Study on the mechanism of novel method to control oxidation by block the diffusion path at the lattice defects level

晶格缺陷水平阻断扩散路径控制氧化新方法机理研究

• 批准号: 19K22035
• 负责人: SHIBAYAMA TAMAKI
• 金额: $ 4.08万
• 依托单位: Hokkaido University
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Challenging Research (Exploratory)
• 财政年份: 2019
• 资助国家: 日本
• 起止时间: 2019-06-28 至 2022-03-31
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-19K22035/
• 关键词: Heイオン; 銅; 照射効果; 酸化; 拡散; イオン照射; 水中結晶光合成; 酸化銅; 低温酸化; ナノ結晶; 残留弾性歪; 格子欠陥

项目成果

An investigation of surface contamination introduced during He+ implantation and subsequent effects on the thermal oxidation of Cu

• DOI: 10.1016/j.apsusc.2021.152163
• 发表时间: 2021-12
• 期刊: Applied Surface Science
• 影响因子: 6.7
• 作者: Subing Yang;Y. Nakagawa;T. Shibayama

Anisotropic defect distribution in He+-irradiated 4H-SiC: effect of stress on defect distribution

He 辐照 4H-SiC 中的各向异性缺陷分布：应力对缺陷分布的影响

• DOI: 10.1016/j.actamat.2021.116845
• 发表时间: 2021
• 期刊: Acta Materialia
• 影响因子: 9.4
• 作者: Subing Yang;Yuki Nakagawa;Minako Kondo and Tamaki Shibayama
• 通讯作者: Minako Kondo and Tamaki Shibayama

Non-destructive evaluation of the strain distribution in ion irradiated wide-gap semiconductors for MOSFETs

MOSFET 离子辐照宽带隙半导体应变分布的无损评估

• 发表时间: 2022
• 作者: T. Shibayama;Subing Yang;Y. Nakagawa and H. Kishimoto
• 通讯作者: Y. Nakagawa and H. Kishimoto

Tailored copper oxidation in alkaline aqueous solution after helium cation implantation

• DOI: 10.1016/j.apsusc.2022.153087
• 发表时间: 2022-03
• 期刊: Applied Surface Science
• 影响因子: 6.7
• 作者: Subing Yang;Y. Nakagawa;T. Shibayama

Univ. of Science and Technology Beijing(中国)

北京科技大学（中国）