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Feasibility Study of Traveling Wave Devices Using Compound Semiconductor Superlattice Structures

Feasibility Study of Traveling Wave Devices Using Compound Semiconductor Superlattice Structures
使用化合物半导体超晶格结构的行波器件的可行性研究
批准号:
60850057
负责人:
FUKAI Ichiro
金额:
$10.88万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Developmental Scientific Research
财政年份:
1985
资助国家:
日本
项目状态:
已结题
起止时间:
1985 至 1986

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中文摘要
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英文摘要
The purpose of the research is to investigate the feasibility of new-type of traveling wave devices using compound semiconductor superlattice structures. The main results are the following:[1] Theoretical analysis of the traveling wave interactions was made on the superlattice structures with finite dimensions of semiconductor plasma. An ideal non-dispersive slow wave structure and an interdigital slow wave structure were studied with the latter involving a complicated self-consistent computer field analysis over space harmonic field components present in the semiconductor plasma of finite dimensions. The analysis has clearly shown the feasibility of microwave and millimeter-wave traveling wave devices. Importance of Debye screening length of plasma with respect to the active layer thickness was demonstrated and the advantage of superlattice structure was indicated.[2] Dielectric spacers with a high breakdown field strength and minimal deposition damage to Semiconductor active layers is essential for coupling between slow-wave and semiconductor carrier wave. For this purpose, a room temperature deposition process of PCVD silicon nitride was successfully developed, using 50Hz plasma.[3] Three kinds of interdigital traveling wave devices having n-GaAs MOVPE single layer, AlGaAs-GaAs MBE hetero structure layers and n-InP single layer as the active layer, respectively, were fabricated. Two-terminal admittance measurements clearly indicated presence of traveling wave interactions at microwave frequencies in all types of the experimental devices. Furthermore, the measured behavior of two-terminal admittance of the InP device showed an excellent agreement with the result of the detailed computer simulation, establishing the design philosophy for devices with the maximum interaction gain.
期刊论文(18)
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飯塚浩一,大野英男,長谷川英機: 電子通信学会技術研究報告. 185. 73-80 (1985)
Koichi Iizuka、Hideo Ohno、Hideki Hasekawa:IEICE 技术研究报告 185. 73-80 (1985)。
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通讯作者:
M.Shimozuma, K.Kitamori, H.Ohno, H.Hasegawa and H.Tagashira: "Room temperature deposition of silicon nitride films using verfy low frequency(50Hz) plasma CVD" J.Electronic Materials. 14. 573-586 (1985)
M.Shimozuma、K.Kitamori、H.Ohno、H.Hasekawa 和 H.Tagashira:“使用 Verfy 低频 (50Hz) 等离子体 CVD 进行氮化硅薄膜的室温沉积”J.Electronic Materials。
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通讯作者:
M.Shimozuma;K.Kitamori;H.Ohno;H.Hasegawa;H.Tagashira: J.Electronic Materials. 14. 573-586 (1985)
M.Shimozuma;K.Kitamori;H.Ohno;H.Hasekawa;H.Tagashira:J.电子材料。
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通讯作者:
K.Iizuka, H.Hasegawa, H.Ohno and N.Sano: "Traveling wave interaction in GaAs AlGaAs/GaAs Layers" Inst.Phys.Conf. Ser.No.79. 577-582 (1985)
K.Iizuka、H.Hasekawa、H.Ohno 和 N.Sano:“GaAs AlGaAs/GaAs 层中的行波相互作用”Inst.Phys.Conf。
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9
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    • 批准号:
      15390420
    • 项目类别:
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    • 资助金额:
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    • 财政年份:
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    • 项目类别:
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    • 资助金额:
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    • 财政年份:
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    • 负责人:
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    • 依托单位:
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