Collaborative Research: Photoassisted CVD for Low Temperature Area Selective Deposition

非技术摘要在材料研究部陶瓷和固态与材料化学项目的支持下，德克萨斯大学达拉斯分校的 Amy Walker 教授和佛罗里达大学的 Lisa McElwee-White 教授正在开发光驱动化学合成方法，以在热敏感而无法承受传统金属沉积方法的表面上制备金属图案。 该工艺称为光辅助化学气相沉积 (PACVD)，可在电子设备制造过程中实现材料的区域选择性沉积。 Walker 和 McElwee-White 教授正在使用一种新方法高精度地生长金属薄膜：在称为自组装单分子层的规则排列的分子区域上进行 PACVD，其中分子的末端可以选择用于特定的化学反应。 通过布置反应性末端和非反应性末端的区域，可以控制金属在表面上的放置。 未来，用于金属薄膜的新型低温沉积技术可以在玻璃或陶瓷材料上形成具有互连的层状异质结构材料，而不会损坏精心定制的微观结构。 因此，进步可能会导致从传感器到能量收集设备等技术的制造改进。其他领域，例如将有机电子器件集成到布料或塑料支架上，也可以从该项目中获得的见解中受益。 从事这个跨学科项目的研究生和本科生学习在学术界和工业界都很有价值的技术和协作技能，为他们从事各种职业做好准备。 为了向公众传达科学的兴奋点，PI 制作了一系列 90 秒的“Tiny Tech”无线电模块和播客，以材料和基于化学的纳米科学的现实世界应用为特色。技术摘要拟议工作的目标是开发一种新型区域选择性沉积 (ASD) 方法，其中采用低温光辅助化学气相沉积 (PACVD) 工艺将金属选择性沉积到功能化热敏材料上。器件结构尺寸的不断缩小给传统的自上而下的光刻方法带来了重大挑战。 相比之下，ASD 只会在所需区域（目标“生长”表面）沉积材料，而无需那么多复杂的光刻步骤。因此，开发可靠的低温 ASD 金属薄膜作为涉及玻璃材料或定制陶瓷基板以及有机材料的异质结构的一部分，对于包括能量收集、传感、磁电子学和有机电子学在内的许多技术至关重要。 所提出的 ASD 方法依赖于基于机制的前体设计，该前体在光解时产生与生长表面上的特定官能团反应的中间体，使金属沉积物成核。 非生长表面将被与中间体不反应（或反应性较低）的基团功能化，从而导致 ASD。 在这些研究中，自组装单层 (SAM) 将用于生长和非生长表面。 SAM 具有高度组织的结构，末端官能团密度均匀，并且可以轻松图案化，从而能够对前体分子相互作用和沉积选择性进行定量研究。该奖项反映了 NSF 的法定使命，并通过使用基金会的智力价值和更广泛的影响审查标准进行评估，被认为值得支持。

Non-technical AbstractWith support from the Ceramics and the Solid State and Materials Chemistry programs in the Division of Materials Research, Professor Amy Walker of the University of Texas at Dallas and Professor Lisa McElwee-White of the University of Florida are developing light driven chemical synthesis methods to prepare patterns of metal on surfaces that are too heat sensitive to withstand conventional methods for deposition of metals. This process, called photoassisted chemical vapor deposition (PACVD), enables area-selective deposition of materials during the manufacture of electronic devices. Professors Walker and McElwee-White are growing metal films with high precision using a new approach: PACVD on regularly arranged regions of molecules called self-assembled monolayers, in which the ends of the molecules can be chosen for specific chemical reactions. By arranging regions of reactive ends and non-reactive ends, the placement of the metal on the surface can be controlled. The novel low-temperature deposition technique for metallic films could in the future enable the formation of layered heterostructured materials with interconnects on glassy or ceramic materials without damaging a carefully tailored microstructure. Thereby advances could lead to improvements in manufacturing for technologies ranging from sensors to energy harvesting equipment. Other fields, like integrating organic electronics onto cloth or plastic supports could benefit from insights gained from this project as well. Graduate and undergraduate students working on this interdisciplinary project learn technical and collaborative skills valuable in both academia and industry, preparing them for a variety of careers. To communicate the excitement of science to the general public, the PIs generate a series of 90-second “Tiny Tech” radio modules and podcasts that feature real world applications of materials and chemistry-based nanoscience.Technical AbstractThe goal of the proposed work is to develop a new class of area selective deposition (ASD) methods in which low temperature photoassisted chemical vapor deposition (PACVD) processes are employed for the selective deposition of metals onto functionalized thermally sensitive materials. The continued downscaling of device structures has led to significant challenges for conventional top-down lithographic approaches. In contrast, ASD leads to the deposition of materials only in a desired area – the target “growth” surface – without as many complex lithography steps. The development of reliable low temperature ASD of metallic thin films as part of heterostructures involving glassy materials or tailored ceramic substrates, as well as on organic materials, is therefore critical to many technologies including energy harvesting, sensing, magnetoelectronics and organic electronics. The proposed approach to ASD relies on mechanism-based design of precursors that upon photolysis, generate intermediates that react with specific functional groups on the growth surface, nucleating the metal deposit. The non-growth surface will be functionalized with groups that are unreactive (or less reactive) with the intermediates, resulting in ASD. In these studies, self-assembled monolayers (SAMs) will be used for both growth and non-growth surfaces. SAMs have highly organized structures with a uniform density of terminal functional groups and can be easily patterned enabling quantitative investigation of the precursor-molecule interactions and deposition selectivity.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.