Magentic tunnel junctions with semiconductor tunneling barrier
Magentic tunnel junctions with semiconductor tunneling barrier
批准号:
20H02186
负责人:
KASAI Shinya
金额:
$11.07万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2020
资助国家:
日本
项目状态:
已结题
起止时间:
2020-04-01 至 2023-03-31
中文摘要
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英文摘要
期刊论文(1)
专著(0)
科研奖励(0)
会议论文
磁性材料薄膜ヘテロ接合:超薄膜ヘテロ接合と磁気輸 送物性
磁性材料薄膜异质结:超薄膜异质结与磁输运特性
DOI:
--
发表时间:
2023
期刊:
影响因子:
--
作者:
[Yamada Koki, Tanaka Yuichi, 葛西伸哉]
通讯作者:
葛西伸哉
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海外基金