Synthesis and analysis of pure and metal-containing carbon coatings using HPPMS-PVD

拟议的项目是基于目前的项目“HPPMS-C-Schichten”(BO 1979/33-1)，该项目的重点是通过在等离子体中输入不同能量的HPPMS(高功率脉冲磁控溅射)沉积摩擦学应用的a-C-和a-C：Me涂层。使用霓虹灯作为工艺气体，提高了涂层的性能。然而，由于这一项目的结果，有必要进一步改善涂层的性能和涂层与基材之间的复合附着力，以增加工具在摩擦学应用中的适用性，如铝加工。在这方面，我们自己的初步工作可以通过使用衬底温度TS&lt；250°C以及衬底温度的分级来观察到有希望的结果。因此，对于用HPPMS方法沉积a-C(：Me)涂层，这些影响应该进行更详细的研究。因此，拟议项目的总体目标是通过HPPMS在低衬底温度TS&lt；250°C，特别是TS&lt；25°C和不同的输入到等离子体中的能量的情况下，对a-C和a-C：Me涂层沉积a-C和a-C：Me涂层的复合附着力的因果关系有一个基本的了解。因此，上述工艺参数对涂层微观结构、sp3/sp2结合比或残余应力等基本性能的影响与涂层的应用相关的力学性能、复合附着力和热稳定性相关。这些研究的结果是尚未得到的修正结构-区域模型以及a-C(：Me)涂层的低温范围TS&lt；250°C的因果关系模型。进一步的目的是解释基材温度梯度对涂层性能和复合附着力以及耐热性的影响。这些发现的目的是为了有针对性地在钢或硬质合金衬底上开发摩擦学应用工具上的a-C(：Me)涂层。使用基板固定器的液体接触冷却，基板温度从TS=-90°C到TS=250°C变化。对于HPPMS，输入到等离子体的能量的变化是通过每脉冲不同的峰值功率来实现的。根据正在进行的项目BO 1979/33-1的调查结果，使用霓虹灯作为工艺气体。为便于比较，考虑了a-C(：ZR)涂层。调查工作同BO 1979/33-1号文件中的规定一样，是在一家大型涂料厂进行的。

The proposed project is based on the current project "HPPMS-C-Schichten" (BO 1979/33-1), which focuses on the deposition of a-C- and a-C:Me coatings for tribological applications by means of HPPMS (High Power Pulse Magnetron Sputtering) with varying energy input into the plasma. The use of neon as process gas led to an improvement of the coating properties. However, as a result of this project, a further improvement of the coating properties and the compound adhesion between coating and substrate of the deposited a-C(:Me) coatings is necessary in order to increase the suitability for tools in tribological applications such as Al machining. In this respect, promising results could be observed in our own preliminary work with the use of substrate temperatures TS < 250 °C as well as for a gradation of the substrate temperature. These effects should therefore be investigated in more detail for the deposition of a-C(:Me) coatings deposited by means of HPPMS.The overall objective of the proposed project is therefore a fundamental understanding of the cause-and-effect relationships of coating properties and the compound adhesion for the deposition of a-C and a-C:Me coatings by means of HPPMS at low substrate temperatures TS < 250 °C, in particular TS < 25 °C, and varying energy input into the plasma. For this purpose, the influence of the above-mentioned process parameters on basic coating properties such as the microstructure, the sp3/sp2 bond ratio or the residual stresses are correlated with the application-relevant mechanical properties, the compound adhesion and the thermal stability of the deposited coatings. The result of these investigations is a not yet available modified structure-zone model as well as a modeling of the cause-effect relationships for the low-temperature range TS < 250 °C for a-C(:Me) coatings. A further aim is the explanation of the influence of a substrate temperature gradation on the coating properties and the compound adhesion as well as the thermal resistance. The findings are intended to enable a targeted development of a-C(:Me) coatings on steel or hard metal substrates on tools for tribological applications. The substrate temperature is varied from TS = -90 °C to TS = 250 °C using a liquid contact cooling of the substrate holder. The variation of the energy input into the plasma is realized with different peak powers per pulse for the HPPMS. According to the findings of the ongoing project BO 1979/33-1 neon is used as process gas. For comparability, a-C(:Zr) coatings are considered. The investigations are as in BO 1979/33-1 carried out in a large-volume coating plant.