High reslution and high intensity X-ray source

高分辨率、高强度X射线源

• 批准号: 59840022
• 负责人: TAGAI Tokuhei
• 金额: $ 3.01万
• 依托单位: The University of Tokyo
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Developmental Scientific Research
• 财政年份: 1984
• 资助国家: 日本
• 起止时间: 1984 至 1985
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-59840022/
• 关键词: X-ray diffraction; High resolution; High intensity; X線源

The structural imperfection of a crystal, which is called to be a microstructure of a crystal, can be observed as diffuse streaks in the diffraction diagram. This microstructure is closely corelated to the thermal histories of the crystal. However, it is not easy to observe the diffuse streaks cause by microstructure by means of the usual X-ray source. If a X-ray source of high resolution and high intensity is attained in the usual experimental condition, this X-ray source can widely be applied to the scientific and industrial fields. The normal X-ray generator with a fine-focused X-ray tube was adopted to the present experiment and the adjustment base was also designed in order to make the alignment of the diffraction system easy. The high resolution X-ray source was obtained by introducing the Guinier-Johansonn type monochromator, by which the strictly monochromatized X-ray of CuK 1 , was focused on the film set by 210mm from the monochromator crystal. The high intensity was attained by means of Laue method. The weak point of Laue method is that the higher order reflections lie one upon another. However, if the strictly monochromatized X-ray source is used, only the first order reflection is recorded on the film and the merit of Laue method of high intensity can be kept on. The diffraction system above mentioned was applied to a plagioclase, which shows an exsolution microtexture, and the diffuse streaks by microdomains were clearly observed with high resolution.

晶体的结构缺陷，称为晶体的微观结构，可以在衍射图中观察到漫射条纹。这种微结构与晶体的热历史密切相关。然而，用普通的X射线源不易观察到显微组织引起的弥散条纹。如果能在通常的实验条件下获得高分辨率、高强度的X射线源，这种X射线源将可广泛应用于科学和工业领域。本实验采用普通X射线发生器和细聚焦X射线管，并设计了调整底座，使衍射系统的调整变得容易。通过引入Guinier-Johansonn型单色器，将严格单色化的CuK 1 X射线聚焦到离单色器晶体210 mm的胶片上，获得了高分辨率的X射线源。利用劳厄方法获得了高强度。劳厄方法的缺点是高阶反射相互叠加。但若采用严格单色化的X射线源，则只记录到一级反射，仍能保持劳厄方法强度高的优点。将上述衍射系统应用于斜长石的出溶显微结构，清晰地观察到由微区组成的弥散条纹，分辨率很高。