Resonant x-ray absorption and scattering study of classical and oxide-based topological insulators (C04)

在这个项目中，我们将使用共振x射线散射来研究两个主要主题：(i)利用我们方法的探测深度和nm深度分辨率，我们计划研究掺入的Mn， Cr和Fe杂质与HgTe，¿-Sn和（Bi,Sb）2(Se,Te)3中无间隙表面态的相互作用。（ii）我们将为相关过渡金属氧化物的拓扑绝缘体的实现做出贡献，这是在钛酸盐和镍酸盐薄膜具有适当晶体取向的理论基础上所期望的。

In this project we will use resonant x-ray scattering to study two main topics: (i) Taking advantage of the probing depth and the nm depth resolution of our method, we plan to study the interaction of incorporated Mn, Cr and Fe impurities with the gapless surface states in HgTe, ¿-Sn, and (Bi,Sb)2(Se,Te)3. (ii) We will contribute to the realization of a topological insulator in correlated transition metal-oxides which is expected on theoretical grounds in titanate and nickelate films of proper crystallographic orientation.