Effect of B and N isovalent impurities on the electronic transport of GaAs and GaP based alloys for silicon photonics and photovoltaics
Effect of B and N isovalent impurities on the electronic transport of GaAs and GaP based alloys for silicon photonics and photovoltaics
批准号:
259237104
负责人:
Professor Dr. Peter J. Klar
金额:
$0.0万
依托单位国家:
德国
项目类别:
Research Grants
财政年份:
2014
资助国家:
德国
项目状态:
已结题
起止时间:
2013-12-31 至 2017-12-31
中文摘要
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英文摘要
Incorporating isovalent boron or nitrogen into GaAs, GaP and corresponding In-containing alloys is the only way to obtain high-quality monolithic growth of such III-V semiconductors on Si substrates, which is a major step towards silicon photonics, i.e. the integration of III-V optoelectronics and silicon electronics on the same substrate. However, this alloying not only reduces the average lattice constant, essential for obtaining lattice-matching with silicon, but also induces, in the vicinity of the conduction band edges of these alloys, N and B related localized states which act as traps and scattering centers and thus have a negative effect on electron transport. As these alloys will be employed in the n-type contact regions of silicon photonic device structures, the impact of these intrinsic effects needs to be studied and understood in order to successfully prepare silicon photonic devices following this approach. In addition, due to the polarity difference between silicon and III-V, space charges at the interface between the materials, crossdoping, and antiphase boundaries may occur, which not only affect the transport through the interface itself, but also affects extrinsically transport in the B or N containing III-V contact layer above. We propose to perform a comprehensive study of these effects on the electronic transport by performing magnetotransport experiments under hydrostatic pressure up to 1.5 GPa in the temperature range between 1.5 and 300 K as well as vertical transport measurements. Four kind of alloy (e.g. Ga(N,As), (B,Ga)As, Ga(N,P), (B,Ga)P) grown on III-V as well as Si-substrates, which either differ with respect to the conduction band structure of the host or the character of the isovalent impurity, will be studied and compared. State-of-the-art semiconductor samples are provided by external partners. The interpretation of the experimental results will be carried out in close established cooperation with leading theoretical groups in the field.
期刊论文(2)
专著(0)
科研奖励(0)
会议论文
Effect of boron localized states on the conduction band transport in BxGa1−xP
硼局域态对 BxGa1âxP 导带输运的影响
DOI:
10.1063/1.4903244
发表时间:
2014
期刊:
Applied Physics Letters
影响因子:
4
作者:
[S. Petznick, L. Ostheim, P. J. Klar, S.Liebich, K. Volz, W. Stolz]
通讯作者:
W. Stolz
Interplay of boron localized states and electron transport in BxGa1-x As0.11 P0.89:Te
BxGa1-x As0 11 P0 89:Te 中硼局域态与电子传输的相互作用
DOI:
10.1088/0268-1242/31/7/07lt01
发表时间:
2016
期刊:
Semiconductor Science and Technology
影响因子:
1.9
作者:
[L. Ostheim, P. J. Klar, S. Liebich, P. Ludewig, K. Volz, W. Stolz]
通讯作者:
W. Stolz
Films of ordered networks of magnetic semiconductor nanowires
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批准号:5428765
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项目类别:Priority Programmes
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资助金额:$0.0万
-
财政年份:2004
-
负责人:Professor Dr. Peter J. Klar
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依托单位:
Magnetotransport in (Ga,In,Mn)As:MnAs paramagnetischen-ferromagnetischen Hybridstrukturen - Experiment und Theorie
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批准号:5428075
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项目类别:Research Grants
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资助金额:$0.0万
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财政年份:2004
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负责人:Professor Dr. Peter J. Klar
-
依托单位:
Pressure and temperature dependent studies of the nitrogen-induced band formation and the band structure of (Ga, In)(N, As) semi-conductor structures by optical spectroscopy
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批准号:5243462
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项目类别:Research Grants
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资助金额:$0.0万
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财政年份:2000
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负责人:Professor Dr. Peter J. Klar
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依托单位:
海外基金