Influencing the arc behavior in cascaded single-arc DC plasma generator (DC-EKEAPG) to improve process stability and coating properties

级联式单弧等离子体发生器(DC_EKEAPG)在工业上的应用越来越重要。这在一定程度上是因为与多弧形系统相比，它们的建造更简单，采购成本明显更低。此外，与传统的等离子发生器相比，级联式单弧等离子体发生器在工艺稳定性和涂层质量方面有很大的改进，这是因为这些发生器使用了中性电极，而且弧光的运动自由度有限。尽管级联DC_EKEAPG在工业应用中越来越重要，但在有关电弧不稳定性和波动的文献中，还没有深入研究这一概念中的等离子体行为。此外，对串联DC_EKEAPGs中电弧的刻意操纵或影响也仅在少数研究中被研究过。因此，数值和实验研究将是拟议项目的主题，这些研究有助于解释级联DC_EKEAPG中的物理关系并增加对该过程的理解。在这些研究的基础上，提高工艺稳定性和应用该工艺的涂层的性能将通过外部影响电弧行为来实现。

The cascaded single-arc plasma generators (DC_EKEAPG) are gaining more importance for industrial use. This is partly related to their simpler construction and significantly lower procurement costs compared to multi-arc systems. Moreover, cascaded single-arc plasma generators promise significant improvements in process stability and coating quality compared to the conventional plasma generators, resulting from the use of neutrodes and the limited motion degree of freedom of the arc in these generators. Although the cascaded DC_EKEAPGs are gaining more importance in industrial applications, the plasma behavior within this concept has not been examined in depth in literature regarding the arc instabilities and fluctuations. Furthermore, a deliberate manipulation or influencing of the arc in cascaded DC_EKEAPGs has been investigated only in a few studies. Therefore, numerical and experimental studies, which serve to explain the physical relationships in a cascaded DC_EKEAPG and to increase understanding of the process, will be the subject of the proposed project. Based on these studies, an increase in process stability and an improvement in properties of coatings applied with this process, will be aimed by externally influencing the arc behavior.