プラズマを援用した単結晶ダイヤモンド基板の高能率ダメージフリー研磨法の開発

开发等离子体单晶金刚石基体高效无损伤抛光方法

• 批准号: 21J11028
• 负责人: LIU NIAN
• 金额: $ 0.96万
• 依托单位: Osaka University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for JSPS Fellows
• 财政年份: 2021
• 资助国家: 日本
• 起止时间: 2021-04-28 至 2023-03-31
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-21J11028/
• 关键词: PAP; Single crystal diamond; Damage-free; Material removal rate; Isotropic removal; Anisotropic removal; Cathodoluminescence; Raman spectroscopy

A single crystal diamond (SCD) substrate is processed by plasma-assisted polishing (PAP) using four types of polishing plates, the quartz glass is the most suitable to obtain an atomically smooth surface with high material removal rate.As the polishing pressure applied to the SCD substrate varied, the isotropic chemical removal action was dominant when the PAP was performed at low polishing pressures such as 62.5 kPa, whereas the anisotropic mechanically induced removal action was dominant when the PAP was performed at high polishing pressures such as 350.0 kPa. In contrast, changing the sliding speed between the polishing plate and the SCD substrate did not affect the material removal mechanism of PAP.PAP was damage-free when applied to the polishing of SCD substrate.

采用4种抛光板对单晶金刚石基板进行等离子体辅助抛光处理，结果表明，石英玻璃最适合获得原子光滑的高材料去除表面，当抛光压力较低(如62.5kPa时)时，各向同性化学去除作用占主导地位，而当抛光压力较高(如350.0 kPa时)时，各向同性化学去除作用占主导地位。相反，改变抛光板与SCD衬底之间的滑动速度并不影响PAP的材料去除机理。将PAP应用于SCD衬底的抛光是无损伤的。

项目成果

Effects of polishing pressure and sliding speed on the material removal mechanism of single crystal diamond in plasma-assisted polishing

等离子辅助抛光中抛光压力和滑动速度对单晶金刚石材料去除机理的影响

• DOI: 10.1016/j.diamond.2022.108899
• 发表时间: 2022
• 期刊: Diamond and Related Materials
• 影响因子: 4.1
• 作者: Liu Nian;Sugimoto Kentaro;Yoshitaka Naoya;Yamada Hideaki;Sun Rongyan;Kawai Kentaro;Arima Kenta;Yamamura Kazuya
• 通讯作者: Yamamura Kazuya

Comparison of surface and subsurface damage of mosaic single-crystal diamond substrate processed by mechanical and plasma-assisted polishing

• DOI: 10.1016/j.diamond.2021.108555
• 发表时间: 2021-11
• 期刊: Diamond and Related Materials
• 影响因子: 4.1
• 作者: Nian Liu;Hideaki Yamada;Naoya Yoshitaka;Kenta Sugimoto;Rongyan Sun;K. Kawai;Kenta Arima;K. Yamamura