Quantitative Evaluation of the Crystallinity of Grain Boundaries in Nano Scale

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A novel evaluation method of the crystallinity of grain boundaries was proposed by analyzing the quality of Kikuchi lines obtained from the conventional EBSD analysis. This method can evaluate the porous and brittle grain boundaries by IQ (Image Quality) and CI (Confidence Index). Both IQ and CI values are the parameters which are calculated from the observed result of the Kikuchi pattern obtained from the area where electron beams penetrate during EBSD analysis. It was found that the local areas with low IQ value and low CI value correspond to porous grain boundaries. The change of these values corresponded to the changes of mechanical and electrical properties of thin films. Therefore, the quality of grain boundaries can be evaluated by using the proposed combination of the IQ and CI values clearly, and thus, this method is effective for evaluating the crystallinity of grain boundaries and thus, the change of mechanical and electrical properties of the polycrystalline thin films.