批准号:
1805015 - 财政年份:2018
- 资助金额:
$ 51.97万 - 项目类别:
Standard Grant
Collaborative Research: Identifying and Controlling Conductivity Variations in Semiconductor Nanowires
合作研究:识别和控制半导体纳米线的电导率变化
- 批准号:
1603904 - 财政年份:2016
- 资助金额:
$ 51.97万 - 项目类别:
Standard Grant
UNS: Deep Sub-wavelength Thermal Radiation Localization and Transport
UNS:深亚波长热辐射定位和传输
- 批准号:
1510934 - 财政年份:2015
- 资助金额:
$ 51.97万 - 项目类别:
Standard Grant
CAREER: Process-Structure-Property Relationships for Rational Engineering of Semiconductor Nanowires
职业:半导体纳米线合理工程的工艺-结构-性能关系
- 批准号:
1150755 - 财政年份:2012
- 资助金额:
$ 51.97万 - 项目类别:
Standard Grant
Rational Engineering of Semiconductor Nanowire Crystal Structure for Next Generation Energy Conversion Devices
用于下一代能量转换器件的半导体纳米线晶体结构的合理工程
- 批准号:
1133563 - 财政年份:2011
- 资助金额:
$ 51.97万 - 项目类别:
Standard Grant
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